Inventor · disambiguated record
Johanes S. Swenberg
Also filed as: SWENBERG JOHANES · SWENBERG JOHANES S
21 granted patents·5 pending applications·545 citations·filing 2007–2024
94Inventor score
Top patents by PatentIndex Score
26 records- 0197US8309440B2Method and apparatus for cleaning a substrate surfaceSANCHEZ ERROL ANTONIO C·Filed 2011·Granted Nov 13, 2012·233 cites·20 claims
- 0297US8008166B2Method and apparatus for cleaning a substrate surfaceAPPLIED MATERIALS INC·Filed 2008·Granted Aug 30, 2011·236 cites·20 claims
- 0395US8137463B2Dual zone gas injection nozzleLIU WEI·Filed 2007·Granted Mar 20, 2012·36 cites·8 claims
- 0491US10347492B2Modifying work function of a metal film with a plasma processAPPLIED MATERIALS INC·Filed 2018·Granted Jul 9, 2019·6 cites·17 claims
- 0586US9054048B2NH3 containing plasma nitridation of a layer on a substrateLIU WEI·Filed 2012·Granted Jun 9, 2015·7 cites·16 claims
- 0685US9023700B2Method and apparatus for single step selective nitridationAPPLIED MATERIALS INC·Filed 2014·Granted May 5, 2015·5 cites·11 claims
- 0785US7972933B2Method of selective nitridationAPPLIED MATERIALS INC·Filed 2010·Granted Jul 5, 2011·7 cites·20 claims
- 0884US10103027B2Hydrogenation and nitridization processes for modifying effective oxide thickness of a filmAPPLIED MATERIALS INC·Filed 2017·Granted Oct 16, 2018·3 cites·18 claims
- 0983US9514968B2Methods and apparatus for selective oxidation of a substrateAPPLIED MATERIALS INC·Filed 2015·Granted Dec 6, 2016·3 cites·11 claims
- 1082US8748259B2Method and apparatus for single step selective nitridationGANGULY UDAYAN·Filed 2011·Granted Jun 10, 2014·5 cites·19 claims
- 1176US12473644B2Growth of thin oxide layer with silicon nitride and conversionAPPLIED MATERIALS INC·Filed 2024·Granted Nov 18, 2025·0 cites·23 claims
- 1274US10636650B2Argon addition to remote plasma oxidationAPPLIED MATERIALS INC·Filed 2018·Granted Apr 28, 2020·1 cites·10 claims
- 1369US8198671B2Modification of charge trap silicon nitride with oxygen plasmaOLSEN CHRISTOPHER SEAN·Filed 2010·Granted Jun 12, 2012·3 cites·30 claims
- 1464US11081340B2Argon addition to remote plasma oxidationAPPLIED MATERIALS INC·Filed 2020·Granted Aug 3, 2021·0 cites·20 claims
- 1559US10504779B2Hydrogenation and nitridization processes for reducing oxygen content in a filmAPPLIED MATERIALS INC·Filed 2019·Granted Dec 10, 2019·0 cites·20 claims
- 1657US10431466B2Hydrogenation and nitridization processes for modifying effective oxide thickness of a filmAPPLIED MATERIALS INC·Filed 2018·Granted Oct 1, 2019·0 cites·20 claims
- 1755US2019287805A1Modifying work function of a metal film with a plasma processAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1852US2012164845A1Dual zone gas injection nozzleLIU WEI·Filed 2012·Application pending·0 cites
- 1952US2013068390A1Method and apparatus for cleaning a substrate surfaceAPPLIED MATERIALS INC·Filed 2012·Application pending·0 cites
- 2051US10236207B2Hydrogenation and nitridization processes for reducing oxygen content in a filmAPPLIED MATERIALS INC·Filed 2017·Granted Mar 19, 2019·0 cites·20 claims
- 2150US10971357B2Thin film treatment processAPPLIED MATERIALS INC·Filed 2018·Granted Apr 6, 2021·0 cites·20 claims
- 2249US10510545B2Hydrogenation and nitridization processes for modifying effective oxide thickness of a filmAPPLIED MATERIALS INC·Filed 2019·Granted Dec 17, 2019·0 cites·20 claims
- 2347US2009311877A1Post oxidation annealing of low temperature thermal or plasma based oxidationAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2446US8846509B2Remote radical hydride dopant incorporation for delta doping in siliconAPPLIED MATERIALS INC·Filed 2012·Granted Sep 30, 2014·0 cites·12 claims
- 2544US10580643B2Fluorination during ALD high-k, fluorination post high-k and use of a post fluorination anneal to engineer fluorine bonding and incorporationAPPLIED MATERIALS INC·Filed 2017·Granted Mar 3, 2020·0 cites·20 claims
- 2637US2012222618A1Dual plasma source, lamp heated plasma chamberOLSEN CHRISTOPHER·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →