Inventor · disambiguated record
Dennis S. Grimard
Also filed as: GRIMARD DENNIS · GRIMARD DENNIS S · GRIMARD DENNIS STANLEY
37 granted patents·11 pending applications·2,774 citations·filing 1995–2016
98Inventor score
Top patents by PatentIndex Score
48 records- 0198US6095084AHigh density plasma process chamberAPPLIED MATERIALS INC·Filed 1997·Granted Aug 1, 2000·250 cites·86 claims
- 0297US6310755B1Electrostatic chuck having gas cavity and methodAPPLIED MATERIALS INC·Filed 1999·Granted Oct 30, 2001·325 cites·38 claims
- 0397US6108189AElectrostatic chuck having improved gas conduitsAPPLIED MATERIALS INC·Filed 1997·Granted Aug 22, 2000·255 cites·64 claims
- 0497US5903428AHybrid Johnsen-Rahbek electrostatic chuck having highly resistive mesas separating the chuck from a wafer supported thereupon and method of fabricating sameAPPLIED MATERIALS INC·Filed 1997·Granted May 11, 1999·300 cites·19 claims
- 0596US6721162B2Electrostatic chuck having composite dielectric layer and method of manufactureAPPLIED MATERIALS INC·Filed 2002·Granted Apr 13, 2004·76 cites·20 claims
- 0696US6538872B1Electrostatic chuck having heater and methodAPPLIED MATERIALS INC·Filed 2001·Granted Mar 25, 2003·123 cites·18 claims
- 0796US6478924B1Plasma chamber support having dual electrodesAPPLIED MATERIALS INC·Filed 2000·Granted Nov 12, 2002·124 cites·42 claims
- 0896US6074512AInductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 1997·Granted Jun 13, 2000·236 cites·101 claims
- 0994US6490146B2Electrostatic chuck bonded to base with a bond layer and methodAPPLIED MATERIALS INC·Filed 2001·Granted Dec 3, 2002·88 cites·28 claims
- 1094US6414834B1Dielectric covered electrostatic chuckAPPLIED MATERIALS INC·Filed 2000·Granted Jul 2, 2002·56 cites·34 claims
- 1193US9263305B2High definition heater and method of operationPTASIENSKI KEVIN·Filed 2012·Granted Feb 16, 2016·9 cites·13 claims
- 1293US6581275B2Fabricating an electrostatic chuck having plasma resistant gas conduitsAPPLIED MATERIALS INC·Filed 2001·Granted Jun 24, 2003·74 cites·20 claims
- 1393US6494958B1Plasma chamber support with coupled electrodeAPPLIED MATERIALS INC·Filed 2000·Granted Dec 17, 2002·74 cites·20 claims
- 1492US7510665B2Plasma generation and control using dual frequency RF signalsAPPLIED MATERIALS INC·Filed 2006·Granted Mar 31, 2009·17 cites·19 claims
- 1591US6320736B1Chuck having pressurized zones of heat transfer gasAPPLIED MATERIALS INC·Filed 1999·Granted Nov 20, 2001·122 cites·37 claims
- 1691US6074488APlasma chamber support having an electrically coupled collar ringAPPLIED MATERIALS INC·Filed 1997·Granted Jun 13, 2000·118 cites·42 claims
- 1789US10043685B2High definition heater and method of operationWATLOW ELECTRIC MFG·Filed 2016·Granted Aug 7, 2018·3 cites·19 claims
- 1889US7813103B2Time-based wafer de-chucking from an electrostatic chuck having separate RF BIAS and DC chucking electrodesAPPLIED MATERIALS INC·Filed 2007·Granted Oct 12, 2010·14 cites·20 claims
- 1989US6454898B1Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet linersAPPLIED MATERIALS INC·Filed 2000·Granted Sep 24, 2002·43 cites·28 claims
- 2085US6795292B2Apparatus for regulating temperature of a process kit in a semiconductor wafer-processing chamberFiled 2001·Granted Sep 21, 2004·41 cites·26 claims
- 2185US6151203AConnectors for an electrostatic chuck and combination thereofAPPLIED MATERIALS INC·Filed 1998·Granted Nov 21, 2000·76 cites·20 claims
- 2285US5636098ABarrier seal for electrostatic chuckAPPLIED MATERIALS INC·Filed 1995·Granted Jun 3, 1997·85 cites·36 claims
- 2384US8363378B2Method for optimized removal of wafer from electrostatic chuckINTEVAC INC·Filed 2009·Granted Jan 29, 2013·13 cites·42 claims
- 2483US7431857B2Plasma generation and control using a dual frequency RF sourceAPPLIED MATERIALS INC·Filed 2004·Granted Oct 7, 2008·26 cites·21 claims
- 2583US6462928B1Electrostatic chuck having improved electrical connector and methodAPPLIED MATERIALS INC·Filed 1999·Granted Oct 8, 2002·65 cites·13 claims
- 2681US6490144B1Support for supporting a substrate in a process chamberAPPLIED MATERIALS INC·Filed 1999·Granted Dec 3, 2002·57 cites·65 claims
- 2780US10361103B2High definition heater system having a fluid mediumWATLOW ELECTRIC MFG·Filed 2016·Granted Jul 23, 2019·1 cites·18 claims
- 2880US9553006B2High definition heater system having a fluid mediumPTASIENSKI KEVIN·Filed 2012·Granted Jan 24, 2017·2 cites·11 claims
- 2973US5639334AUniform gas flow arrangementsIBM·Filed 1995·Granted Jun 17, 1997·25 cites·19 claims
- 3067US6736668B1High temperature electrical connectorFiled 2000·Granted May 18, 2004·16 cites·22 claims
- 3166US7838430B2Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2004·Granted Nov 23, 2010·8 cites·27 claims
- 3265US11133201B2High definition heater system having a fluid mediumWATLOW ELECTRIC MFG·Filed 2016·Granted Sep 28, 2021·0 cites·20 claims
- 3363US10734256B2High definition heater and method of operationWATLOW ELECTRIC MFG·Filed 2016·Granted Aug 4, 2020·0 cites·20 claims
- 3457US6273958B2Substrate support for plasma processingAPPLIED MATERIALS INC·Filed 1999·Granted Aug 14, 2001·20 cites·26 claims
- 3553US5605603ADeep trench processIBM·Filed 1995·Granted Feb 25, 1997·23 cites·7 claims
- 3650US6642489B2Method and apparatus for improving exhaust gas consumption in an exhaust conduitAPPLIED MATERIALS INC·Filed 2001·Granted Nov 4, 2003·2 cites·39 claims
- 3750US2007000611A1Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3848US2007006971A1Plasma generation and control using a dual frequency rf sourceAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3947US5789324AUniform gas flow arrangementsIBM·Filed 1997·Granted Aug 4, 1998·7 cites·10 claims
- 4047US2010326602A1Electrostatic chuckINTEVAC INC·Filed 2009·Application pending·0 cites
- 4144US2004190215A1Electrostatic chuck having dielectric member with stacked layers and manufactureAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 4240US2009086401A1Electrostatic chuck apparatusINTEVAC INC·Filed 2007·Application pending·0 cites
- 4339US2012138230A1Systems and methods for moving web etch, cvd, and ion implantBLUCK TERRY·Filed 2011·Application pending·0 cites
- 4439US2004081439A1Actively-controlled electrostatic chuck heaterAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 4537US2003010292A1Electrostatic chuck with dielectric coatingAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 4636US2009086400A1Electrostatic chuck apparatusINTEVAC INC·Filed 2007·Application pending·0 cites
- 4730US2002036881A1Electrostatic chuck having composite base and methodFiled 1999·Application pending·0 cites
- 4829US2002022403A1Connectors for an eletrostatic chuckFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →