Inventor · disambiguated record
W. Karl Olander
Also filed as: OLANDER W K · OLANDER W KARL
36 granted patents·13 pending applications·1,271 citations·filing 1996–2016
98Inventor score
Files withADVANCED TECH MATERIALS30OLANDER W KARL4ENTEGRIS INC3ATMI ECOSYS CORP2APPLIED MATERIALS INC1
Top patents by PatentIndex Score
49 records- 0197US5704965AFluid storage and delivery system utilizing carbon sorbent mediumADVANCED TECH MATERIALS·Filed 1996·Granted Jan 6, 1998·180 cites·50 claims
- 0296US6997202B2Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rateADVANCED TECH MATERIALS·Filed 2002·Granted Feb 14, 2006·67 cites·26 claims
- 0395US7485169B2Semiconductor manufacturing facility utilizing exhaust recirculationADVANCED TECH MATERIALS·Filed 2006·Granted Feb 3, 2009·19 cites·20 claims
- 0495US6660063B2Sorbent-based gas storage and delivery systemADVANCED TECH MATERIALS·Filed 2002·Granted Dec 9, 2003·85 cites·36 claims
- 0595US5704967AFluid storage and delivery system comprising high work capacity physical sorbentADVANCED TECH MATERIALS·Filed 1996·Granted Jan 6, 1998·128 cites·26 claims
- 0694US7943204B2Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantationADVANCED TECH MATERIALS·Filed 2006·Granted May 17, 2011·20 cites·18 claims
- 0792US6030591AProcess for removing and recovering halocarbons from effluent process streamsATMI ECOSYS CORP·Filed 1998·Granted Feb 29, 2000·86 cites·16 claims
- 0891US7951225B2Fluid storage and dispensing systems, and fluid supply processes comprising sameADVANCED TECH MATERIALS·Filed 2006·Granted May 31, 2011·22 cites·25 claims
- 0991US6857447B2Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gasesADVANCED TECH MATERIALS·Filed 2002·Granted Feb 22, 2005·44 cites·102 claims
- 1090US8282023B2Fluid storage and dispensing systems, and fluid supply processes comprising sameOLANDER W KARL·Filed 2011·Granted Oct 9, 2012·10 cites·22 claims
- 1190US7798168B2Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gasesADVANCED TECH MATERIALS·Filed 2009·Granted Sep 21, 2010·12 cites·20 claims
- 1290US6868869B2Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gasesADVANCED TECH MATERIALS·Filed 2003·Granted Mar 22, 2005·44 cites·12 claims
- 1390US6841141B2System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambersADVANCED TECH MATERIALS·Filed 2002·Granted Jan 11, 2005·36 cites·35 claims
- 1490US5914091APoint-of-use catalytic oxidation apparatus and method for treatment of voc-containing gas streamsATMI ECOSYS CORP·Filed 1996·Granted Jun 22, 1999·95 cites·29 claims
- 1589US8389068B2Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantationOLANDER W KARL·Filed 2010·Granted Mar 5, 2013·8 cites·16 claims
- 1689US6805728B2Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent streamADVANCED TECH MATERIALS·Filed 2002·Granted Oct 19, 2004·47 cites·44 claims
- 1789US5837027AManufacturing process for gas source and dispensing systemsADVANCED TECH MATERIALS·Filed 1997·Granted Nov 17, 1998·64 cites·18 claims
- 1888US8603252B2Cleaning of semiconductor processing systemsDIMEO FRANK·Filed 2007·Granted Dec 10, 2013·21 cites·6 claims
- 1986US6517594B2Air management system and method for chemical containment and contamination reduction in a semiconductor manufacturing facilityADVANCED TECH MATERIALS·Filed 2001·Granted Feb 11, 2003·36 cites·46 claims
- 2086US5851270ALow pressure gas source and dispensing apparatus with enhanced diffusive/extractive meansADVANCED TECH MATERIALS·Filed 1997·Granted Dec 22, 1998·55 cites·20 claims
- 2184US6845619B2Integrated system and process for effluent abatement and energy generationADVANCED TECH MATERIALS·Filed 2002·Granted Jan 25, 2005·24 cites·57 claims
- 2283US7819981B2Methods for cleaning ion implanter componentsADVANCED TECH MATERIALS·Filed 2004·Granted Oct 26, 2010·16 cites·39 claims
- 2383US7328716B2Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gasesADVANCED TECH MATERIALS·Filed 2005·Granted Feb 12, 2008·6 cites·20 claims
- 2483US7105037B2Semiconductor manufacturing facility utilizing exhaust recirculationADVANCED TECH MATERIALS·Filed 2003·Granted Sep 12, 2006·39 cites·32 claims
- 2582US9383064B2Ventilation gas management systems and processesOLANDER W KARL·Filed 2011·Granted Jul 5, 2016·8 cites·25 claims
- 2682US7284564B2Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rateADVANCED TECH MATERIALS·Filed 2005·Granted Oct 23, 2007·9 cites·12 claims
- 2781US7614421B2Pressure-based gas delivery system and method for reducing risks associated with storage and delivery of high pressure gasesADVANCED TECH MATERIALS·Filed 2006·Granted Nov 10, 2009·5 cites·62 claims
- 2870US7857880B2Semiconductor manufacturing facility utilizing exhaust recirculationADVANCED TECH MATERIALS·Filed 2009·Granted Dec 28, 2010·7 cites·10 claims
- 2970US6770117B2Ion implantation and wet bench systems utilizing exhaust gas recirculationADVANCED TECH MATERIALS·Filed 2002·Granted Aug 3, 2004·15 cites·62 claims
- 3069US6001172AApparatus and method for the in-situ generation of dopantsADVANCED TECH MATERIALS·Filed 1997·Granted Dec 14, 1999·35 cites·37 claims
- 3166US6471750B1Gas cabinet assembly comprising back migration scrubber unitADVANCED TECH MATERIALS·Filed 2001·Granted Oct 29, 2002·15 cites·28 claims
- 3259US2011259366A1Ion source cleaning in semiconductor processing systemsADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 3358US9991095B2Ion source cleaning in semiconductor processing systemsSWEENEY JOSEPH D·Filed 2009·Granted Jun 5, 2018·0 cites·7 claims
- 3456US9455147B2Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantationENTEGRIS INC·Filed 2012·Granted Sep 27, 2016·0 cites·20 claims
- 3556US7364603B2Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent streamAPPLIED MATERIALS INC·Filed 2004·Granted Apr 29, 2008·5 cites·4 claims
- 3655US2016305682A1Ventilation gas management systems and processesENTEGRIS INC·Filed 2016·Application pending·0 cites
- 3753US2009095713A1Novel methods for cleaning ion implanter componentsADVANCED TECH MATERIALS·Filed 2005·Application pending·0 cites
- 3852US2005178332A1System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (XFn) compounds for use in cleaning semiconductor processing chambersFiled 2005·Application pending·0 cites
- 3950US2008041459A1Gas storage and dispensing system for variable conductance dispensing of gas at constant flow rateADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 4048US2005181129A1Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gasesFiled 2005·Application pending·0 cites
- 4144US2008220596A1Delivery of Low Pressure Dopant Gas to a High Voltage Ion SourceADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 4243US2005109207A1Method and apparatus for the recovery of volatile organic compounds and concentration thereofFiled 2003·Application pending·0 cites
- 4342US2004187683A1Gas recovery system to improve the efficiency of abatementand/or implement reuse/reclamationFiled 2003·Application pending·0 cites
- 4441US5972743APrecursor compositions for ion implantation of antimony and ion implantation process utilizing sameADVANCED TECH MATERIALS·Filed 1996·Granted Oct 26, 1999·8 cites·15 claims
- 4541US2006115591A1Pentaborane(9) storage and deliveryOLANDER W K·Filed 2004·Application pending·0 cites
- 4640US2004159235A1Low pressure drop canister for fixed bed scrubber applications and method of using sameFiled 2003·Application pending·0 cites
- 4738US2005089455A1Gas-using facility including portable dry scrubber system and/or over-pressure control arrangementFiled 2003·Application pending·0 cites
- 4838US2013251913A1Ion implanter system including remote dopant source, and method comprising sameOLANDER W KARL·Filed 2011·Application pending·0 cites
- 4936US10229840B2Ion implanter comprising integrated ventilation systemENTEGRIS INC·Filed 2015·Granted Mar 12, 2019·0 cites·17 claims
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