Inventor · disambiguated record
Kwangduk Douglas Lee
Also filed as: LEE KWANGDUK D · LEE KWANGDUK DOUGLAS · Lee Kwangduk
59 granted patents·29 pending applications·346 citations·filing 2006–2024
98Inventor score
Files withAPPLIED MATERIALS INC76LEE KWANGDUK DOUGLAS6SEAMONS MARTIN JAY3BALASUBRAMANIAN GANESH1VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1
Top patents by PatentIndex Score
88 records- 0197US8560134B1System and method for electric load recognition from centrally monitored power signal and its application to home energy managementLEE KWANGDUK DOUGLAS·Filed 2010·Granted Oct 15, 2013·124 cites·17 claims
- 0296US8361906B2Ultra high selectivity ashable hard mask filmAPPLIED MATERIALS INC·Filed 2010·Granted Jan 29, 2013·63 cites·13 claims
- 0395US8536065B2Ultra high selectivity doped amorphous carbon strippable hardmask development and integrationSEAMONS MARTIN JAY·Filed 2011·Granted Sep 17, 2013·51 cites·17 claims
- 0494US11728168B2Ultra-high modulus and etch selectivity boron-carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2021·Granted Aug 15, 2023·2 cites·18 claims
- 0594US11469107B2Highly etch selective amorphous carbon filmAPPLIED MATERIALS INC·Filed 2020·Granted Oct 11, 2022·4 cites·20 claims
- 0694US10403535B2Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition systemAPPLIED MATERIALS INC·Filed 2015·Granted Sep 3, 2019·11 cites·17 claims
- 0794US8993454B2Ultra high selectivity doped amorphous carbon strippable hardmask development and integrationAPPLIED MATERIALS INC·Filed 2013·Granted Mar 31, 2015·16 cites·5 claims
- 0892US11694902B2Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layersAPPLIED MATERIALS INC·Filed 2021·Granted Jul 4, 2023·2 cites·18 claims
- 0992US10418243B2Ultra-high modulus and etch selectivity boron-carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2016·Granted Sep 17, 2019·6 cites·20 claims
- 1091US11674222B2Method of in situ ceramic coating depositionAPPLIED MATERIALS INC·Filed 2020·Granted Jun 13, 2023·2 cites·19 claims
- 1190US10727059B2Highly etch selective amorphous carbon filmAPPLIED MATERIALS INC·Filed 2018·Granted Jul 28, 2020·6 cites·20 claims
- 1289US10100408B2Edge hump reduction faceplate by plasma modulationAPPLIED MATERIALS INC·Filed 2015·Granted Oct 16, 2018·6 cites·18 claims
- 1388US11031262B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2020·Granted Jun 8, 2021·2 cites·20 claims
- 1488US9711360B2Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD systemAPPLIED MATERIALS INC·Filed 2016·Granted Jul 18, 2017·5 cites·20 claims
- 1586US9390910B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·5 cites·20 claims
- 1686US9299581B2Methods of dry stripping boron-carbon filmsLEE KWANGDUK DOUGLAS·Filed 2012·Granted Mar 29, 2016·8 cites·8 claims
- 1785US11584994B2Pedestal for substrate processing chambersAPPLIED MATERIALS INC·Filed 2019·Granted Feb 21, 2023·1 cites·21 claims
- 1885US10879041B2Method and apparatus of achieving high input impedance without using ferrite materials for RF filter applications in plasma chambersAPPLIED MATERIALS INC·Filed 2016·Granted Dec 29, 2020·4 cites·19 claims
- 1983US12211694B2Ultra-high modulus and etch selectivity boron-carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2023·Granted Jan 28, 2025·0 cites·19 claims
- 2082US10373822B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2019·2 cites·18 claims
- 2180US12000048B2Pedestal for substrate processing chambersAPPLIED MATERIALS INC·Filed 2023·Granted Jun 4, 2024·0 cites·20 claims
- 2279US12112949B2Highly etch selective amorphous carbon filmAPPLIED MATERIALS INC·Filed 2022·Granted Oct 8, 2024·0 cites·29 claims
- 2379US10580623B2Plasma processing using multiple radio frequency power feeds for improved uniformityAPPLIED MATERIALS INC·Filed 2014·Granted Mar 3, 2020·3 cites·11 claims
- 2478US12014927B2Highly etch selective amorphous carbon filmAPPLIED MATERIALS INC·Filed 2022·Granted Jun 18, 2024·0 cites·20 claims
- 2578US10236225B2Method for PECVD overlay improvementAPPLIED MATERIALS INC·Filed 2018·Granted Mar 19, 2019·2 cites·20 claims
- 2677US12234549B2Method of in situ ceramic coating depositionAPPLIED MATERIALS INC·Filed 2023·Granted Feb 25, 2025·0 cites·20 claims
- 2777US12131913B2Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layersAPPLIED MATERIALS INC·Filed 2023·Granted Oct 29, 2024·0 cites·20 claims
- 2877US10679830B2Cleaning process for removing boron-carbon residuals in processing chamber at high temperatureAPPLIED MATERIALS INC·Filed 2017·Granted Jun 9, 2020·2 cites·25 claims
- 2977US9947599B2Method for PECVD overlay improvementAPPLIED MATERIALS INC·Filed 2017·Granted Apr 17, 2018·2 cites·20 claims
- 3077US7776516B2Graded ARC for high NA and immersion lithographyAPPLIED MATERIALS INC·Filed 2006·Granted Aug 17, 2010·4 cites·14 claims
- 3176US10504727B2Thick tungsten hardmask films deposition on high compressive/tensile bow wafersAPPLIED MATERIALS INC·Filed 2017·Granted Dec 10, 2019·2 cites·20 claims
- 3276US2025125129A1Processing chamber deposition confinementAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3375US2023151487A1Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3474US10636684B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2019·Granted Apr 28, 2020·1 cites·20 claims
- 3573US2024363332A1Amorphous carbon for gap fillAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3673US2025022709A1Plasma-enhanced chemical vapor deposition of carbon hard-maskAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3771US9837265B2Gas flow profile modulated control of overlay in plasma CVD filmsAPPLIED MATERIALS INC·Filed 2016·Granted Dec 5, 2017·1 cites·7 claims
- 3869US10403515B2Loadlock integrated bevel etcher systemAPPLIED MATERIALS INC·Filed 2016·Granted Sep 3, 2019·1 cites·13 claims
- 3969US10354875B1Techniques for improved removal of sacrificial maskVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Jul 16, 2019·1 cites·18 claims
- 4068US11560623B2Methods of reducing chamber residuesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 24, 2023·0 cites·16 claims
- 4168US8105465B2Method for depositing conformal amorphous carbon film by plasma-enhanced chemical vapor deposition (PECVD)LEE KWANGDUK DOUGLAS·Filed 2009·Granted Jan 31, 2012·3 cites·17 claims
- 4267US10325800B2High temperature electrostatic chucking with dielectric constant engineered in-situ charge trap materialsAPPLIED MATERIALS INC·Filed 2014·Granted Jun 18, 2019·1 cites·12 claims
- 4367US8513129B2Planarizing etch hardmask to increase pattern density and aspect ratioSEAMONS MARTIN JAY·Filed 2010·Granted Aug 20, 2013·2 cites·13 claims
- 4466US12211673B2Processing chamber deposition confinementAPPLIED MATERIALS INC·Filed 2020·Granted Jan 28, 2025·0 cites·10 claims
- 4565US11276562B2Plasma processing using multiple radio frequency power feeds for improved uniformityAPPLIED MATERIALS INC·Filed 2020·Granted Mar 15, 2022·0 cites·17 claims
- 4664US11699577B2Treatment for high-temperature cleansAPPLIED MATERIALS INC·Filed 2021·Granted Jul 11, 2023·0 cites·20 claims
- 4764US10971364B2Ultra-high modulus and etch selectivity boron carbon hardmask filmsAPPLIED MATERIALS INC·Filed 2018·Granted Apr 6, 2021·0 cites·15 claims
- 4864US10950445B2Deposition of metal silicide layers on substrates and chamber componentsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 16, 2021·0 cites·20 claims
- 4962US10923334B2Selective deposition of hardmaskAPPLIED MATERIALS INC·Filed 2019·Granted Feb 16, 2021·0 cites·23 claims
- 5061US9653327B2Methods of removing a material layer from a substrate using water vapor treatmentLEE KWANGDUK DOUGLAS·Filed 2011·Granted May 16, 2017·1 cites·11 claims
Showing the top 50 of 88 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Kwangduk Douglas Lee files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →