Inventor · disambiguated record
Craig Hickman
Also filed as: HICKMAN CRAIG · HICKMAN CRAIG A
20 granted patents·10 pending applications·156 citations·filing 1998–2024
95Inventor score
Top patents by PatentIndex Score
30 records- 0189US6784975B2Method and apparatus for irradiating a microlithographic substrateMICRON TECHNOLOGY INC·Filed 2001·Granted Aug 31, 2004·28 cites·70 claims
- 0288US11407117B1Robot centered augmented reality systemX DEV LLC·Filed 2019·Granted Aug 9, 2022·5 cites·20 claims
- 0387US7038762B2Method and apparatus for irradiating a microlithographic substrateMICRON TECHNOLOGY INC·Filed 2004·Granted May 2, 2006·21 cites·22 claims
- 0483US6817057B2Spindle chuck cleanerMICRON TECHNOLOGY INC·Filed 2001·Granted Nov 16, 2004·21 cites·82 claims
- 0581US8555208B2Systems and methods for implementing and manufacturing reticles for use in photolithography toolsHICKMAN CRAIG A·Filed 2011·Granted Oct 8, 2013·4 cites·7 claims
- 0681US8400634B2Semiconductor wafer alignment markers, and associated systems and methodsZHOU JIANMING·Filed 2010·Granted Mar 19, 2013·6 cites·27 claims
- 0780US7298453B2Method and apparatus for irradiating a microlithographic substrateMICRON TECHNOLOGY INC·Filed 2006·Granted Nov 20, 2007·4 cites·19 claims
- 0878US8029947B2Systems and methods for implementing and manufacturing reticles for use in photolithography toolsMICRON TECHNOLOGY INC·Filed 2005·Granted Oct 4, 2011·4 cites·33 claims
- 0978US6519036B1System for processing semiconductor productsMICRON TECHNOLOGY INC·Filed 2000·Granted Feb 11, 2003·17 cites·14 claims
- 1076US7361234B2Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machinesMICRON TECHNOLOGY INC·Filed 2006·Granted Apr 22, 2008·4 cites·19 claims
- 1165US9134628B2Overlay mark and application thereofZHOU JIANMING·Filed 2012·Granted Sep 15, 2015·1 cites·2 claims
- 1265US7370659B2Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machinesMICRON TECHNOLOGY INC·Filed 2003·Granted May 13, 2008·8 cites·22 claims
- 1363US2025029866A1Wafer bonding chuck with discrete actuatorsMICRON TECHNOLOGY INC·Filed 2024·Application pending·0 cites
- 1455US6909984B2Wafer alignment systemMICRON TECHNOLOGY INC·Filed 2004·Granted Jun 21, 2005·6 cites·22 claims
- 1553US2007056608A1Spindle chuck cleanerMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 1652US2006243305A1Spindle chuck cleanerMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 1751US6529274B1System for processing semiconductor productsMICRON TECHNOLOGY INC·Filed 1999·Granted Mar 4, 2003·12 cites·6 claims
- 1851US2007056513A1System for situ photoresist thickness characterizatonSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 1951US2007065575A1Method for in situ photoresist thickness characterizationSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 2051US2007061035A1Method and computer-readable medium for in situ photoresist thickness characterizationSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 2151US2007026134A1Method for in situ photoresist thickness characterizationSHIRLEY PAUL D·Filed 2006·Application pending·0 cites
- 2250US6812999B2Device and method of correcting exposure defects in photolithographyMICRON TECHNOLOGY INC·Filed 2003·Granted Nov 2, 2004·1 cites·41 claims
- 2350US6708131B1Wafer alignment systemMICRON TECHNOLOGY INC·Filed 2000·Granted Mar 16, 2004·4 cites·48 claims
- 2448US6844933B2System for processing semiconductor productsMICRON TECHNOLOGY INC·Filed 2003·Granted Jan 18, 2005·1 cites·9 claims
- 2547US6727975B1Device and method of correcting exposure defects in photolithographyMICRON TECHNOLOGY INC·Filed 1999·Granted Apr 27, 2004·2 cites·23 claims
- 2645US6967707B2Device and method of correcting exposure defects in photolithographyMICRON TECHNOLOGY INC·Filed 2004·Granted Nov 22, 2005·0 cites·30 claims
- 2745US2016270470A1Adjustable helmet chinstrapHICKMAN ANGUS W·Filed 2015·Application pending·0 cites
- 2844US2005148203A1Method, apparatus, system and computer-readable medium for in situ photoresist thickness characterizationFiled 2003·Application pending·0 cites
- 2943US2004159333A1Spindle chuck cleanerMICRON TECHNOLOGY INC·Filed 2004·Application pending·0 cites
- 3042US6297877B1Methods for compensating for lens heating resulting from wafer reflectance in micro-photolithography equipmentMICRON TECHNOLOGY INC·Filed 1998·Granted Oct 2, 2001·7 cites·55 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →