Inventor · disambiguated record
Takehiko Naruoka
Also filed as: NARUOKA TAKEHIKO
30 granted patents·17 pending applications·14 citations·filing 2008–2021
92Inventor score
Top patents by PatentIndex Score
47 records- 0184US10018911B2Chemically amplified resist material and resist pattern-forming methodJSR CORP·Filed 2016·Granted Jul 10, 2018·4 cites·15 claims
- 0284US9587065B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Mar 7, 2017·2 cites·19 claims
- 0379US10073349B2Chemically amplified resist material, pattern-forming method, compound, and production method of compoundUNIV OSAKA·Filed 2016·Granted Sep 11, 2018·2 cites·19 claims
- 0470US8703395B2Pattern-forming methodNAMAI HAYATO·Filed 2011·Granted Apr 22, 2014·3 cites·14 claims
- 0570US8697331B2Compound, polymer, and radiation-sensitive compositionSAKAKIBARA HIROKAZU·Filed 2010·Granted Apr 15, 2014·2 cites·7 claims
- 0666US11705331B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2021·Granted Jul 18, 2023·0 cites·20 claims
- 0766US9989849B2Chemically amplified resist material and resist pattern-forming methodJSR CORP·Filed 2016·Granted Jun 5, 2018·1 cites·20 claims
- 0859US11335559B2Pattern-forming method, and compositionJSR CORP·Filed 2020·Granted May 17, 2022·0 cites·24 claims
- 0959US10950438B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2019·Granted Mar 16, 2021·0 cites·19 claims
- 1058US9557644B2Base film-forming composition, and directed self-assembly lithography methodJSR CORP·Filed 2014·Granted Jan 31, 2017·0 cites·16 claims
- 1152US10146130B2Composition for base, and directed self-assembly lithography methodJSR CORP·Filed 2017·Granted Dec 4, 2018·0 cites·10 claims
- 1252US2018342387A1Pattern-forming method, and compositionJSR CORP·Filed 2018·Application pending·0 cites
- 1352US2017088740A1Base film-forming composition, and directed self-assembly lithography methodJSR CORP·Filed 2016·Application pending·0 cites
- 1451US11211246B2Method and composition for selectively modifying base material surfaceJSR CORP·Filed 2019·Granted Dec 28, 2021·0 cites·20 claims
- 1550US11370872B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2019·Granted Jun 28, 2022·0 cites·19 claims
- 1648US10691019B2Pattern-forming method and compositionJSR CORP·Filed 2019·Granted Jun 23, 2020·0 cites·20 claims
- 1747US8722306B2Radiation-sensitive resin compositionSAKAKIBARA HIROKAZU·Filed 2008·Granted May 13, 2014·0 cites·7 claims
- 1847US2019243244A1Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2019·Application pending·0 cites
- 1947US2010255420A1Radiation sensitive resin composition and polymerJSR CORP·Filed 2008·Application pending·0 cites
- 2046US9690192B2Composition for base, and directed self-assembly lithography methodJSR CORP·Filed 2015·Granted Jun 27, 2017·0 cites·15 claims
- 2146US2019194365A1Composition, modification method and selective modification method of base material surface, pattern-forming method, and polymerJSR CORP·Filed 2019·Application pending·0 cites
- 2246US2020041898A1Radiation-sensitive composition and resist pattern-forming methodJSR CORP·Filed 2019·Application pending·0 cites
- 2344US9738746B2Composition for pattern formation, pattern-forming method, and block copolymerJSR CORP·Filed 2016·Granted Aug 22, 2017·0 cites·20 claims
- 2444US2013260315A1Radiation-sensitive resin composition, pattern-forming method, polymer, and compoundJSR CORP·Filed 2013·Application pending·0 cites
- 2544US2019310551A1Radiation-sensitive composition, pattern-forming method and metal oxideJSR CORP·Filed 2019·Application pending·0 cites
- 2643US11460767B2Composition for film formation, film-forming method and directed self-assembly lithography processJSR CORP·Filed 2019·Granted Oct 4, 2022·0 cites·17 claims
- 2743US11204552B2Radiation-sensitive composition, pattern-forming method and radiation-sensitive acid generating agentJSR CORP·Filed 2018·Granted Dec 21, 2021·0 cites·17 claims
- 2842US9599892B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Mar 21, 2017·0 cites·17 claims
- 2942US9534135B2Composition for pattern formation, and pattern-forming methodJSR CORP·Filed 2015·Granted Jan 3, 2017·0 cites·20 claims
- 3041US2019146340A1Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2019·Application pending·0 cites
- 3140US10120282B2Chemically amplified resist material and resist pattern-forming methodJSR CORP·Filed 2016·Granted Nov 6, 2018·0 cites·11 claims
- 3240US2017269476A1Photoresist composition, production method of photoresist composition, and resist pattern-forming methodJSR CORP·Filed 2017·Application pending·0 cites
- 3340US2015252216A1Pattern-forming method and directed self-assembling compositionJSR CORP·Filed 2015·Application pending·0 cites
- 3439US10725376B2Pattern-forming methodJSR CORP·Filed 2017·Granted Jul 28, 2020·0 cites·20 claims
- 3538US2012183902A1Radiation-sensitive resin compositionNAKAGAWA HIROKI·Filed 2011·Application pending·0 cites
- 3638US2012070783A1Radiation-sensitive resin composition, polymer, and method for forming resist patternSAKAKIBARA HIROKAZU·Filed 2011·Application pending·0 cites
- 3738US2017299962A1Radiation-sensitive composition and pattern-forming methodJSR CORP·Filed 2017·Application pending·0 cites
- 3837US9971247B2Pattern-forming methodUNIV OSAKA·Filed 2016·Granted May 15, 2018·0 cites·5 claims
- 3937US9939729B2Resist pattern-forming methodJSR CORP·Filed 2016·Granted Apr 10, 2018·0 cites·10 claims
- 4037US9487868B2Pattern-forming methodJSR CORP·Filed 2015·Granted Nov 8, 2016·0 cites·13 claims
- 4137US8530692B2Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compoundMATSUMURA NOBUJI·Filed 2011·Granted Sep 10, 2013·0 cites·11 claims
- 4237US2011151378A1Radiation-sensitive resin composition for liquid immersion lithography, polymer, and resist pattern-forming methodJSR CORP·Filed 2010·Application pending·0 cites
- 4337US2017059992A1Resist pattern-forming method and chemically amplified radiation-sensitive resin compositionJSR CORP·Filed 2016·Application pending·0 cites
- 4436US10520815B2Pattern-forming methodJSR CORP·Filed 2017·Granted Dec 31, 2019·0 cites·22 claims
- 4536US10073348B2Resist-pattern-forming method and chemically amplified resist materialUNIV OSAKA·Filed 2016·Granted Sep 11, 2018·0 cites·20 claims
- 4636US2011014569A1Radiation-sensitive resin composition and polymerJSR CORP·Filed 2010·Application pending·0 cites
- 4731US9598520B2Radiation-sensitive resin composition, polymer and method for forming a resist patternKIRIDOSHI Yuko·Filed 2012·Granted Mar 21, 2017·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →