Inventor · disambiguated record
Ryousuke Kushibiki
Also filed as: KUSHIBIKI RYOUSUKE
11 granted patents·8 pending applications·12 citations·filing 2012–2021
83Inventor score
Top patents by PatentIndex Score
19 records- 0187US8858674B2FePt—C-based sputtering target and process for producing the sameMIYASHITA TAKANOBU·Filed 2012·Granted Oct 14, 2014·8 cites·15 claims
- 0280US9095901B2FePt-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2014·Granted Aug 4, 2015·1 cites·8 claims
- 0379US11072851B2Sputtering targetTANAKA PRECIOUS METAL IND·Filed 2016·Granted Jul 27, 2021·1 cites·3 claims
- 0476US11810700B2In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistive element, and sputtering targetTANAKA PRECIOUS METAL IND·Filed 2019·Granted Nov 7, 2023·1 cites·20 claims
- 0572US10186404B2FePt—C-based sputtering target and method for manufacturing sameTANAKA PRECIOUS METAL IND·Filed 2014·Granted Jan 22, 2019·1 cites·21 claims
- 0670US9358612B2FePt-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2014·Granted Jun 7, 2016·0 cites·18 claims
- 0770US9314845B2Process for producing FePt-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2014·Granted Apr 19, 2016·0 cites·20 claims
- 0870US9314846B2Process for producing FePt-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2014·Granted Apr 19, 2016·0 cites·26 claims
- 0968US9228255B2FePt-C-based sputtering target and process for producing the sameTANAKA PRECIOUS METAL IND·Filed 2014·Granted Jan 5, 2016·0 cites·33 claims
- 1068US2021269911A1Sputtering targetTANAKA PRECIOUS METAL IND·Filed 2021·Application pending·0 cites
- 1156US10971181B2Sputtering target for magnetic recording mediaTANAKA PRECIOUS METAL IND·Filed 2017·Granted Apr 6, 2021·0 cites·20 claims
- 1252US2022383901A1Sputtering target for heat-assisted magnetic recording mediumTANAKA PRECIOUS METAL IND·Filed 2020·Application pending·0 cites
- 1348US10787732B2FePt-C-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2017·Granted Sep 29, 2020·0 cites·20 claims
- 1448US2021242000A1Sputtering target for magnetic recording mediumTANAKA PRECIOUS METAL IND·Filed 2019·Application pending·0 cites
- 1546US2021087673A1Sputtering targetTANAKA PRECIOUS METAL IND·Filed 2019·Application pending·0 cites
- 1636US2023168319A1In-plane magnetized film multilayer structure, hard bias layer, and magnetoresistive effect elementTANAKA PRECIOUS METAL IND·Filed 2021·Application pending·0 cites
- 1735US2022122635A1Perpendicular magnetic recording mediumTANAKA PRECIOUS METAL IND·Filed 2019·Application pending·0 cites
- 1830US2023203639A1Pt-OXIDE SPUTTERING TARGET AND PERPENDICULAR MAGNETIC RECORDING MEDIUMTANAKA PRECIOUS METAL IND·Filed 2021·Application pending·0 cites
- 1929US2023187109A1In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistance effect element, and sputtering targetTANAKA PRECIOUS METAL IND·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →