Inventor · disambiguated record
Kozo Ogino
Also filed as: OGINO KOZO
15 granted patents·1 pending application·167 citations·filing 2001–2011
90Inventor score
Files withFUJITSU SEMICONDUCTOR LTD5FUJITSU LTD4FUJITSU MICROELECTRONICS LTD3OGINO KOZO2MINEMURA MASAHIKO1
Top patents by PatentIndex Score
16 records- 0194US6677089B2Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure methodFUJITSU LTD·Filed 2002·Granted Jan 13, 2004·68 cites·47 claims
- 0293US6544700B2Charged particle beam exposure methodFUJITSU LTD·Filed 2001·Granted Apr 8, 2003·62 cites·10 claims
- 0382US7205078B2Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this methodFUJITSU LTD·Filed 2004·Granted Apr 17, 2007·19 cites·29 claims
- 0476US7500219B2Exposure data generator and method thereofFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Mar 3, 2009·5 cites·1 claims
- 0576US7240307B2Pattern size correcting device and pattern size correcting methodFUJITSU LTD·Filed 2005·Granted Jul 3, 2007·5 cites·36 claims
- 0671US8298732B2Exposure method and method of making a semiconductor deviceMINEMURA MASAHIKO·Filed 2011·Granted Oct 30, 2012·2 cites·10 claims
- 0769US8429573B2Data generation method for semiconductor device, and electron beam exposure systemOGINO KOZO·Filed 2009·Granted Apr 23, 2013·3 cites·8 claims
- 0856US7861210B2Exposure data generator and method thereofFUJITSU SEMICONDUCTOR LTD·Filed 2009·Granted Dec 28, 2010·0 cites·10 claims
- 0953US8022376B2Method for manufacturing semiconductor device or photomaskFUJITSU SEMICONDUCTOR LTD·Filed 2009·Granted Sep 20, 2011·0 cites·17 claims
- 1050US7707540B2Exposure data generation method and device, exposure data verification method and device and storage mediumFUJITSU MICROELECTRONICS LTD·Filed 2006·Granted Apr 27, 2010·0 cites·8 claims
- 1146US7939246B2Charged particle beam projection methodFUJITSU SEMICONDUCTOR LTD·Filed 2006·Granted May 10, 2011·0 cites·12 claims
- 1245US8048600B2Parameter extracting methodFUJITSU SEMICONDUCTOR LTD·Filed 2005·Granted Nov 1, 2011·2 cites·7 claims
- 1344US2010162198A1Exposure data generation method and device, exposure data verification method and device and storage mediumFUJITSU MICROELECTRONICS LTD·Filed 2010·Application pending·0 cites
- 1443US8141009B2Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic processMIYAJIMA MASAAKI·Filed 2009·Granted Mar 20, 2012·0 cites·9 claims
- 1537US7977018B2Exposure data preparation method and exposure methodFUJITSU SEMICONDUCTOR LTD·Filed 2008·Granted Jul 12, 2011·1 cites·20 claims
- 1628US8158312B2Exposure method using charged particle beamOGINO KOZO·Filed 2010·Granted Apr 17, 2012·0 cites·11 claims
Join the waitlist — get patent alerts
Get an alert when Kozo Ogino files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →