Apparatus for Cleaning a Semiconductor Substrate

Abstract

An apparatus for processing a substrate is provided. The apparatus includes a solid material having a support side and a contact side. The contact side has an outer surface, and the outer surface is configured to become softer relative to a remainder of the solid material when exposed to an activation solution. The apparatus includes a support structure configured to support the solid material from the support side of the solid material, such that the contact side of the solid material is oriented to face a surface of the substrate, when the substrate is present. Also provided is a gimbaled structure connected to the support structure. The gimbaled structure enabling the outer surface of the contact side to substantially align in a coplanar arrangement with the surface of the substrate, when the substrate is present. A force application structure is coupled to the gimbaled structure. The force application structure is configured for moving the solid material toward and away from the surface of the substrate, when the substrate is present, and further configured for applying a force that presses the outer surface of the solid material against the surface of the substrate, when the substrate is present.

What is claimed is: 
     
         1 . An apparatus for processing a substrate, comprising:
 a solid material having a support side and a contact side, the contact side having an outer surface, the outer surface configured to become softer relative to a remainder of the solid material when exposed to an activation solution;   a support structure configured to support the solid material from the support side of the solid material, such that the contact side of the solid material is oriented to face a surface of the substrate, when the substrate is present;   a gimbaled structure connected to the support structure, the gimbaled structure enabling the outer surface of the contact side to substantially align in a coplanar arrangement with the surface of the substrate, when the substrate is present; and   a force application structure coupled to the gimbaled structure, the force application structure configured for moving of the solid material toward and away from the surface of the substrate, when the substrate is present, and further configured for applying a force that presses the outer surface of the solid material against the surface of the substrate, when the substrate is present.   
     
     
         2 . The apparatus of  claim 1 , wherein the gimbaled structure includes rotation structure to enable movement of the support structure in a least two axis of gimbal. 
     
     
         3 . The apparatus of  claim 1 , wherein the gimbaled structure includes rotation structure to enable movement of the support structure in multiple dimensions. 
     
     
         4 . The apparatus of  claim 1 , wherein the gimbaled structure includes rotation structure includes two or three pairs of pivots mounted on axes at right angles. 
     
     
         5 . The apparatus of  claim 1 , wherein the solid material is selected from a group consisting of a fatty acid, an alkyl sulfonate, an alkyl phosphate, and an alkyl phosphonate. 
     
     
         6 . The apparatus of  claim 1 , wherein the support structure includes a shaft through an axis of the solid material and wherein the solid material rotates around the axis. 
     
     
         7 . The apparatus of  claim 1 , wherein the gimbaled structure is configured for rotation. 
     
     
         8 . The apparatus of  claim 1 , further comprising:
 a fluid delivery system for providing the activation solution to the surface of the substrate, when present.   
     
     
         9 . The apparatus of  claim 1 , wherein the activation solution is alkaline or is a surfactant. 
     
     
         10 . The apparatus of  claim 1 , wherein a component of the outer surface is ionized by the activation solution. 
     
     
         11 . The apparatus of  claim 1 , wherein the outer surface is a planar surface. 
     
     
         12 . The apparatus of  claim 1 , wherein the force causes a plastic deformation of the surface of the solid cleaning element, thereby depositing a layer of the solid cleaning element onto the substrate surface, the layer of the solid cleaning element is configured for rinsing off of the substrate surface. 
     
     
         13 . The apparatus of  claim 1 , wherein the plastic deformation is at least partially caused by a lateral force. 
     
     
         14 . An apparatus for processing a substrate, comprising:
 a fatty acid puck having a support side and a contact side, the contact side having an outer surface, the outer surface configured to become softer relative to a remainder of the fatty acid puck when exposed to an activation solution;   a support structure configured to support the fatty acid puck from the support side of the fatty acid puck, such that the contact side of the fatty acid puck is oriented to face a surface of the substrate, when the substrate is present;   a gimbaled structure connected to the support structure, the gimbaled structure enabling the outer surface of the contact side to substantially align in a coplanar arrangement with the surface of the substrate, when the substrate is present; and   a force application structure coupled to the gimbaled structure, the force application structure configured for moving of the fatty acid puck toward and away from the surface of the substrate, when the substrate is present, and further configured for applying a force that presses the outer surface of the fatty acid puck against the surface of the substrate, when the substrate is present.   
     
     
         15 . The apparatus of  claim 14 , wherein the gimbaled structure includes rotation structure to enable movement of the support structure in multiple dimensions. 
     
     
         16 . The apparatus of  claim 14 , wherein the support structure includes a shaft through an axis of the fatty acid puck and wherein the fatty acid puck rotates around the axis. 
     
     
         17 . The apparatus of  claim 14 , wherein the gimbaled structure is configured for rotation, and wherein the force causes a plastic deformation of the surface of the fatty acid puck, thereby depositing a layer of the fatty acid puck onto the substrate surface, the layer of the fatty acid puck is configured for rinsing off of the substrate surface. 
     
     
         18 . The apparatus of  claim 14 , further comprising:
 a fluid delivery system for providing the activation solution to the surface of the substrate, when present, and the activation solution is alkaline or is a surfactant, and a component of the outer surface is ionized by the activation solution.   
     
     
         19 . An apparatus for processing a substrate, comprising:
 a bar material having a support side and a contact side, the contact side having an outer surface, the outer surface configured to become softer relative to a remainder of the bar material when exposed to an activation solution;   a support structure configured to support the bar material from the support side of the bar material, such that the contact side of the bar material is oriented to face a surface of the substrate, when the substrate is present;   a gimbaled structure connected to the support structure, the gimbaled structure enabling the outer surface of the contact side to substantially align in a coplanar arrangement with the surface of the substrate, when the substrate is present; and   a force application structure coupled to the gimbaled structure, the force application structure configured for moving of the bar material toward and away from the surface of the substrate, when the substrate is present, and further configured for applying a force that presses the outer surface of the bar material against the surface of the substrate, when the substrate is present.   
     
     
         20 . The apparatus of  claim 19 , wherein the gimbaled structure is configured for rotation, and wherein the force causes a plastic deformation of the surface of the bar material, thereby depositing a layer of the bar material onto the substrate surface, the layer of the bar material is configured for rinsing off of the substrate surface, and further comprising,
 a fluid delivery system for providing the activation solution to the surface of the substrate, when present, and the activation solution is alkaline or is a surfactant, and a component of the outer surface is ionized by the activation solution.