Inventor · disambiguated record
Khiem K. Nguyen
Also filed as: NGUYEN KHIEM · NGUYEN KHIEM K · NGUYEN KHIEM QUANG
17 granted patents·7 pending applications·262 citations·filing 2001–2021
93Inventor score
Top patents by PatentIndex Score
24 records- 0196US7128806B2Mask etch processing apparatusAPPLIED MATERIALS INC·Filed 2003·Granted Oct 31, 2006·131 cites·34 claims
- 0293US7601272B2Method and apparatus for integrating metrology with etch processingAPPLIED MATERIALS INC·Filed 2006·Granted Oct 13, 2009·26 cites·14 claims
- 0392US7846848B2Cluster tool with integrated metrology chamber for transparent substratesAPPLIED MATERIALS INC·Filed 2006·Granted Dec 7, 2010·25 cites·18 claims
- 0491US7976671B2Mask etch plasma reactor with variable process gas distributionAPPLIED MATERIALS INC·Filed 2006·Granted Jul 12, 2011·20 cites·16 claims
- 0590US9978632B2Direct lift process apparatusAPPLIED MATERIALS INC·Filed 2015·Granted May 22, 2018·8 cites·17 claims
- 0689US9218944B2Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensorsCHANDRACHOOD MADHAVI R·Filed 2006·Granted Dec 22, 2015·15 cites·12 claims
- 0788US7967930B2Plasma reactor for processing a workpiece and having a tunable cathodeAPPLIED MATERIALS INC·Filed 2006·Granted Jun 28, 2011·11 cites·21 claims
- 0885US10535549B2Lift pin holderAPPLIED MATERIALS INC·Filed 2017·Granted Jan 14, 2020·4 cites·20 claims
- 0983US8017029B2Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backsideAPPLIED MATERIALS INC·Filed 2006·Granted Sep 13, 2011·7 cites·19 claims
- 1082US8002946B2Mask etch plasma reactor with cathode providing a uniform distribution of etch rateAPPLIED MATERIALS INC·Filed 2006·Granted Aug 23, 2011·8 cites·11 claims
- 1180US11022877B2Etch processing system having reflective endpoint detectionAPPLIED MATERIALS INC·Filed 2018·Granted Jun 1, 2021·2 cites·13 claims
- 1275US8012366B2Process for etching a transparent workpiece including backside endpoint detection stepsAPPLIED MATERIALS INC·Filed 2006·Granted Sep 6, 2011·3 cites·16 claims
- 1367US7879151B2Mask etch processing apparatusAPPLIED MATERIALS INC·Filed 2006·Granted Feb 1, 2011·2 cites·15 claims
- 1465US12007686B2Etch processing system having reflective endpoint detectionAPPLIED MATERIALS INC·Filed 2021·Granted Jun 11, 2024·0 cites·8 claims
- 1556US11710621B2Direct lift cathode for lithography mask chamberAPPLIED MATERIALS INC·Filed 2021·Granted Jul 25, 2023·0 cites·19 claims
- 1656US7682984B2Interferometer endpoint monitoring deviceAPPLIED MATERIALS INC·Filed 2006·Granted Mar 23, 2010·0 cites·19 claims
- 1748US10170280B2Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wallAPPLIED MATERIALS INC·Filed 2015·Granted Jan 1, 2019·0 cites·15 claims
- 1848US2008099437A1Plasma reactor for processing a transparent workpiece with backside process endpoint detectionLEWINGTON RICHARD·Filed 2006·Application pending·0 cites
- 1944US2006154388A1Integrated metrology chamber for transparent substratesLEWINGTON RICHARD·Filed 2005·Application pending·0 cites
- 2043US2005067103A1Interferometer endpoint monitoring deviceAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 2142US2008099451A1Workpiece rotation apparatus for a plasma reactor systemLEWINGTON RICHARD·Filed 2006·Application pending·0 cites
- 2239US2005133158A1Mask handler apparatusAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 2339US2005133166A1Tuned potential pedestal for mask etch processing apparatusAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 2431US2002153946A1Dynamic frequency compensated operation amplifierFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →