Inventor · disambiguated record
Wayne Bather
Also filed as: BATHER WAYNE · BATHER WAYNE A · BATHER WAYNE ANTHONY
7 granted patents·7 pending applications·80 citations·filing 2000–2021
83Inventor score
Top patents by PatentIndex Score
14 records- 0193US7838370B2Highly selective liners for semiconductor fabricationTEXAS INSTRUMENTS INC·Filed 2007·Granted Nov 23, 2010·42 cites·20 claims
- 0281US6812073B2Source drain and extension dopant concentrationTEXAS INSTRUMENTS INC·Filed 2002·Granted Nov 2, 2004·26 cites·12 claims
- 0376US12154987B2Damage implantation of cap layerTEXAS INSTRUMENTS INC·Filed 2021·Granted Nov 26, 2024·0 cites·23 claims
- 0474US7384861B2Strain modulation employing process techniques for CMOS technologiesTEXAS INSTRUMENTS INC·Filed 2005·Granted Jun 10, 2008·5 cites·9 claims
- 0566US7772094B2Implant damage of layer for easy removal and reduced silicon recessTEXAS INSTRUMENTS INC·Filed 2008·Granted Aug 10, 2010·2 cites·29 claims
- 0664US8859377B2Damage implantation of a cap layerNANDAKUMAR MAHALINGAM·Filed 2007·Granted Oct 14, 2014·1 cites·28 claims
- 0756US2017365715A1Damage Implantation of a Cap LayerTEXAS INSTRUMENTS INC·Filed 2017·Application pending·0 cites
- 0849US6686283B1Shallow trench isolation planarization using self aligned isotropic etchTEXAS INSTRUMENTS INC·Filed 2000·Granted Feb 3, 2004·4 cites·34 claims
- 0949US2010252887A1Damage Implantation of a Cap LayerTEXAS INSTRUMENTS INC·Filed 2010·Application pending·0 cites
- 1045US2007196991A1Semiconductor device having a strain inducing sidewall spacer and a method of manufacture thereforTEXAS INSTRUMENTS INC·Filed 2006·Application pending·0 cites
- 1141US2010270622A1Semiconductor Device Having a Strain Inducing Sidewall Spacer and a Method of Manufacture ThereforTEXAS INSTRUMENTS INC·Filed 2010·Application pending·0 cites
- 1240US2006172556A1Semiconductor device having a high carbon content strain inducing film and a method of manufacture thereforTEXAS INSTRUMENTS INC·Filed 2006·Application pending·0 cites
- 1338US2005189660A1Source drain and extension dopant concentrationFiled 2004·Application pending·0 cites
- 1428US2003129804A1Process for reducing dopant loss for semiconductor devicesFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →