Assignee
COLLINS KENNETH S
US·4 granted patents·8 pending applications·28 citations·filing 2007–2018
Top patents by PatentIndex Score
12 records- 0188US8076247B2Plasma process uniformity across a wafer by controlling RF phase between opposing electrodesCOLLINS KENNETH S·Filed 2007·Granted Dec 13, 2011·11 cites·20 claims
- 0282US8080479B2Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonatorCOLLINS KENNETH S·Filed 2007·Granted Dec 20, 2011·6 cites·20 claims
- 0380US8652297B2Symmetric VHF plasma power coupler with active uniformity steeringCOLLINS KENNETH S·Filed 2011·Granted Feb 18, 2014·7 cites·14 claims
- 0480US8414736B2Plasma reactor with tiltable overhead RF inductive sourceCOLLINS KENNETH S·Filed 2010·Granted Apr 9, 2013·4 cites·11 claims
- 0558US2008173237A1Plasma Immersion ChamberCOLLINS KENNETH S·Filed 2008·Application pending·0 cites
- 0653US2012199071A1Plasma immersion chamberCOLLINS KENNETH S·Filed 2012·Application pending·0 cites
- 0744US2008179287A1Process for wafer backside polymer removal with wafer front side gas purgeCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
- 0844US2008178803A1Plasma reactor with ion distribution uniformity controller employing plural vhf sourcesCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
- 0944US2008179288A1Process for wafer backside polymer removal and wafer front side scavenger plasmaCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
- 1040US2018308663A1Plasma reactor with phase shift applied across electrode arrayCOLLINS KENNETH S·Filed 2018·Application pending·0 cites
- 1140US2018308664A1Plasma reactor with filaments and rf power applied at multiple frequenciesCOLLINS KENNETH S·Filed 2018·Application pending·0 cites
- 1240US2018308667A1Plasma reactor with groups of electrodesCOLLINS KENNETH S·Filed 2018·Application pending·0 cites
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