Inventor · disambiguated record
Sergio Edelstein
Also filed as: EDELSTEIN SERGIO
20 granted patents·5 pending applications·1,659 citations·filing 1995–2013
97Inventor score
Top patents by PatentIndex Score
25 records- 0199US5796074AWafer heater assemblyAPPLIED MATERIALS INC·Filed 1995·Granted Aug 18, 1998·609 cites·21 claims
- 0298US6603269B1Resonant chamber applicator for remote plasma sourceAPPLIED MATERIALS INC·Filed 2000·Granted Aug 5, 2003·252 cites·7 claims
- 0398US6350353B2Alternate steps of IMP and sputtering process to improve sidewall coverageAPPLIED MATERIALS INC·Filed 1999·Granted Feb 26, 2002·175 cites·21 claims
- 0497US7893703B2Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the waferKLA TENCOR TECH CORP·Filed 2006·Granted Feb 22, 2011·104 cites·18 claims
- 0594US7369233B2Optical system for measuring samples using short wavelength radiationKLA TENCOR TECH CORP·Filed 2003·Granted May 6, 2008·62 cites·227 claims
- 0689US6368469B1Coils for generating a plasma and for sputteringAPPLIED MATERIALS INC·Filed 1997·Granted Apr 9, 2002·48 cites·54 claims
- 0788US6254746B1Recessed coil for generating a plasmaAPPLIED MATERIALS INC·Filed 1997·Granted Jul 3, 2001·47 cites·60 claims
- 0888US5650052AVariable cell size collimatorFiled 1995·Granted Jul 22, 1997·61 cites·22 claims
- 0987US7719294B1Systems configured to perform a non-contact method for determining a property of a specimenKLA TENCOR TECH CORP·Filed 2006·Granted May 18, 2010·10 cites·23 claims
- 1087US7248062B1Contactless charge measurement of product wafers and control of corona generation and depositionKLA TENCOR TECH CORP·Filed 2003·Granted Jul 24, 2007·30 cites·19 claims
- 1187US6783639B2Coils for generating a plasma and for sputteringAPPLIED MATERIALS INC·Filed 2002·Granted Aug 31, 2004·21 cites·32 claims
- 1287US5691876AHigh temperature polyimide electrostatic chuckAPPLIED MATERIALS INC·Filed 1995·Granted Nov 25, 1997·74 cites·17 claims
- 1385US8398832B2Coils for generating a plasma and for sputteringNULMAN JAIM·Filed 2005·Granted Mar 19, 2013·10 cites·25 claims
- 1485US6290865B1Spin-rinse-drying process for electroplated semiconductor wafersAPPLIED MATERIALS INC·Filed 1998·Granted Sep 18, 2001·77 cites·17 claims
- 1580US9710903B2System and method for detecting design and process defects on a wafer using process monitoring featuresFOUQUET CHRISTOPHE·Filed 2009·Granted Jul 18, 2017·10 cites·50 claims
- 1676US5908334AElectrical connector for power transmission in an electrostatic chuckAPPLIED MATERIALS INC·Filed 1997·Granted Jun 1, 1999·41 cites·12 claims
- 1774US7538333B1Contactless charge measurement of product wafers and control of corona generation and depositionKLA TENCOR TECH CORP·Filed 2006·Granted May 26, 2009·3 cites·18 claims
- 1866US6254737B1Active shield for generating a plasma for sputteringAPPLIED MATERIALS INC·Filed 1996·Granted Jul 3, 2001·19 cites·35 claims
- 1960US7098050B1Corona based charge voltage measurementKLA TENCOR TECH CORP·Filed 2004·Granted Aug 29, 2006·6 cites·19 claims
- 2050US7345306B1Corona based charge voltage measurementKLA TENCOR TECH CORP·Filed 2006·Granted Mar 18, 2008·0 cites·8 claims
- 2150US2013168232A1Coils for generating a plasma and for sputteringNULMAN JAIM·Filed 2013·Application pending·0 cites
- 2246US2004256217A1Coils for generating a plasma and for sputteringFiled 2004·Application pending·0 cites
- 2345US2002084181A1Alternate steps of IMP and sputtering process to improve sidewall coverageAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 2445US2004104119A1Small volume electroplating cellAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 2541US2001019016A1Recessed coil for generating a plasmaFiled 2001·Application pending·0 cites
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