Inventor · disambiguated record
Peter I. Porshnev
Also filed as: PORSHNEV PETER · PORSHNEV PETER I
32 granted patents·13 pending applications·883 citations·filing 2002–2020
96Inventor score
Top patents by PatentIndex Score
45 records- 0199US6863019B2Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gasAPPLIED MATERIALS INC·Filed 2002·Granted Mar 8, 2005·608 cites·6 claims
- 0297US6828241B2Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma sourceAPPLIED MATERIALS INC·Filed 2002·Granted Dec 7, 2004·144 cites·56 claims
- 0391US7651384B2Method and system for point of use recycling of ECMP fluidsAPPLIED MATERIALS INC·Filed 2007·Granted Jan 26, 2010·14 cites·10 claims
- 0487US10529541B2Inductive plasma source with metallic shower head using B-field concentratorAPPLIED MATERIALS INC·Filed 2017·Granted Jan 7, 2020·3 cites·19 claims
- 0587US7160521B2Treatment of effluent from a substrate processing chamberAPPLIED MATERIALS INC·Filed 2003·Granted Jan 9, 2007·52 cites·13 claims
- 0685US10014164B2Ion beam materials processing system with grid short clearing system for gridded ion beam sourceVEECO INSTR INC·Filed 2017·Granted Jul 3, 2018·6 cites·17 claims
- 0785US8354035B2Method for removing implanted photo resist from hard disk drive substratesAPPLIED MATERIALS INC·Filed 2010·Granted Jan 15, 2013·4 cites·19 claims
- 0884US10128083B2Ion sources and methods for generating ion beams with controllable ion current density distributions over large treatment areasVEECO INSTR INC·Filed 2016·Granted Nov 13, 2018·4 cites·20 claims
- 0984US7970483B2Methods and apparatus for improving operation of an electronic device manufacturing systemAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·8 cites·16 claims
- 1080US8586952B2Temperature control of a substrate during a plasma ion implantation process for patterned disc media applicationsHILKENE MARTIN A·Filed 2010·Granted Nov 19, 2013·5 cites·17 claims
- 1179US8900405B2Plasma immersion ion implantation reactor with extended cathode process ringPORSHNEV PETER I·Filed 2007·Granted Dec 2, 2014·6 cites·18 claims
- 1278US8802522B2Methods to adjust threshold voltage in semiconductor devicesWARD MICHAEL G·Filed 2011·Granted Aug 12, 2014·7 cites·20 claims
- 1376US7601264B2Method for treatment of plating solutionsAPPLIED MATERIALS INC·Filed 2006·Granted Oct 13, 2009·3 cites·12 claims
- 1475US7659184B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2008·Granted Feb 9, 2010·3 cites·13 claims
- 1574US11450509B2Inductive plasma source with metallic shower head using b-field concentratorAPPLIED MATERIALS INC·Filed 2020·Granted Sep 20, 2022·0 cites·20 claims
- 1673US8642128B2Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber wallsCHOI DONGWON·Filed 2010·Granted Feb 4, 2014·4 cites·17 claims
- 1771US7674723B2Plasma immersion ion implantation using an electrode with edge-effect suppression by a downwardly curving edgeAPPLIED MATERIALS INC·Filed 2008·Granted Mar 9, 2010·2 cites·18 claims
- 1869US8658242B2Resist fortification for magnetic media patterningBENCHER CHRISTOPHER D·Filed 2011·Granted Feb 25, 2014·2 cites·16 claims
- 1967US8003500B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2009·Granted Aug 23, 2011·1 cites·7 claims
- 2066US10233538B2Demagnetization of magnetic media by C doping for HDD patterned media applicationAPPLIED MATERIALS INC·Filed 2016·Granted Mar 19, 2019·0 cites·20 claims
- 2165US8129261B2Conformal doping in P3I chamberPORSHNEV PETER I·Filed 2009·Granted Mar 6, 2012·2 cites·11 claims
- 2265US7838399B2Plasma immersed ion implantation process using balanced etch-deposition processAPPLIED MATERIALS INC·Filed 2007·Granted Nov 23, 2010·1 cites·4 claims
- 2364US9376746B2Demagnetization of magnetic media by C doping for HDD patterned media applicationHILKENE MARTIN A·Filed 2012·Granted Jun 28, 2016·0 cites·9 claims
- 2461US7532952B2Methods and apparatus for pressure control in electronic device manufacturing systemsAPPLIED MATERIALS INC·Filed 2007·Granted May 12, 2009·3 cites·12 claims
- 2559US9646642B2Resist fortification for magnetic media patterningAPPLIED MATERIALS INC·Filed 2014·Granted May 9, 2017·0 cites·9 claims
- 2656US8288257B2Doping profile modification in P3I processSCOTNEY-CASTLE MATTHEW D·Filed 2009·Granted Oct 16, 2012·1 cites·20 claims
- 2750US7968401B2Reducing photoresist layer degradation in plasma immersion ion implantationAPPLIED MATERIALS INC·Filed 2009·Granted Jun 28, 2011·0 cites·20 claims
- 2849US2017206922A1Resist fortification for magnetic media patterningAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2949US2013017315A1Methods and apparatus for controlling power distribution in substrate processing systemsAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 3048US2013014894A1Methods and apparatus for controlling power distribution in substrate processing systemsAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 3147US2009175771A1Abatement of effluent gasAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3246US8273624B2Plasma immersed ion implantation process using balanced etch-deposition processPORSHNEV PETER·Filed 2010·Granted Sep 25, 2012·0 cites·6 claims
- 3345US2011278260A1Inductive plasma source with metallic shower head using b-field concentratorLAI CANFENG·Filed 2010·Application pending·0 cites
- 3444US9478437B2Methods for repairing low-k dielectrics using carbon plasma immersionYAO DAPING·Filed 2011·Granted Oct 25, 2016·0 cites·20 claims
- 3544US2011189860A1Methods for nitridation and oxidationAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 3642US7723219B2Plasma immersion ion implantation process with reduced polysilicon gate loss and reduced particle depositionAPPLIED MATERIALS INC·Filed 2008·Granted May 25, 2010·0 cites·18 claims
- 3741US8492177B2Methods for quantitative measurement of a plasma immersion processYAO DAPING·Filed 2011·Granted Jul 23, 2013·0 cites·18 claims
- 3839US2011127156A1Chamber for processing hard disk drive substratesAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3938US2008083623A1Method and apparatus for treatment of plating solutionsGOLDEN JOSH H·Filed 2006·Application pending·0 cites
- 4038US2011281440A1Methods for nitridation and oxidationPORSHNEV PETER·Filed 2011·Application pending·0 cites
- 4137US8501605B2Methods and apparatus for conformal dopingSANTHANAM KARTIK·Filed 2011·Granted Aug 6, 2013·0 cites·18 claims
- 4232US2012302048A1Pre or post-implant plasma treatment for plasma immersed ion implantation processSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 4332US2012088356A1Integrated platform for in-situ doping and activation of substratesSANTHANAM KARTIK·Filed 2011·Application pending·0 cites
- 4431US2012289036A1Surface dose retention of dopants by pre-amorphization and post implant passivation treatmentsSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 4531US2013095643A1Methods for implanting dopant species in a substrateSANTHANAM KARTIK·Filed 2011·Application pending·0 cites
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