Inventor · disambiguated record
Valentin N. Todorow
Also filed as: TODOROW VALENTIN · TODOROW VALENTIN N · TODOROW VALENTIN NIKOLOV
60 granted patents·31 pending applications·1,808 citations·filing 2000–2023
99Inventor score
Files withAPPLIED MATERIALS INC70BELEN RODOLFO P3WILLWERTH MICHAEL D3COLLINS KENNETH S2PATERSON ALEXANDER2
Top patents by PatentIndex Score
91 records- 0198US11848176B2Plasma processing using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Dec 19, 2023·5 cites·25 claims
- 0298US11776789B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 3, 2023·6 cites·20 claims
- 0398US11462388B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·6 cites·20 claims
- 0498US8368308B2Inductively coupled plasma reactor having RF phase control and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Granted Feb 5, 2013·285 cites·20 claims
- 0597US12237148B2Plasma processing assembly using pulsed-voltage and radio-frequency powerAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·2 cites·21 claims
- 0697US11462389B2Pulsed-voltage hardware assembly for use in a plasma processing systemAPPLIED MATERIALS INC·Filed 2021·Granted Oct 4, 2022·12 cites·17 claims
- 0797US8988848B2Extended and independent RF powered cathode substrate for extreme edge tunabilityAPPLIED MATERIALS INC·Filed 2012·Granted Mar 24, 2015·47 cites·16 claims
- 0897US8933628B2Inductively coupled plasma source with phase controlAPPLIED MATERIALS INC·Filed 2012·Granted Jan 13, 2015·37 cites·17 claims
- 0997US7264688B1Plasma reactor apparatus with independent capacitive and toroidal plasma sourcesAPPLIED MATERIALS INC·Filed 2006·Granted Sep 4, 2007·73 cites·16 claims
- 1097US6818562B2Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2002·Granted Nov 16, 2004·94 cites·12 claims
- 1197US6472822B1Pulsed RF power delivery for plasma processingAPPLIED MATERIALS INC·Filed 2000·Granted Oct 29, 2002·178 cites·34 claims
- 1297US6414648B1Plasma reactor having a symmetric parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Jul 2, 2002·142 cites·36 claims
- 1396US8633423B2Methods and apparatus for controlling substrate temperature in a process chamberLIN XING·Filed 2011·Granted Jan 21, 2014·131 cites·17 claims
- 1496US7645357B2Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequencyAPPLIED MATERIALS INC·Filed 2006·Granted Jan 12, 2010·40 cites·12 claims
- 1596US6685798B1Plasma reactor having a symmetrical parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Feb 3, 2004·75 cites·13 claims
- 1695US9595423B2Frequency tuning for dual level radio frequency (RF) pulsingAPPLIED MATERIALS INC·Filed 2016·Granted Mar 14, 2017·13 cites·17 claims
- 1795US6893533B2Plasma reactor having a symmetric parallel conductor coil antennaFiled 2003·Granted May 17, 2005·64 cites·22 claims
- 1895US6462481B1Plasma reactor having a symmetric parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Oct 8, 2002·68 cites·41 claims
- 1994US6694915B1Plasma reactor having a symmetrical parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Feb 24, 2004·60 cites·38 claims
- 2093US11177115B2Dual-level pulse tuningAPPLIED MATERIALS INC·Filed 2019·Granted Nov 16, 2021·8 cites·20 claims
- 2193US8264154B2Method and apparatus for pulsed plasma processing using a time resolved tuning scheme for RF power deliveryBANNER SAMER·Filed 2009·Granted Sep 11, 2012·118 cites·21 claims
- 2293US7780864B2Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distributionAPPLIED MATERIALS INC·Filed 2006·Granted Aug 24, 2010·21 cites·17 claims
- 2393US7737042B2Pulsed-plasma system for etching semiconductor structuresAPPLIED MATERIALS INC·Filed 2007·Granted Jun 15, 2010·23 cites·9 claims
- 2492US9318304B2Frequency tuning for dual level radio frequency (RF) pulsingAPPLIED MATERIALS INC·Filed 2014·Granted Apr 19, 2016·10 cites·20 claims
- 2592US8075728B2Gas flow equalizer plate suitable for use in a substrate process chamberBALAKRISHNA AJIT·Filed 2008·Granted Dec 13, 2011·28 cites·9 claims
- 2692US7837838B2Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Nov 23, 2010·20 cites·27 claims
- 2792US7771606B2Pulsed-plasma system with pulsed reaction gas replenish for etching semiconductors structuresAPPLIED MATERIALS INC·Filed 2007·Granted Aug 10, 2010·22 cites·18 claims
- 2892US6409933B1Plasma reactor having a symmetric parallel conductor coil antennaAPPLIED MATERIALS INC·Filed 2000·Granted Jun 25, 2002·45 cites·25 claims
- 2990US7967996B2Process for wafer backside polymer removal and wafer front side photoresist removalAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·16 cites·20 claims
- 3089US8066895B2Method to control uniformity using tri-zone showerheadBELEN RODOLFO P·Filed 2008·Granted Nov 29, 2011·18 cites·23 claims
- 3188US7832354B2Cathode liner with wafer edge gas injection in a plasma reactor chamberAPPLIED MATERIALS INC·Filed 2007·Granted Nov 16, 2010·13 cites·17 claims
- 3288US7645710B2Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma systemAPPLIED MATERIALS INC·Filed 2007·Granted Jan 12, 2010·13 cites·19 claims
- 3385US9378930B2Inductively coupled plasma reactor having RF phase control and methods of use thereofGRIMBERGEN MICHAEL N·Filed 2010·Granted Jun 28, 2016·7 cites·14 claims
- 3485US8349128B2Method and apparatus for stable plasma processingAPPLIED MATERIALS INC·Filed 2004·Granted Jan 8, 2013·26 cites·27 claims
- 3584US8419893B2Shielded lid heater assemblyWILLWERTH MICHAEL D·Filed 2009·Granted Apr 16, 2013·7 cites·15 claims
- 3683US8801896B2Method and apparatus for stable plasma processingAPPLIED MATERIALS INC·Filed 2013·Granted Aug 12, 2014·4 cites·18 claims
- 3783US8236133B2Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension biasKATZ DAN·Filed 2008·Granted Aug 7, 2012·13 cites·9 claims
- 3883US7879250B2Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injectionAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·7 cites·8 claims
- 3981US10573493B2Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2016·Granted Feb 25, 2020·2 cites·12 claims
- 4080US8360003B2Plasma reactor with uniform process rate distribution by improved RF ground return pathAPPLIED MATERIALS INC·Filed 2009·Granted Jan 29, 2013·5 cites·4 claims
- 4179US7727413B2Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion densityAPPLIED MATERIALS INC·Filed 2006·Granted Jun 1, 2010·5 cites·14 claims
- 4278US8299391B2Field enhanced inductively coupled plasma (Fe-ICP) reactorTODOROW VALENTIN N·Filed 2008·Granted Oct 30, 2012·8 cites·20 claims
- 4374US10825708B2Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunabilityAPPLIED MATERIALS INC·Filed 2012·Granted Nov 3, 2020·2 cites·16 claims
- 4474US6727655B2Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamberFiled 2001·Granted Apr 27, 2004·17 cites·22 claims
- 4571US10546731B1Method, apparatus and system for wafer dechucking using dynamic voltage sweepingAPPLIED MATERIALS INC·Filed 2018·Granted Jan 28, 2020·1 cites·20 claims
- 4671US8492980B2Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing systemBANNA SAMER·Filed 2011·Granted Jul 23, 2013·3 cites·20 claims
- 4771US8383002B2Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injectionAPPLIED MATERIALS INC·Filed 2010·Granted Feb 26, 2013·2 cites·6 claims
- 4869US11094511B2Processing chamber with substrate edge enhancement processingAPPLIED MATERIALS INC·Filed 2018·Granted Aug 17, 2021·1 cites·14 claims
- 4967US9362148B2Shielded lid heater assemblyWILLWERTH MICHAEL D·Filed 2013·Granted Jun 7, 2016·1 cites·15 claims
- 5064US9945033B2High efficiency inductively coupled plasma source with customized RF shield for plasma profile controlAPPLIED MATERIALS INC·Filed 2014·Granted Apr 17, 2018·0 cites·21 claims
Showing the top 50 of 91 patent records by PatentIndex Score.
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