Inventor · disambiguated record
Robert D. Tolles
Also filed as: TOLLES ROBERT · TOLLES ROBERT D
49 granted patents·9 pending applications·2,666 citations·filing 1991–2020
99Inventor score
Top patents by PatentIndex Score
58 records- 0199US6524164B1Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 2000·Granted Feb 25, 2003·146 cites·25 claims
- 0299US5738574AContinuous processing system for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 1995·Granted Apr 14, 1998·797 cites·41 claims
- 0398US6454630B1Rotatable platen having a transparent window for a chemical mechanical polishing apparatus and method of making the sameAPPLIED MATERIALS INC·Filed 2000·Granted Sep 24, 2002·109 cites·33 claims
- 0498US5804507ARadially oscillating carousel processing system for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 1995·Granted Sep 8, 1998·243 cites·84 claims
- 0597US7614939B2Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motionAPPLIED MATERIALS INC·Filed 2007·Granted Nov 10, 2009·39 cites·6 claims
- 0695US5599423AApparatus and method for simulating and optimizing a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 1995·Granted Feb 4, 1997·153 cites·29 claims
- 0793US11772234B2Small batch polishing fluid delivery for CMPAPPLIED MATERIALS INC·Filed 2020·Granted Oct 3, 2023·3 cites·20 claims
- 0893US6572446B1Chemical mechanical polishing pad conditioning element with discrete points and compliant membraneAPPLIED MATERIALS INC·Filed 2000·Granted Jun 3, 2003·46 cites·42 claims
- 0992US7255632B2Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motionAPPLIED MATERIALS INC·Filed 2006·Granted Aug 14, 2007·13 cites·11 claims
- 1089US6896585B2Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 2003·Granted May 24, 2005·23 cites·21 claims
- 1189US6533645B2Substrate polishing articleAPPLIED MATERIALS INC·Filed 2000·Granted Mar 18, 2003·35 cites·25 claims
- 1289US6036587ACarrier head with layer of conformable material for a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 1996·Granted Mar 14, 2000·84 cites·19 claims
- 1388US6974371B2Two part retaining ringAPPLIED MATERIALS INC·Filed 2003·Granted Dec 13, 2005·31 cites·41 claims
- 1488US6290589B1Polishing pad with a partial adhesive coatingAPPLIED MATERIALS INC·Filed 1998·Granted Sep 18, 2001·43 cites·23 claims
- 1588US6220942B1CMP platen with patterned surfaceAPPLIED MATERIALS INC·Filed 1999·Granted Apr 24, 2001·73 cites·26 claims
- 1688US6217426B1CMP polishing padAPPLIED MATERIALS INC·Filed 1999·Granted Apr 17, 2001·83 cites·44 claims
- 1787US8079894B2Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motionTOLLES ROBERT D·Filed 2009·Granted Dec 20, 2011·11 cites·6 claims
- 1887US6688957B2Substrate polishing articleAPPLIED MATERIALS INC·Filed 2002·Granted Feb 10, 2004·28 cites·27 claims
- 1987US6575825B2CMP polishing padAPPLIED MATERIALS INC·Filed 2001·Granted Jun 10, 2003·49 cites·23 claims
- 2087US6371836B1Groove cleaning device for chemical-mechanical polishingAPPLIED MATERIALS INC·Filed 2000·Granted Apr 16, 2002·26 cites·9 claims
- 2187US6280297B1Apparatus and method for distribution of slurry in a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 2000·Granted Aug 28, 2001·24 cites·15 claims
- 2287US6126517ASystem for chemical mechanical polishing having multiple polishing stationsAPPLIED MATERIALS INC·Filed 1998·Granted Oct 3, 2000·63 cites·52 claims
- 2386US6348124B1Delivery of polishing agents in a wafer processing systemAPPLIED MATERIALS INC·Filed 1999·Granted Feb 19, 2002·89 cites·11 claims
- 2484US7754519B1Methods of forming a photovoltaic cellTWIN CREEKS TECHNOLOGIES INC·Filed 2009·Granted Jul 13, 2010·9 cites·9 claims
- 2584US6443823B1Carrier head with layer of conformable material for a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 2000·Granted Sep 3, 2002·25 cites·4 claims
- 2684US6080046AUnderwater wafer storage and wafer picking for chemical mechanical polishingAPPLIED MATERIALS INC·Filed 1998·Granted Jun 27, 2000·49 cites·26 claims
- 2784US5899801AMethod and apparatus for removing a substrate from a polishing pad in a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 1996·Granted May 4, 1999·65 cites·13 claims
- 2883US6527624B1Carrier head for providing a polishing slurryAPPLIED MATERIALS INC·Filed 1999·Granted Mar 4, 2003·54 cites·30 claims
- 2983US6135868AGroove cleaning device for chemical-mechanical polishingAPPLIED MATERIALS INC·Filed 1998·Granted Oct 24, 2000·49 cites·10 claims
- 3082US7097544B1Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motionAPPLIED MATERIALS INC·Filed 2000·Granted Aug 29, 2006·18 cites·30 claims
- 3181US10565701B2Color imaging for CMP monitoringAPPLIED MATERIALS INC·Filed 2015·Granted Feb 18, 2020·3 cites·20 claims
- 3281US7950407B2Apparatus for rapid filling of a processing volumeAPPLIED MATERIALS INC·Filed 2007·Granted May 31, 2011·7 cites·9 claims
- 3381US6702651B2Method and apparatus for conditioning a polishing padAPPLIED MATERIALS INC·Filed 2002·Granted Mar 9, 2004·18 cites·11 claims
- 3478US6607428B2Material for use in carrier and polishing padsAPPLIED MATERIALS INC·Filed 2002·Granted Aug 19, 2003·19 cites·11 claims
- 3577US8151852B2Bonding apparatus and methodZUNIGA STEVEN M·Filed 2009·Granted Apr 10, 2012·5 cites·11 claims
- 3677US6299516B1Substrate polishing articleAPPLIED MATERIALS INC·Filed 1999·Granted Oct 9, 2001·47 cites·33 claims
- 3774US7238090B2Polishing apparatus having a troughAPPLIED MATERIALS INC·Filed 2004·Granted Jul 3, 2007·10 cites·5 claims
- 3874US6051499AApparatus and method for distribution of slurry in a chemical mechanical polishing systemAPPLIED MATERIALS INC·Filed 1997·Granted Apr 18, 2000·28 cites·8 claims
- 3970US6592438B2CMP platen with patterned surfaceAPPLIED MATERIALS INC·Filed 2001·Granted Jul 15, 2003·19 cites·10 claims
- 4064US7189141B2Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatusAPPLIED MATERIALS INC·Filed 2003·Granted Mar 13, 2007·6 cites·17 claims
- 4162US11715193B2Color imaging for CMP monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Aug 1, 2023·0 cites·17 claims
- 4261US10800000B2Multi-layered nano-fibrous CMP padsAPPLIED MATERIALS INC·Filed 2016·Granted Oct 13, 2020·0 cites·20 claims
- 4358US6623341B2Substrate polishing apparatusAPPLIED MATERIALS INC·Filed 2002·Granted Sep 23, 2003·16 cites·26 claims
- 4452US2004198187A1Polishing pad with a partial adhesive coatingAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 4552US2009044838A1Ozonation for elimination of bacteria for wet processing systemsAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 4651US7677959B2Multilayer polishing pad and method of makingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 16, 2010·0 cites·23 claims
- 4750US7165565B2Megasonic wafer cleaning tank with reflector for improved wafer edge cleaningAPPLIED MATERIALS INC·Filed 2003·Granted Jan 23, 2007·3 cites·14 claims
- 4850US2014048201A1Bonding of thin laminaGTAT CORP·Filed 2013·Application pending·0 cites
- 4948US8545660B1Bonding apparatus and methodZUNIGA STEVEN M·Filed 2012·Granted Oct 1, 2013·0 cites·10 claims
- 5048US6716092B2Apparatus for making a polishing pad with a partial adhesive coatingAPPLIED MATERIALS INC·Filed 2001·Granted Apr 6, 2004·0 cites·12 claims
Showing the top 50 of 58 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →