Inventor · disambiguated record
Joseph Levert
Also filed as: LEVERT JOSEPH · LEVERT JOSEPH A
7 granted patents·7 pending applications·211 citations·filing 1999–2004
88Inventor score
Top patents by PatentIndex Score
14 records- 0192US6600229B2Planarizers for spin etch planarization of electronic componentsHONEYWELL INT INC·Filed 2001·Granted Jul 29, 2003·76 cites·11 claims
- 0292US6407006B1Method for integrated circuit planarizationHONEYWELL INT INC·Filed 2000·Granted Jun 18, 2002·63 cites·23 claims
- 0387US6630433B2Composition for chemical mechanical planarization of copper, tantalum and tantalum nitrideHONEYWELL INT INC·Filed 2000·Granted Oct 7, 2003·39 cites·8 claims
- 0466US6719608B1Fabrication of devices with fibers engaged to grooves on substratesOLUMA INC·Filed 2002·Granted Apr 13, 2004·10 cites·33 claims
- 0565US6869347B2Fabrication of devices with fibers engaged to grooves on substratesOLUMA INC·Filed 2004·Granted Mar 22, 2005·9 cites·7 claims
- 0664US6696358B2Viscous protective overlayers for planarization of integrated circuitsHONEYWELL INT INC·Filed 2001·Granted Feb 24, 2004·8 cites·6 claims
- 0751US6771874B2Tension-assisted mounting of fibers on a substrateOTUMA INC·Filed 2002·Granted Aug 3, 2004·6 cites·44 claims
- 0839US2004192052A1Viscous protective overlayers for planarization of integrated circuitsFiled 2003·Application pending·0 cites
- 0939US2004046148A1Composition for chemical mechanical planarization of copper, tantalum and tantalum nitrideFiled 2003·Application pending·0 cites
- 1037US2003073311A1Compositions and processes for spin etch planarizationFiled 2002·Application pending·0 cites
- 1137US2004124438A1Planarizers for spin etch planarization of electronic components and methods of use thereofFiled 2003·Application pending·0 cites
- 1236US2003054616A1Electronic devices and methods of manufactureHONEYWELL INT INC·Filed 2001·Application pending·0 cites
- 1334US2001036749A1Apparatus and methods for integrated circuit planarizationFiled 2001·Application pending·0 cites
- 1427US2001054706A1Compositions and processes for spin etch planarizationFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →