Inventor · disambiguated record
Sumi Tanaka
Also filed as: TANAKA SUMI
24 granted patents·19 pending applications·1,541 citations·filing 1988–2021
96Inventor score
Top patents by PatentIndex Score
43 records- 0198US7837828B2Substrate supporting structure for semiconductor processing, and plasma processing deviceTOKYO ELECTRON LTD·Filed 2005·Granted Nov 23, 2010·194 cites·15 claims
- 0297US8246900B2Annealing apparatusKASAI SHIGERU·Filed 2007·Granted Aug 21, 2012·468 cites·18 claims
- 0396US5647945AVacuum processing apparatusTOKYO ELECTRON LTD·Filed 1994·Granted Jul 15, 1997·308 cites·2 claims
- 0490US5951772AVacuum processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Sep 14, 1999·104 cites·5 claims
- 0589US6036782AShower headTOKYO ELECTRON LTD·Filed 1998·Granted Mar 14, 2000·109 cites·13 claims
- 0689US5525160AFilm deposition processing device having transparent support and transfer pinsTOKYO ELECTRON LTD·Filed 1994·Granted Jun 11, 1996·78 cites·4 claims
- 0789US5332442ASurface processing apparatusTOKYO ELECTRON LTD·Filed 1992·Granted Jul 26, 1994·139 cites·14 claims
- 0877US7250094B2Heat treatment apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jul 31, 2007·6 cites·13 claims
- 0977US6733593B1Film forming deviceTOKYO ELECTRON LTD·Filed 2000·Granted May 11, 2004·21 cites·20 claims
- 1069US8197601B2Vaporizer, vaporization module and film forming apparatusTANAKA SUMI·Filed 2009·Granted Jun 12, 2012·3 cites·22 claims
- 1169US5972114AFilm deposition apparatus with anti-adhesion film and chamber cooling meansTOKYO ELECTRON LTD·Filed 1996·Granted Oct 26, 1999·32 cites·5 claims
- 1265US11538667B2Stage, plasma processing apparatus, and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Dec 27, 2022·0 cites·16 claims
- 1364US9224623B2Microwave irradiation apparatusKASAI SHIGERU·Filed 2012·Granted Dec 29, 2015·2 cites·8 claims
- 1464US4901011ACarrier for transferring plate-like objects one by one, a handling apparatus for loading or unloading the carrier, and a wafer probing machine fitted with the handling apparatus for the wafer carrierTOKYO ELECTRON LTD·Filed 1988·Granted Feb 13, 1990·30 cites·17 claims
- 1561US7769279B2Heat treatment apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Aug 3, 2010·1 cites·14 claims
- 1661US7547860B2Microwave plasma processing apparatus for semiconductor element productionTOKYO ELECTRON LTD·Filed 2004·Granted Jun 16, 2009·7 cites·11 claims
- 1760US7842229B2Substrate processing apparatus and substrate rotating deviceTOKYO ELECTRON LTD·Filed 2005·Granted Nov 30, 2010·1 cites·12 claims
- 1856US4950982AElectric probing test machineTOKYO ELECTRON LTD·Filed 1990·Granted Aug 21, 1990·18 cites·3 claims
- 1953USD340150SAuxiliary music stand for a pianoTANAKA SUMI·Filed 1990·Granted Oct 12, 1993·8 cites·1 claims
- 2052US8440939B2Annealing deviceKASAI SHIGERU·Filed 2008·Granted May 14, 2013·0 cites·9 claims
- 2148US12094694B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Sep 17, 2024·0 cites·11 claims
- 2248US2010163183A1Mounting table structure and heat treatment apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2348US2012279944A1Annealing apparatusKASAI SHIGERU·Filed 2012·Application pending·0 cites
- 2447US11929234B2Plasma processing apparatus and lower stageTOKYO ELECTRON LTD·Filed 2019·Granted Mar 12, 2024·0 cites·6 claims
- 2547US2021071302A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 2646US2014291318A1Microwave heating apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2746US2011180002A1Vaporizer and deposition system using the sameTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2846US2015136759A1Microwave heating apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2945US6042653ASusceptor for bearing an object to be processed thereonTOKYO ELECTRON LTD·Filed 1998·Granted Mar 28, 2000·12 cites·9 claims
- 3044US2014248784A1Microwave processing apparatus and microwave processing methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 3143US2006160359A1Vacuum processing apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3242US2013168389A1Microwave heating apparatus and processing methodTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
- 3342US2014034636A1Microwave irradiation apparatusTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3440US7618494B2Substrate holding structure and substrate processing deviceTOKYO ELECTRON LTD·Filed 2004·Granted Nov 17, 2009·0 cites·9 claims
- 3539US2010186673A1Vaporizer, material gas supply system including vaporizer and film forming apparatus using such systemTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 3638US2015090708A1Microwave heating apparatus and processing methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 3738US2007163713A1Gas supply system and processing systemKASAI SHIGERU·Filed 2003·Application pending·0 cites
- 3836US2011005686A1Loading table structure and processing deviceTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 3936US2002046810A1Processing apparatusFiled 2001·Application pending·0 cites
- 4035US2005189074A1Gas processing apparatus and method and computer storage medium storing program for controlling sameTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 4135US2004020599A1Treating deviceFiled 2001·Application pending·0 cites
- 4235US2010163188A1Mounting table structure and processing apparatusTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 4329US2012118504A1Processing apparatus and method for operating sameNOMURA MASAMICHI·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →