Inventor · disambiguated record
Sohei Nonaka
Also filed as: NONAKA SOHEI
2 granted patents·9 pending applications·0 citations·filing 2004–2020
23Inventor score
Top patents by PatentIndex Score
11 records- 0150US10538059B2Sputtering target for forming protective film, and laminated wiring filmMITSUBISHI MATERIALS CORP·Filed 2014·Granted Jan 21, 2020·0 cites·2 claims
- 0245US10060025B2Ag alloy sputtering target, method of manufacturing Ag alloy sputtering target, Ag alloy film, and method of forming Ag alloy filmMITSUBISHI MATERIALS CORP·Filed 2015·Granted Aug 28, 2018·0 cites·5 claims
- 0341US2010270146A1Method for manufacturing co-base sintered alloy sputtering target for formation of magnetic recording film which is less likely to generate partricles, and co-base sintered alloy sputtering target for formation of magnetic recording filmMITSUBISHI MATERIALS CORP·Filed 2007·Application pending·0 cites
- 0438US2010108499A1Sputtering target for forming phase-change film and method for manufacturing the sameMITSUBISHI MATERIALS CORP·Filed 2006·Application pending·0 cites
- 0538US2007053786A1Phase change film for semiconductor nonvolatile memory and sputtering target for forming phase change filmMITSUBISHI MATERIALS CORP·Filed 2004·Application pending·0 cites
- 0637US2022106678A1Ag ALLOY SPUTTERING TARGET, AND Ag ALLOY FILMMITSUBISHI MATERIALS CORP·Filed 2020·Application pending·0 cites
- 0737US2022112592A1Ag alloy sputtering target, and ag alloy filmMITSUBISHI MATERIALS CORP·Filed 2020·Application pending·0 cites
- 0835US2021272865A1Metal base substrateMITSUBISHI MATERIALS CORP·Filed 2019·Application pending·0 cites
- 0935US2005031484A1Phase change recording film having high electric resistance and sputtering target for forming phase change recording filmMITSUBISHI MATERIALS CORP·Filed 2004·Application pending·0 cites
- 1035US2021298170A1Metal base substrateMITSUBISHI MATERIALS CORP·Filed 2019·Application pending·0 cites
- 1129US2013306471A1Sputtering target for forming magnetic recording medium film and method for producing sameISHIYAMA KOUICHI·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →