US2007114206A1PendingUtilityA1
Plasma chamber wall segment temperature control
Est. expiryJul 30, 2021(expired)· nominal 20-yr term from priority
H10P 72/0421H10P 72/0434H10P 72/0602G05D 23/1934H01J 37/32522
54
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Claims
Abstract
A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.
Claims
exact text as granted — not AI-modified1 . A method of controlling a plasma process comprising: independently controlling the temperature of a plurality of segments of the plasma chamber wall or other surfaces exposed to the plasma.
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