Inventor · disambiguated record
Jayakumar Gurusamy
Also filed as: GURUSAMY JAYAKUMAR
11 granted patents·2 pending applications·178 citations·filing 1998–2013
91Inventor score
Top patents by PatentIndex Score
13 records- 0185US6419559B1Using a purge gas in a chemical mechanical polishing apparatus with an incrementally advanceable polishing sheetAPPLIED MATERIALS INC·Filed 2001·Granted Jul 16, 2002·28 cites·7 claims
- 0285US6361423B2Chemical mechanical polishing conditionerAPPLIED MATERIALS INC·Filed 2000·Granted Mar 26, 2002·23 cites·11 claims
- 0381US6200199B1Chemical mechanical polishing conditionerAPPLIED MATERIALS INC·Filed 1998·Granted Mar 13, 2001·46 cites·22 claims
- 0476US6299511B1Chemical mechanical polishing conditionerAPPLIED MATERIALS INC·Filed 2000·Granted Oct 9, 2001·15 cites·11 claims
- 0572US6033290AChemical mechanical polishing conditionerAPPLIED MATERIALS INC·Filed 1998·Granted Mar 7, 2000·28 cites·16 claims
- 0666US6659849B1Platen with debris control for chemical mechanical planarizationAPPLIED MATERIALS INC·Filed 2000·Granted Dec 9, 2003·10 cites·30 claims
- 0766US6482072B1Method and apparatus for providing and controlling delivery of a web of polishing materialAPPLIED MATERIALS INC·Filed 2000·Granted Nov 19, 2002·9 cites·13 claims
- 0860US6951511B2Platen with peripheral frame for supporting a web of polishing material in a chemical mechanical planarization systemAPPLIED MATERIALS INC·Filed 2002·Granted Oct 4, 2005·6 cites·3 claims
- 0955US6983096B2Attenuation of cladding modes in optical fibersINTEL CORP·Filed 2003·Granted Jan 3, 2006·5 cites·15 claims
- 1055US6612914B2Platen with lateral web tensionerAPPLIED MATERIALS INC·Filed 2000·Granted Sep 2, 2003·6 cites·37 claims
- 1146US2014273756A1Substrate precession mechanism for cmp polishing headCHEN CHIH HUNG·Filed 2013·Application pending·0 cites
- 1244US6901201B2Fiber-flexure-substrate production trayINTEL CORP·Filed 2002·Granted May 31, 2005·2 cites·32 claims
- 1335US2002016136A1Conditioner for polishing padsFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →