Inventor · disambiguated record
Andrej Mitrovic
Also filed as: MITROVIC ANDREJ · MITROVIC ANDREJ S
33 granted patents·13 pending applications·667 citations·filing 2001–2022
98Inventor score
Top patents by PatentIndex Score
46 records- 0198US6863020B2Segmented electrode apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2002·Granted Mar 8, 2005·93 cites·47 claims
- 0297US6962664B2Controlled method for segmented electrode apparatus and method for plasma processingTOKYO ELECTRON LTD·Filed 2003·Granted Nov 8, 2005·71 cites·12 claims
- 0396US7164236B2Method and apparatus for improved plasma processing uniformityTOKYO ELECTRON LTD·Filed 2004·Granted Jan 16, 2007·66 cites·15 claims
- 0495US7591923B2Apparatus and method for use of optical system with a plasma processing systemTOKYO ELECTRON LTD·Filed 2005·Granted Sep 22, 2009·31 cites·24 claims
- 0590US6806653B2Method and structure to segment RF coupling to silicon electrodeTOKYO ELECTRON LTD·Filed 2003·Granted Oct 19, 2004·33 cites·24 claims
- 0689US6917204B2Addition of power at selected harmonics of plasma processor drive frequencyTOKYO ELECTRON LTD·Filed 2003·Granted Jul 12, 2005·65 cites·17 claims
- 0787US7075031B2Method of and structure for controlling electrode temperatureTOKYO ELECTRON LTD·Filed 2001·Granted Jul 11, 2006·43 cites·28 claims
- 0887US6812646B2Method and device for attenuating harmonics in semiconductor plasma processing systemsTOKYO ELECTRON LTD·Filed 2002·Granted Nov 2, 2004·26 cites·22 claims
- 0983US8014991B2System and method for using first-principles simulation to characterize a semiconductor manufacturing processTOKYO ELECTRON LTD·Filed 2003·Granted Sep 6, 2011·24 cites·39 claims
- 1081US7789963B2Chuck pedestal shieldTOKYO ELECTRON LTD·Filed 2005·Granted Sep 7, 2010·7 cites·22 claims
- 1181US6958484B2Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopyTOKYO ELECTRON LTD·Filed 2001·Granted Oct 25, 2005·19 cites·8 claims
- 1281US6677604B2Optical system and method for plasma optical emission analysisTOKYO ELECTRON LTD·Filed 2002·Granted Jan 13, 2004·22 cites·38 claims
- 1377US7353141B2Method and system for monitoring component consumptionTOKYO ELECTRON LTD·Filed 2007·Granted Apr 1, 2008·3 cites·3 claims
- 1476US6700458B2Device and method for coupling two circuit components which have different impedancesTOKYO ELECTRON LTD·Filed 2002·Granted Mar 2, 2004·16 cites·27 claims
- 1574US7241397B2Honeycomb optical window deposition shield and method for a plasma processing systemTOKYO ELECTRON LTD·Filed 2004·Granted Jul 10, 2007·16 cites·47 claims
- 1673US8036869B2System and method for using first-principles simulation to control a semiconductor manufacturing process via a simulation result or a derived empirical modelTOKYO ELECTRON LTD·Filed 2003·Granted Oct 11, 2011·11 cites·46 claims
- 1773US7015414B2Method and apparatus for determining plasma impedanceTOKYO ELECTRON LTD·Filed 2003·Granted Mar 21, 2006·9 cites·22 claims
- 1872US7233878B2Method and system for monitoring component consumptionTOKYO ELECTRON LTD·Filed 2004·Granted Jun 19, 2007·7 cites·40 claims
- 1971US8050900B2System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing processTOKYO ELECTRON LTD·Filed 2003·Granted Nov 1, 2011·12 cites·50 claims
- 2070US6899527B2Closed-drift hall effect plasma vacuum pump for process reactorsTOKYO ELECTRON LTD·Filed 2003·Granted May 31, 2005·10 cites·15 claims
- 2168US8032348B2System and method for using first-principles simulation to facilitate a semiconductor manufacturing processTOKYO ELECTRON LTD·Filed 2003·Granted Oct 4, 2011·13 cites·31 claims
- 2268US6729850B2Applied plasma duct systemTOKYO ELECTRON LTD·Filed 2002·Granted May 4, 2004·8 cites·30 claims
- 2365US8073667B2System and method for using first-principles simulation to control a semiconductor manufacturing processSTRANG ERIC J·Filed 2003·Granted Dec 6, 2011·12 cites·67 claims
- 2464US8296687B2System and method for using first-principles simulation to analyze a process performed by a semiconductor processing toolSTRANG ERIC J·Filed 2003·Granted Oct 23, 2012·10 cites·59 claims
- 2563US12158374B2Time-resolved OES data collectionTOKYO ELECTRON LTD·Filed 2022·Granted Dec 3, 2024·0 cites·20 claims
- 2663US7208067B2Method and system for monitoring RF impedance to determine conditions of a wafer on an electrostatic chuckTOKYO ELECTRON LTD·Filed 2004·Granted Apr 24, 2007·8 cites·8 claims
- 2763US7073383B2Apparatus and method for determining clamping status of semiconductor waferTOKYO ELECTRON LTD·Filed 2002·Granted Jul 11, 2006·9 cites·39 claims
- 2860US6824363B2Linear inductive plasma pump for process reactorsTOKYO ELECTRON LTD·Filed 2002·Granted Nov 30, 2004·11 cites·18 claims
- 2959US7109788B2Apparatus and method of improving impedance matching between an RF signal and a multi- segmented electrodeTOKYO ELECTRON LTD·Filed 2002·Granted Sep 19, 2006·4 cites·15 claims
- 3056US7020583B2Method and apparatus for determining chemistry of part's residual contaminationTOKYO ELECTRON LTD·Filed 2004·Granted Mar 28, 2006·5 cites·34 claims
- 3154US2007113976A1Plasma chamber wall segment temperature controlTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3254US2007114206A1Plasma chamber wall segment temperature controlTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3354US2007131650A1Plasma chamber wall segment temperature controlTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3452US7186313B2Plasma chamber wall segment temperature controlTOKYO ELECTRON LTD·Filed 2004·Granted Mar 6, 2007·2 cites·13 claims
- 3547US6965287B2Low reflection microwave windowTOKYO ELECTRON LTD·Filed 2004·Granted Nov 15, 2005·1 cites·47 claims
- 3647US2004104681A1Plasma processing system and methodTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 3746US2006060303A1Plasma processing system and methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 3844US2005089077A1Method of and apparatus for measuring and controlling substrate holder temperature using ultrasonic tomographyTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3944US2005189069A1Plasma processing system and methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 4043US6713969B2Method and apparatus for determination and control of plasma stateTOKYO ELECTRON LTD·Filed 2003·Granted Mar 30, 2004·0 cites·45 claims
- 4143US2003137251A1Method and apparatus for improved plasma processing uniformityFiled 2003·Application pending·0 cites
- 4241US2003016727A1Method of and apparatus for measuring and controlling substrate holder temperature using ultrasonic tomographyTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 4340US2004168771A1Plasma reactor coil magnetTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 4438US2007074812A1Temperature control of plasma density probeMITROVIC ANDREJ·Filed 2005·Application pending·0 cites
- 4536US2004021454A1Capacitively coupled RF voltage probeTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 4632US2003183337A1Apparatus and method for use of optical diagnostic system with a plasma processing systemFiled 2003·Application pending·0 cites
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