Spin coating method and spin coating apparatus

Abstract

A spin coating apparatus that supplies a coating liquid to a substrate and rotating the substrate to form a coating film, has a holding part that holds the substrate mounted thereon in a horizontal position; a rotationally driving source that rotationally drives the holding part about a rotational axis parallel with the vertical direction, thereby rotating the substrate; and a coating liquid supplying part that supplies the coating liquid to the substrate held by the holding part.

1 .- 10 . (canceled) 
     
     
         11 . A spin coating apparatus that supplies a coating liquid to a substrate and rotating the substrate to form a coating film, comprising:
 a holding part that holds the substrate mounted thereon in a horizontal position;   a rotationally driving source that rotationally drives the holding part about a rotational axis parallel with the vertical direction, thereby rotating the substrate; and   a coating liquid supplying part that supplies the coating liquid to the substrate held by the holding part,   wherein the coating liquid supplying part dispenses a first amount of coating liquid to a central part of the substrate while the rotationally driving source is rotating the substrate about the central part of the substrate at a first number of revolutions,   the coating liquid supplying part dispenses a second amount of coating liquid to the central part of the substrate while the rotationally driving source is rotating the substrate at a second number of revolutions that is lower than the first number of revolutions after the first amount of coating liquid is dispensed,   the rotationally driving source rotates the substrate at a third number of revolutions for determining the film thickness of the coating liquid after the second amount of coating liquid is dispensed, and   the first number of revolutions is a number of revolutions at which the first amount of coating liquid does not uniformly spread over the substrate because of air resistance.   
     
     
         12 . The apparatus according to  claim 11 , wherein the first amount is equal to or larger than the second amount. 
     
     
         13 . The apparatus according to  claim 11 , wherein a pattern is formed on the substrate. 
     
     
         14 . The apparatus according to  claim 12 , wherein a pattern is formed on the substrate. 
     
     
         15 . The apparatus according to  claim 11 , wherein the coating liquid is any of a photoresist, an antireflection material, a photoresist protective material, a resist pattern shrinkable material, a protective material for immersion exposure, polyimide, SOG, a low-k material and a sol-gel material. 
     
     
         16 . The apparatus according to  claim 12 , wherein the coating liquid is any of a photoresist, an antireflection material, a photoresist protective material, a resist pattern shrinkable material, a protective material for immersion exposure, polyimide, SOG, a low-k material and a sol-gel material. 
     
     
         17 . The apparatus according to  claim 13 , wherein the coating liquid is any of a photoresist, an antireflection material, a photoresist protective material, a resist pattern shrinkable material, a protective material for immersion exposure, polyimide, SOG, a low-k material and a sol-gel material. 
     
     
         18 . The apparatus according to  claim 11 , wherein the coating liquid is a planarizing material or a filler material. 
     
     
         19 . The apparatus according to  claim 12 , wherein the coating liquid is a planarizing material or a filler material. 
     
     
         20 . The apparatus according to  claim 13 , wherein the coating liquid is a planarizing material or a filler material. 
     
     
         21 . A spin coating apparatus that supplies a coating liquid to a substrate and rotating the substrate to form a coating film, comprising:
 a holding part that holds the substrate mounted thereon in a horizontal position;   a rotationally driving source that rotationally drives the holding part about a rotational axis parallel with the vertical direction, thereby rotating the substrate; and   a coating liquid supplying part that supplies the coating liquid to the substrate held by the holding part, and has a discharge controlling apparatus,   wherein the coating liquid supplying part dispenses a first amount of coating liquid to a central part of the substrate while the rotationally driving source is rotating the substrate about the central part of the substrate at a first number of revolutions, and maintaining the rotations at the first number of revolutions during said dispensing,   the coating liquid supplying part dispenses a second amount of coating liquid to the central part of the substrate while the rotationally driving source is rotating the substrate at a second number of revolutions that is lower than the first number of revolutions after the first amount of coating liquid is dispensed, and maintaining the rotations at the second number of revolutions during said dispensing, and   the rotationally driving source rotates the substrate at a third number of revolutions after rotating the substrate at the second number of revolutions,   wherein the third number of revolutions is lower than the first number of revolutions, and   wherein a first discharge rate of the first amount of coating liquid is lower than a second discharge rate of the second amount of coating liquid.   
     
     
         22 . The apparatus according to  claim 21 , wherein the first amount is equal to or larger than the second amount. 
     
     
         23 . The apparatus according to  claim 21 , wherein a pattern is formed on the substrate. 
     
     
         24 . The apparatus according to  claim 22 , wherein a pattern is formed on the substrate. 
     
     
         25 . The apparatus according to  claim 21 , wherein the coating liquid is any of a photoresist, an antireflection material, a photoresist protective material, a resist pattern shrinkable material, a protective material for immersion exposure, polyimide, SOG, a low-k material and a sol-gel material. 
     
     
         26 . The apparatus according to  claim 21 , wherein the coating liquid is a planarizing material or a filler material. 
     
     
         27 . The apparatus according to  claim 21 , wherein the rotationally driving source rotates the substrate at the third number of revolutions after dispensing the second amount of coating liquid. 
     
     
         28 . The apparatus according to  claim 27 , wherein the third number of revolutions is lower than the second number of revolutions.