Inventor · disambiguated record
Katrina Mikhaylichenko
Also filed as: MIKHAYLICHENKO KATRINA · MIKHAYLICHENKO KATRINA A
40 granted patents·11 pending applications·405 citations·filing 2000–2013
98Inventor score
Top patents by PatentIndex Score
51 records- 0193US6733596B1Substrate cleaning brush preparation sequence, method, and systemLAM RES CORP·Filed 2002·Granted May 11, 2004·66 cites·20 claims
- 0292US6951042B1Brush scrubbing-high frequency resonating wafer processing system and methods for making and implementing the sameLAM RES CORP·Filed 2003·Granted Oct 4, 2005·50 cites·20 claims
- 0391US6770151B1Drying a substrate using a combination of substrate processing technologiesLAM RES CORP·Filed 2002·Granted Aug 3, 2004·55 cites·20 claims
- 0490US8617993B2Method of reducing pattern collapse in high aspect ratio nanostructuresYASSERI AMIR A·Filed 2010·Granted Dec 31, 2013·22 cites·11 claims
- 0589US7696141B2Cleaning compound and method and system for using the cleaning compoundLAM RES CORP·Filed 2006·Granted Apr 13, 2010·10 cites·28 claims
- 0688US7737097B2Method for removing contamination from a substrate and for making a cleaning solutionLAM RES CORP·Filed 2006·Granted Jun 15, 2010·11 cites·22 claims
- 0787US7862662B2Method and material for cleaning a substrateLAM RES CORP·Filed 2006·Granted Jan 4, 2011·10 cites·13 claims
- 0886US8317934B2Multi-stage substrate cleaning method and apparatusKHOLODENKO ARNOLD·Filed 2009·Granted Nov 27, 2012·10 cites·14 claims
- 0985US7799141B2Method and system for using a two-phases substrate cleaning compoundLAM RES CORP·Filed 2006·Granted Sep 21, 2010·8 cites·24 claims
- 1085US7648584B2Method and apparatus for removing contamination from substrateLAM RES CORP·Filed 2006·Granted Jan 19, 2010·9 cites·27 claims
- 1184US8757177B2Multi-stage substrate cleaning method and apparatusKHOLODENKO ARNOLD·Filed 2012·Granted Jun 24, 2014·6 cites·17 claims
- 1283US8591662B2Methods for cleaning a semiconductor substrateFREER ERIK M·Filed 2012·Granted Nov 26, 2013·4 cites·14 claims
- 1383US7032269B2Brush scrubbing-high frequency resonating substrate processing systemLAM RES CORP·Filed 2005·Granted Apr 25, 2006·7 cites·14 claims
- 1482US8316866B2Method and apparatus for cleaning a semiconductor substrateFREER ERIK M·Filed 2006·Granted Nov 27, 2012·6 cites·13 claims
- 1582US8137474B2Cleaning compound and method and system for using the cleaning compoundFREER ERIK M·Filed 2010·Granted Mar 20, 2012·4 cites·15 claims
- 1681US8716210B2Material for cleaning a substrateFREER ERIK M·Filed 2010·Granted May 6, 2014·4 cites·18 claims
- 1781US8475599B2Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutionsFREER ERIK M·Filed 2006·Granted Jul 2, 2013·6 cites·12 claims
- 1881US7743449B2System and method for a combined contact and non-contact wafer cleaning moduleLAM RES CORP·Filed 2005·Granted Jun 29, 2010·7 cites·14 claims
- 1980US7007333B1System and method for a combined contact and non-contact wafer cleaning moduleLAM RES CORP·Filed 2002·Granted Mar 7, 2006·25 cites·13 claims
- 2079US8522801B2Method and apparatus for cleaning a semiconductor substrateFREER ERIK M·Filed 2006·Granted Sep 3, 2013·6 cites·6 claims
- 2179US8367594B2Damage free, high-efficiency, particle removal cleaner comprising polyvinyl alcohol particlesLAM RES CORP·Filed 2009·Granted Feb 5, 2013·3 cites·16 claims
- 2278US8522799B2Apparatus and system for cleaning a substrateFREER ERIK M·Filed 2006·Granted Sep 3, 2013·6 cites·8 claims
- 2377US7806126B1Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the sameLAM RES CORP·Filed 2005·Granted Oct 5, 2010·5 cites·19 claims
- 2476US8480810B2Method and apparatus for particle removalFREER ERIK M·Filed 2006·Granted Jul 9, 2013·5 cites·19 claims
- 2576US8440573B2Method and apparatus for pattern collapse free wet processing of semiconductor devicesMIKHAYLICHENKO KATRINA·Filed 2010·Granted May 14, 2013·4 cites·20 claims
- 2673US6949411B1Method for post-etch and strip residue removal on coral filmsLAM RES CORP·Filed 2001·Granted Sep 27, 2005·15 cites·24 claims
- 2772US8242067B2Two-phase substrate cleaning materialKOROLIK MIKHAIL·Filed 2010·Granted Aug 14, 2012·2 cites·18 claims
- 2871US8608859B2Method for removing contamination from a substrate and for making a cleaning solutionFREER ERIK M·Filed 2010·Granted Dec 17, 2013·2 cites·15 claims
- 2970US8062471B2Proximity head heating method and apparatusMIKHAYLICHENKO KATRINA·Filed 2004·Granted Nov 22, 2011·11 cites·12 claims
- 3068US8555903B2Method and apparatus for removing contamination from substrateFREER ERIK M·Filed 2009·Granted Oct 15, 2013·2 cites·20 claims
- 3167US6611326B1System and apparatus for evaluating the effectiveness of wafer drying operationsLAM RES CORP·Filed 2000·Granted Aug 26, 2003·7 cites·28 claims
- 3263US6521050B1Methods for evaluating advanced wafer drying techniquesLAM RES CORP·Filed 2000·Granted Feb 18, 2003·9 cites·25 claims
- 3356US6851436B1Substrate processing using a fluid re-circulation system in a wafer scrubbing systemLAM RES CORP·Filed 2002·Granted Feb 8, 2005·5 cites·16 claims
- 3455US8324114B2Method and apparatus for silicon oxide residue removalMIKHAYLICHENKO KATRINA·Filed 2010·Granted Dec 4, 2012·1 cites·18 claims
- 3555US2014059789A1Apparatus for Cleaning a Semiconductor SubstrateLAM RES CORP·Filed 2013·Application pending·0 cites
- 3653US7897213B2Methods for contained chemical surface treatmentLAM RES CORP·Filed 2007·Granted Mar 1, 2011·0 cites·22 claims
- 3752US8652266B2Method and apparatus for surface treatment of semiconductor substrates using sequential chemical applicationsMIKHAYLICHENKO KATRINA·Filed 2008·Granted Feb 18, 2014·0 cites·11 claims
- 3852US2013284217A1Substrate Cleaning System Using Stabilized Fluid SolutionsLAM RES CORP·Filed 2013·Application pending·0 cites
- 3951US2014116476A1Systems for Surface Treatment of Semiconductor Substrates using Sequential Chemical ApplicationsLAM RES CORP·Filed 2013·Application pending·0 cites
- 4050US8590550B2Apparatus for cleaning contaminants from substrateKOROLIK MIKHAIL·Filed 2010·Granted Nov 26, 2013·0 cites·17 claims
- 4149US7067016B1Chemically assisted mechanical cleaning of MRAM structuresLAM RES CORP·Filed 2003·Granted Jun 27, 2006·2 cites·15 claims
- 4248US8102014B2Proximity head heating method and apparatusMIKHAYLICHENKO KATRINA·Filed 2010·Granted Jan 24, 2012·0 cites·17 claims
- 4348US8011116B2Substrate proximity drying using in-situ local heating of substrateLAM RES CORP·Filed 2010·Granted Sep 6, 2011·0 cites·13 claims
- 4447US2011061687A1Apparatus for Contained Chemical Surface TreatmentLAM RES CORP·Filed 2010·Application pending·0 cites
- 4543US2015040941A1Method and Apparatus for Cleaning A Semiconductor SubstrateLAM RES CORP·Filed 2013·Application pending·0 cites
- 4643US2008038448A1Chemical resistant semiconductor processing chamber bodiesLAM RES CORP·Filed 2007·Application pending·0 cites
- 4743US2015040947A1Method and Systems for Cleaning A SubstrateLAM RES CORP·Filed 2013·Application pending·0 cites
- 4840US2006131268A1Non-contact discrete removal of substrate surface contaminants/coatings, and method, apparatus, and system for implementing the sameLAM RES CORP·Filed 2004·Application pending·0 cites
- 4937US2012260517A1Apparatus and Method for Reducing Substrate Pattern Collapse During Drying OperationsLENZ ERIC·Filed 2011·Application pending·0 cites
- 5036US2002142601A1Method for planarizing a surface of a semiconductor wafer with a fixed abrasive materialFiled 2001·Application pending·0 cites
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