Inventor · disambiguated record
Mark H. Somervell
Also filed as: SOMERVELL MARK · SOMERVELL MARK H · SOMERVELL MARK HOWELL
55 granted patents·10 pending applications·716 citations·filing 2003–2020
98Inventor score
Files withTOKYO ELECTRON LTD43TEXAS INSTRUMENTS INC6FONSECA CARLOS A5SOMERVELL MARK H4CARCASI MICHAEL A2
Top patents by PatentIndex Score
65 records- 0199US9613801B2Integration of absorption based heating bake methods into a photolithography track systemTOKYO ELECTRON LTD·Filed 2015·Granted Apr 4, 2017·464 cites·18 claims
- 0297US9519227B2Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)TOKYO ELECTRON LTD·Filed 2015·Granted Dec 13, 2016·12 cites·20 claims
- 0396US9746774B2Mitigation of EUV shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (PS-CAR)TOKYO ELECTRON LTD·Filed 2015·Granted Aug 29, 2017·10 cites·22 claims
- 0496US7829269B1Dual tone development with plural photo-acid generators in lithographic applicationsTOKYO ELECTRON LTD·Filed 2009·Granted Nov 9, 2010·32 cites·13 claims
- 0595US9349604B2Use of topography to direct assembly of block copolymers in grapho-epitaxial applicationsTOKYO ELECTRON LTD·Filed 2014·Granted May 24, 2016·15 cites·15 claims
- 0694US8795952B2Line pattern collapse mitigation through gap-fill material applicationSOMERVELL MARK H·Filed 2011·Granted Aug 5, 2014·13 cites·20 claims
- 0793US10809620B1Systems and methods for developer drain line monitoringTOKYO ELECTRON LTD·Filed 2019·Granted Oct 20, 2020·8 cites·18 claims
- 0893US9418860B2Use of topography to direct assembly of block copolymers in grapho-epitaxial applicationsTOKYO ELECTRON LTD·Filed 2014·Granted Aug 16, 2016·12 cites·20 claims
- 0993US9412611B2Use of grapho-epitaxial directed self-assembly to precisely cut linesTOKYO ELECTRON LTD·Filed 2014·Granted Aug 9, 2016·10 cites·22 claims
- 1092US10048594B2Photo-sensitized chemically amplified resist (PS-CAR) model calibrationTOKYO ELECTRON LTD·Filed 2016·Granted Aug 14, 2018·5 cites·15 claims
- 1192US10020195B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2015·Granted Jul 10, 2018·8 cites·18 claims
- 1292US9005877B2Method of forming patterns using block copolymers and articles thereofRATHSACK BENJAMEN M·Filed 2012·Granted Apr 14, 2015·11 cites·15 claims
- 1392US8980538B2Chemi-epitaxy in directed self-assembly applications using photo-decomposable agentsTOKYO ELECTRON LTD·Filed 2013·Granted Mar 17, 2015·8 cites·21 claims
- 1489US9454081B2Line pattern collapse mitigation through gap-fill material applicationTOKYO ELECTRON LTD·Filed 2014·Granted Sep 27, 2016·4 cites·20 claims
- 1589US8097402B2Using electric-field directed post-exposure bake for double-patterning (D-P)SCHEER STEVEN·Filed 2009·Granted Jan 17, 2012·20 cites·20 claims
- 1688US8129080B2Variable resist protecting groupsFONSECA CARLOS A·Filed 2009·Granted Mar 6, 2012·13 cites·19 claims
- 1786US11163236B2Method and process for stochastic driven detectivity healingTOKYO ELECTRON LTD·Filed 2020·Granted Nov 2, 2021·2 cites·24 claims
- 1885US10429745B2Photo-sensitized chemically amplified resist (PS-CAR) simulationTOKYO ELECTRON LTD·Filed 2016·Granted Oct 1, 2019·3 cites·24 claims
- 1981US8197996B2Dual tone development processesFONSECA CARLOS A·Filed 2009·Granted Jun 12, 2012·6 cites·27 claims
- 2078US8283111B2Method for creating gray-scale features for dual tone development processesFONSECA CARLOS A·Filed 2008·Granted Oct 9, 2012·5 cites·11 claims
- 2176US10622267B2Facilitation of spin-coat planarization over feature topography during substrate fabricationTOKYO ELECTRON LTD·Filed 2017·Granted Apr 14, 2020·2 cites·19 claims
- 2275US11455436B2Predicting across wafer spin-on planarization over a patterned topographyTOKYO ELECTRON LTD·Filed 2020·Granted Sep 27, 2022·1 cites·21 claims
- 2374US8975009B2Track processing to remove organic films in directed self-assembly chemo-epitaxy applicationsTOKYO ELECTRON LTD·Filed 2014·Granted Mar 10, 2015·3 cites·16 claims
- 2473US8318607B2Immersion lithography wafer edge bead removal for wafer and scanner defect preventionRATHSACK BENJAMEN MICHAEL·Filed 2008·Granted Nov 27, 2012·4 cites·13 claims
- 2572US9147574B2Topography minimization of neutral layer overcoats in directed self-assembly applicationsTOKYO ELECTRON LTD·Filed 2014·Granted Sep 29, 2015·2 cites·20 claims
- 2671US8449293B2Substrate treatment to reduce pattern roughnessRATHSACK BENJAMIN M·Filed 2010·Granted May 28, 2013·3 cites·20 claims
- 2771US8338086B2Method of slimming radiation-sensitive material lines in lithographic applicationsCARCASI MICHAEL A·Filed 2010·Granted Dec 25, 2012·3 cites·18 claims
- 2870US10490402B2UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assemblyTOKYO ELECTRON LTD·Filed 2014·Granted Nov 26, 2019·2 cites·22 claims
- 2969US6900123B2BARC etch comprising a selective etch chemistry and a high polymerizing gas for CD controlTEXAS INSTRUMENTS INC·Filed 2003·Granted May 31, 2005·12 cites·16 claims
- 3068US8129089B2Use of blended solvents in defectivity preventionSOMERVELL MARK H·Filed 2010·Granted Mar 6, 2012·1 cites·10 claims
- 3167US9793137B2Use of grapho-epitaxial directed self-assembly applications to precisely cut logic linesTOKYO ELECTRON LTD·Filed 2016·Granted Oct 17, 2017·1 cites·18 claims
- 3267US9633847B2Using sub-resolution openings to aid in image reversal, directed self-assembly, and selective depositionTOKYO ELECTRON LTD·Filed 2016·Granted Apr 25, 2017·1 cites·26 claims
- 3367US8574810B2Dual tone development with a photo-activated acid enhancement component in lithographic applicationsFONSECA CARLOS A·Filed 2009·Granted Nov 5, 2013·2 cites·20 claims
- 3467US7339240B2Dual-gate integrated circuit semiconductor deviceTEXAS INSTRUMENTS INC·Filed 2006·Granted Mar 4, 2008·2 cites·4 claims
- 3565US8435728B2Method of slimming radiation-sensitive material lines in lithographic applicationsCARCASI MICHAEL A·Filed 2011·Granted May 7, 2013·2 cites·18 claims
- 3660US11538684B2UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assemblyTOKYO ELECTRON LTD·Filed 2019·Granted Dec 27, 2022·0 cites·14 claims
- 3760US7049242B2Post high voltage gate dielectric pattern plasma surface treatmentTEXAS INSTRUMENTS INC·Filed 2004·Granted May 23, 2006·6 cites·21 claims
- 3860US7018925B2Post high voltage gate oxide pattern high-vacuum outgas surface treatmentTEXAS INSTRUMENTS INC·Filed 2004·Granted Mar 28, 2006·6 cites·11 claims
- 3958US11998945B2Methods and systems to monitor, control, and synchronize dispense systemsTOKYO ELECTRON LTD·Filed 2020·Granted Jun 4, 2024·0 cites·19 claims
- 4058US11262657B2System and method of planarization control using a cross-linkable materialTOKYO ELECTRON LTD·Filed 2019·Granted Mar 1, 2022·0 cites·37 claims
- 4158US9715172B2Use of topography to direct assembly of block copolymers in grapho-epitaxial applicationsTOKYO ELECTRON LTD·Filed 2016·Granted Jul 25, 2017·0 cites·20 claims
- 4257US8257911B2Method of process optimization for dual tone developmentGRONHEID ROEL·Filed 2008·Granted Sep 4, 2012·2 cites·20 claims
- 4356US11637031B2Systems and methods for spin process video analysis during substrate processingTOKYO ELECTRON LTD·Filed 2020·Granted Apr 25, 2023·0 cites·19 claims
- 4455US11339733B2Systems and methods to monitor particulate accumulation for bake chamber cleaningTOKYO ELECTRON LTD·Filed 2019·Granted May 24, 2022·0 cites·20 claims
- 4555US8568964B2Flood exposure process for dual tone development in lithographic applicationsFONSECA CARLOS A·Filed 2009·Granted Oct 29, 2013·0 cites·14 claims
- 4655US2016363868A1Line pattern collapse mitigation through gap-fill material applicationTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 4754US12165870B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2018·Granted Dec 10, 2024·0 cites·22 claims
- 4854US11474028B2Systems and methods for monitoring one or more characteristics of a substrateTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·0 cites·25 claims
- 4954US2014273534A1Integration of absorption based heating bake methods into a photolithography track systemTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 5051US2013107237A1Method of slimming radiation-sensitive material lines in lithographic applicationsTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
Showing the top 50 of 65 patent records by PatentIndex Score.
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