Inventor · disambiguated record
Richard R. Mett
Also filed as: METT RICHARD · METT RICHARD R · METT RICHARD RAYMOND
18 granted patents·2 pending applications·962 citations·filing 1996–2017
96Inventor score
Files withAPPLIED MATERIALS INC12MEDICAL COLLEGE WISCONSIN INC2APPLIED MATERIAL INC1HYDE JAMES S1MCW RES FOUND INC1
Top patents by PatentIndex Score
20 records- 0196US6568346B2Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supplyAPPLIED MATERIALS INC·Filed 2001·Granted May 27, 2003·66 cites·22 claims
- 0296US6232236B1Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1999·Granted May 15, 2001·134 cites·32 claims
- 0396US6198616B1Method and apparatus for supplying a chucking voltage to an electrostatic chuck within a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1998·Granted Mar 6, 2001·271 cites·32 claims
- 0495US6825618B2Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supplyFiled 2003·Granted Nov 30, 2004·60 cites·4 claims
- 0595US6273022B1Distributed inductively-coupled plasma sourceAPPLIED MATERIALS INC·Filed 1998·Granted Aug 14, 2001·96 cites·42 claims
- 0687US5737177AApparatus and method for actively controlling the DC potential of a cathode pedestalAPPLIED MATERIALS INC·Filed 1996·Granted Apr 7, 1998·93 cites·13 claims
- 0786US8674694B2Coil system and method for post-exposure dosimetry using electron paramagnetic resonance spectroscopyHYDE JAMES S·Filed 2010·Granted Mar 18, 2014·12 cites·11 claims
- 0884US5952896AImpedance matching networkAPPLIED MATERIALS INC·Filed 1997·Granted Sep 14, 1999·51 cites·14 claims
- 0978US6605177B2Substrate support with gas feed-through and methodAPPLIED MATERIAL INC·Filed 2002·Granted Aug 12, 2003·15 cites·11 claims
- 1077US6500299B1Chamber having improved gas feed-through and methodAPPLIED MATERIALS INC·Filed 1999·Granted Dec 31, 2002·37 cites·19 claims
- 1175US6304424B1Method and apparatus for minimizing plasma destabilization within a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1999·Granted Oct 16, 2001·45 cites·15 claims
- 1270US5989349ADiagnostic pedestal assembly for a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1997·Granted Nov 23, 1999·36 cites·41 claims
- 1367US6005376ADC power supplyAPPLIED MATERIALS INC·Filed 1998·Granted Dec 21, 1999·22 cites·11 claims
- 1461US6828789B2Cavity resonator for electron paramagnetic resonance spectroscopy having axially uniform fieldMCW RES FOUND INC·Filed 2002·Granted Dec 7, 2004·9 cites·34 claims
- 1553US11385307B2Strongly coupled fourth-order resonance coil systems for enhanced signal detectionMEDICAL COLLEGE WISCONSIN INC·Filed 2017·Granted Jul 12, 2022·0 cites·20 claims
- 1651US2018340991A1High q-factor magnetic resonance imaging radio frequency coil device and methodsMEDICAL COLLEGE WISCONSIN INC·Filed 2015·Application pending·0 cites
- 1745US7088101B2Aqueous sample holder for EPR and MR spectroscopyMOLECULAR SPECIALTIES INC·Filed 2004·Granted Aug 8, 2006·7 cites·26 claims
- 1843US6539621B1Safety guard for an RF connectorAPPLIED MATERIALS INC·Filed 2000·Granted Apr 1, 2003·2 cites·7 claims
- 1940US6273736B1Safety guard for an RF connectorAPPLIED MATERIALS INC·Filed 1997·Granted Aug 14, 2001·6 cites·28 claims
- 2040US2001009139A1Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing systemFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →