Assignee

MIYASHITA TAKANOBU

JP·2 granted patents·10 citations·filing 2011–2012

Technology mixB22F2 C22C2 C23C2 G11B1 H01F1 H01J1

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2 records

0187US8858674B2FePt—C-based sputtering target and process for producing the sameMIYASHITA TAKANOBU·Filed 2012·Granted Oct 14, 2014·8 cites·15 claims
0276US9053910B2Magnetron sputtering target and process for producing the sameMIYASHITA TAKANOBU·Filed 2011·Granted Jun 9, 2015·2 cites·3 claims

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