Inventor · disambiguated record
Ramprakash Sankarakrishnan
Also filed as: SANKARAKRISHNAN RAMPRAKASH
34 granted patents·6 pending applications·115 citations·filing 2008–2023
96Inventor score
Top patents by PatentIndex Score
40 records- 0197US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0296US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 0395US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 0493US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 0592US9725806B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2015·Granted Aug 8, 2017·7 cites·17 claims
- 0690US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 0790US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 0887US10450653B2High impedance RF filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2018·Granted Oct 22, 2019·1 cites·17 claims
- 0986US9299581B2Methods of dry stripping boron-carbon filmsLEE KWANGDUK DOUGLAS·Filed 2012·Granted Mar 29, 2016·8 cites·8 claims
- 1085US11898249B2PECVD processAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·17 claims
- 1184US10125422B2High impedance RF filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2014·Granted Nov 13, 2018·4 cites·15 claims
- 1284US7699935B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2008·Granted Apr 20, 2010·3 cites·6 claims
- 1380US10094486B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2015·Granted Oct 9, 2018·1 cites·14 claims
- 1480US9922819B2Wafer rotation in a semiconductor chamberAPPLIED MATERIALS INC·Filed 2017·Granted Mar 20, 2018·2 cites·20 claims
- 1578US9593419B2Wafer rotation in a semiconductor chamberAPPLIED MATERIALS INC·Filed 2015·Granted Mar 14, 2017·2 cites·11 claims
- 1678US9428424B2Critical chamber component surface improvement to reduce chamber particlesAPPLIED MATERIALS INC·Filed 2015·Granted Aug 30, 2016·1 cites·20 claims
- 1776US10290459B2Magnetron having enhanced cooling characteristicsAPPLIED MATERIALS INC·Filed 2018·Granted May 14, 2019·1 cites·20 claims
- 1876US8778813B2Confined process volume PECVD chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2011·Granted Jul 15, 2014·4 cites·17 claims
- 1975US10090187B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2017·Granted Oct 2, 2018·1 cites·20 claims
- 2073US10128118B2Bottom and side plasma tuning having closed loop controlAPPLIED MATERIALS INC·Filed 2013·Granted Nov 13, 2018·2 cites·18 claims
- 2173US10030306B2PECVD apparatus and processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 24, 2018·1 cites·16 claims
- 2272US9206511B2Method and system for supplying a cleaning gas into a process chamberAPPLIED MATERIALS INC·Filed 2013·Granted Dec 8, 2015·0 cites·17 claims
- 2371US2010012273A1Method and System for Supplying a Cleaning Gas Into a Process ChamberAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 2466US8591699B2Method and system for supplying a cleaning gas into a process chamberSANKARAKRISHNAN RAMPRAKASH·Filed 2012·Granted Nov 26, 2013·0 cites·20 claims
- 2565US2020010957A1High impedance rf filter for heater with impedance tuning deviceAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2663US10971389B2Multi-zone pedestal for plasma processingAPPLIED MATERIALS INC·Filed 2018·Granted Apr 6, 2021·0 cites·22 claims
- 2763US10161035B2Apparatus and method for purging gaseous compoundsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 25, 2018·0 cites·8 claims
- 2862US10811301B2Dual-zone heater for plasma processingAPPLIED MATERIALS INC·Filed 2019·Granted Oct 20, 2020·0 cites·18 claims
- 2961US10370764B2Isolator for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2014·Granted Aug 6, 2019·0 cites·17 claims
- 3061US2019360102A1Isolator for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3157US10910227B2Bottom and side plasma tuning having closed loop controlAPPLIED MATERIALS INC·Filed 2018·Granted Feb 2, 2021·0 cites·16 claims
- 3257US10141153B2Magnetron having enhanced cooling characteristicsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 27, 2018·0 cites·17 claims
- 3355US10510518B2Methods of dry stripping boron-carbon filmsAPPLIED MATERIALS INC·Filed 2015·Granted Dec 17, 2019·0 cites·19 claims
- 3454US10497606B2Dual-zone heater for plasma processingAPPLIED MATERIALS INC·Filed 2016·Granted Dec 3, 2019·0 cites·10 claims
- 3553US10385448B2Apparatus and method for purging gaseous compoundsAPPLIED MATERIALS INC·Filed 2013·Granted Aug 20, 2019·0 cites·17 claims
- 3651US2014216498A1Methods of dry stripping boron-carbon filmsLEE KWANGDUK DOUGLAS·Filed 2013·Application pending·0 cites
- 3750US2016133443A1Methods of dry stripping boron-carbon filmsAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 3849US10544508B2Controlling temperature in substrate processing systemsAPPLIED MATERIALS INC·Filed 2013·Granted Jan 28, 2020·0 cites·18 claims
- 3944US2014287593A1High throughput multi-layer stack depositionAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4038US10541159B2Processing chamber with irradiance curing lensAPPLIED MATERIALS INC·Filed 2016·Granted Jan 21, 2020·0 cites·6 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →