Inventor · disambiguated record
Keisuke Nakazawa
Also filed as: NAKAZAWA KEISUKE
29 granted patents·11 pending applications·90 citations·filing 2000–2024
95Inventor score
Files withTOSHIBA KK16NAKAZAWA KEISUKE8CALSONIC KANSEI CORP2DAINIPPON PRINTING CO LTD2IWASAWA KAZUAKI2
Top patents by PatentIndex Score
40 records- 0189US7781341B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Granted Aug 24, 2010·9 cites·20 claims
- 0283US8642409B2Semiconductor device and method of manufacturing the sameNAKAZAWA KEISUKE·Filed 2012·Granted Feb 4, 2014·7 cites·13 claims
- 0382US7407864B2Polysilazane perhydride solution and method of manufacturing a semiconductor device using the sameTOSHIBA KK·Filed 2005·Granted Aug 5, 2008·7 cites·19 claims
- 0480US8629035B2Method of manufacturing semiconductor deviceNAKAZAWA KEISUKE·Filed 2012·Granted Jan 14, 2014·5 cites·52 claims
- 0580US8592939B2Semiconductor device and manufacturing method thereofNAKAZAWA KEISUKE·Filed 2011·Granted Nov 26, 2013·6 cites·9 claims
- 0676US9793111B2Spin coating method and manufacturing method of electronic componentTOSHIBA KK·Filed 2016·Granted Oct 17, 2017·2 cites·16 claims
- 0776US8080463B2Semiconductor device manufacturing method and silicon oxide film forming methodIWASAWA KAZUAKI·Filed 2010·Granted Dec 20, 2011·5 cites·15 claims
- 0876US2025079475A1Separator of electrochemical cell stackTOSHIBA KK·Filed 2024·Application pending·0 cites
- 0975US6709791B1Halftone phase shift photomask and blanks for halftone phase shift photomask for it and pattern forming method using thisDAINIPPON PRINTING CO LTD·Filed 2000·Granted Mar 23, 2004·14 cites·26 claims
- 1073US9278373B2Spin coating apparatus and methodTOSHIBA KK·Filed 2013·Granted Mar 8, 2016·2 cites·8 claims
- 1171US8652571B2Spin coating method and spin coating apparatusNAKAZAWA KEISUKE·Filed 2009·Granted Feb 18, 2014·3 cites·10 claims
- 1265US8975196B2Manufacturing method of semiconductor device and manufacturing apparatus of semiconductor deviceTOSHIBA KK·Filed 2013·Granted Mar 10, 2015·1 cites·20 claims
- 1364US7531408B2Method of manufacturing a semiconductor device containing a PbxSr(1-x)[Zr,Ti]xRu(1-x)O3 film in a capacitorTOSHIBA KK·Filed 2007·Granted May 12, 2009·1 cites·5 claims
- 1463US7378329B2Method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted May 27, 2008·10 cites·8 claims
- 1560US8835279B2Method of manufacturing semiconductor deviceNAKAZAWA KEISUKE·Filed 2012·Granted Sep 16, 2014·1 cites·24 claims
- 1660US6780547B2Halftone phase shifting photomask and blanks for halftone phase shifting photomask therefor and a method for forming pattern by using the halftone phase shifting photomaskDAINIPPON PRINTING CO LTD·Filed 2001·Granted Aug 24, 2004·7 cites·19 claims
- 1759US9628665B2Information processing system, information processing apparatus, information processing method, and recording mediumOKADA DAISUKE·Filed 2015·Granted Apr 18, 2017·1 cites·20 claims
- 1854US8329553B2Method for manufacturing semiconductor device and NAND-type flash memoryMATSUO SHOGO·Filed 2010·Granted Dec 11, 2012·1 cites·20 claims
- 1953US2014137796A1Spin coating method and spin coating apparatusTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2053US2009036629A1Polysilazane perhydride solution and method of manufacturing a semiconductor device using the sameTOSHIBA KK·Filed 2008·Application pending·0 cites
- 2152US7105400B2Manufacturing method of semiconductor deviceINFINEON TECHNOLOGIES AG·Filed 2003·Granted Sep 12, 2006·4 cites·7 claims
- 2251US10549312B2Spin coating apparatus and methodTOSHIBA MEMORY CORP·Filed 2016·Granted Feb 4, 2020·0 cites·8 claims
- 2350US9437476B2Method of manufacturing semiconductor device including air gap between patternsTOSHIBA KK·Filed 2014·Granted Sep 6, 2016·0 cites·18 claims
- 2450US7259094B2Apparatus and method for heat treating thin filmTOSHIBA KK·Filed 2005·Granted Aug 21, 2007·0 cites·15 claims
- 2548US7233040B2Semiconductor device contains a PbxSr(1−x)[Zr, Ti]xRu(1−x)O3 film in a capacitorTOSHIBA KK·Filed 2004·Granted Jun 19, 2007·1 cites·25 claims
- 2645US9431291B2Method of making openings in a semiconductor device with reduced residue by transferring layersTOSHIBA KK·Filed 2015·Granted Aug 30, 2016·0 cites·9 claims
- 2745US8659114B2Semiconductor deviceNAKAZAWA KEISUKE·Filed 2011·Granted Feb 25, 2014·0 cites·16 claims
- 2845US2008090988A1Method for handling polysilazane or polysilazane solution, polysilazane or polysilazane solution, and method for producing semiconductor deviceNAKAZAWA KEISUKE·Filed 2007·Application pending·0 cites
- 2944US8956132B2CompressorSATOU KEITA·Filed 2012·Granted Feb 17, 2015·2 cites·10 claims
- 3042US7183601B2Semiconductor device and method for manufacturing thereofTOSHIBA KK·Filed 2004·Granted Feb 27, 2007·1 cites·20 claims
- 3142US2012034754A1Semiconductor device manufacaturing method and silicon oxide film forming methodIWASAWA KAZUAKI·Filed 2011·Application pending·0 cites
- 3241US2004155278A1Semiconductor device, apparatus and method for manufacturing the sameFiled 2003·Application pending·0 cites
- 3341US2016155093A1Image-forming-apparatus control system, control method, and computer program productSHIBATA YUTO·Filed 2015·Application pending·0 cites
- 3440US2005093042A1Semiconductor device and method of manufacturing the sameFiled 2004·Application pending·0 cites
- 3538US2005070043A1Semiconductor device and method for manufacturing the sameFiled 2003·Application pending·0 cites
- 3635US2016276291A1Semiconductor device and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2015·Application pending·0 cites
- 3734US10218874B2Information processing system, information processing apparatus, information processing method, and information processing programKITAYAMA AKIKO·Filed 2016·Granted Feb 26, 2019·0 cites·13 claims
- 3834US9765783B2Vane-rotary gas compressorCALSONIC KANSEI CORP·Filed 2015·Granted Sep 19, 2017·0 cites·3 claims
- 3933US9556872B2Gas compressor formed with a high-pressure supply holeCALSONIC KANSEI CORP·Filed 2015·Granted Jan 31, 2017·0 cites·2 claims
- 4033US2017163826A1Information processing apparatus, image processing apparatus, information processing system, and screen display methodNAKAZAWA KEISUKE·Filed 2016·Application pending·0 cites
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