Inventor · disambiguated record
Kaoru Iwato
Also filed as: IWATO KAORU
50 granted patents·20 pending applications·165 citations·filing 2001–2024
97Inventor score
Top patents by PatentIndex Score
70 records- 0197US9897922B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2016·Granted Feb 20, 2018·10 cites·12 claims
- 0295US7625690B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Granted Dec 1, 2009·24 cites·19 claims
- 0395US7449573B2Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive compositionFUJIFILM CORP·Filed 2005·Granted Nov 11, 2008·18 cites·2 claims
- 0494US8822129B2Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic deviceIWATO KAORU·Filed 2012·Granted Sep 2, 2014·12 cites·18 claims
- 0593US9448482B2Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Sep 20, 2016·9 cites·9 claims
- 0692US8252877B2Polymerizable compound and polymer compound obtained by using the sameHIRANO SHUJI·Filed 2009·Granted Aug 28, 2012·11 cites·10 claims
- 0791US9417528B2Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Granted Aug 16, 2016·7 cites·15 claims
- 0891US9291892B2Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the compositionFUJIFILM CORP·Filed 2014·Granted Mar 22, 2016·7 cites·25 claims
- 0985US9482958B2Method of forming pattern and developer for use in the methodFUJIFILM CORP·Filed 2015·Granted Nov 1, 2016·2 cites·12 claims
- 1084US9718901B2Resin composition and pattern forming method using the sameFUJIFILM CORP·Filed 2014·Granted Aug 1, 2017·4 cites·28 claims
- 1184US8999621B2Pattern forming method, chemical amplification resist composition and resist filmENOMOTO YUICHIRO·Filed 2010·Granted Apr 7, 2015·4 cites·58 claims
- 1284US8999622B2Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2012·Granted Apr 7, 2015·4 cites·13 claims
- 1384US8158326B2Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive compositionKODAMA KUNIHIKO·Filed 2008·Granted Apr 17, 2012·4 cites·30 claims
- 1482US8617788B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameKATO TAKAYUKI·Filed 2010·Granted Dec 31, 2013·4 cites·13 claims
- 1581US9250532B2Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2013·Granted Feb 2, 2016·3 cites·20 claims
- 1681US6841330B2Planographic printing plate precursorFUJI PHOTO FILM CO LTD·Filed 2001·Granted Jan 11, 2005·13 cites·19 claims
- 1778US9097973B2Method of forming pattern and developer for use in the methodENOMOTO YUICHIRO·Filed 2011·Granted Aug 4, 2015·2 cites·8 claims
- 1878US8771916B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameHIRANO SHUJI·Filed 2009·Granted Jul 8, 2014·2 cites·21 claims
- 1977US8802349B2Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the compositionYOSHIDOME MASAHIRO·Filed 2010·Granted Aug 12, 2014·4 cites·14 claims
- 2072US10248019B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmFUJIFILM CORP·Filed 2012·Granted Apr 2, 2019·1 cites·9 claims
- 2172US9760003B2Pattern forming method and actinic-ray- or radiation-sensitive resin compositionIWATO KAORU·Filed 2011·Granted Sep 12, 2017·2 cites·36 claims
- 2272US9709892B2Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the sameKATAOKA SHOHEI·Filed 2011·Granted Jul 18, 2017·2 cites·9 claims
- 2372US9075310B2Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, resist composition, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Jul 7, 2015·2 cites·15 claims
- 2469US8795944B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the compositionSAEGUSA HIROSHI·Filed 2009·Granted Aug 5, 2014·2 cites·28 claims
- 2568US9411230B2Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Aug 9, 2016·1 cites·25 claims
- 2664US9551935B2Pattern forming method and resist compositionKATO KEITA·Filed 2011·Granted Jan 24, 2017·1 cites·34 claims
- 2759US7887988B2Positive resist composition and pattern forming method using the sameFUJIFILM CORP·Filed 2007·Granted Feb 15, 2011·5 cites·4 claims
- 2859US7160667B2Image forming materialFUJI PHOTO FILM CO LTD·Filed 2004·Granted Jan 9, 2007·2 cites·7 claims
- 2958US8362170B2Polymerizable compound and polymer compound obtained by using the sameFUJIFILM CORP·Filed 2012·Granted Jan 29, 2013·0 cites·8 claims
- 3058US2024170272A1Standard sample film, method for producing standard sample film, standard sample, sample set, quantitative analysis method, and transfer filmFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 3157US6958205B2Image forming material and ammonium compoundFUJI PHOTO FILM CO LTD·Filed 2002·Granted Oct 25, 2005·2 cites·15 claims
- 3257US2014205947A1Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 3357US2014127629A1Method of forming patternFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 3455US2017102618A1Method of forming patternFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 3554US8722319B2Pattern forming method, chemical amplification resist composition and resist filmIWATO KAORU·Filed 2011·Granted May 13, 2014·0 cites·15 claims
- 3653US8663907B2Method of forming patternKATO KEITA·Filed 2011·Granted Mar 4, 2014·0 cites·18 claims
- 3751US8956802B2Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2013·Granted Feb 17, 2015·0 cites·17 claims
- 3851US2010152400A1Polymerizable compound, lactone-containing compound, method for manufacturing lactone-containing compound and polymer compound obtained by polymerizing the polymerizable compoundFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 3949US8753802B2Pattern forming method, chemical amplification resist composition and resist filmFUJIFILM CORP·Filed 2012·Granted Jun 17, 2014·0 cites·16 claims
- 4049US7442490B2Positive resist composition and pattern formation method using the positive resist compositionFUJIFILM CORP·Filed 2007·Granted Oct 28, 2008·0 cites·9 claims
- 4148US9017917B2Resist composition and method of forming pattern therewithIWATO KAORU·Filed 2009·Granted Apr 28, 2015·0 cites·14 claims
- 4247US9086627B2Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2014·Granted Jul 21, 2015·0 cites·19 claims
- 4347US8859192B2Negative pattern forming method and resist patternFUJIFILM CORP·Filed 2013·Granted Oct 14, 2014·0 cites·9 claims
- 4447US2008161532A1Composition for forming low-dielectric-constant film, insulating film, and electronic deviceFUJIFILM CORP·Filed 2007·Application pending·0 cites
- 4547US2009048421A1Film forming composition, film, and electronic deviceFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 4646US2014212814A1Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 4745US9454079B2Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2014·Granted Sep 27, 2016·0 cites·11 claims
- 4845US7687219B2Positive resist composition and pattern formation method using the positive resist compositionFUJIFILM CORP·Filed 2006·Granted Mar 30, 2010·0 cites·12 claims
- 4944US9223219B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist filmENOMOTO YUICHIRO·Filed 2011·Granted Dec 29, 2015·0 cites·36 claims
- 5044US2009221779A1Film forming composition, insulating film, and electronic deviceFUJIFILM CORP·Filed 2009·Application pending·0 cites
Showing the top 50 of 70 patent records by PatentIndex Score.
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