Polishing pad with a partial adhesive coating

Abstract

A method for selectively altering a polishing pad adhesive layer includes providing a mask having transparent regions and opaque regions and directing radiation toward the mask so that the radiation passes through the transparent regions and impinges onto the adhesive layer on the polishing pad. The area of the adhesive layer corresponding to the transparent regions of the mask is cured to be less adhesive. The area of the adhesive layer corresponding to the opaque regions remain adhesive.

What is claimed is:  
     
         1 .- 21 . (Cancelled)  
     
     
         22 . A method for selectively altering the adhesive strength of a polishing pad adhesive layer, comprising: 
 providing a mask having a transparent region and an opaque region;    directing radiation toward the mask so that the radiation is blocked by the opaque region and passes through the transparent region to impinge on the adhesive layer on the polishing pad, whereby the area of the adhesive layer corresponding to the transparent region of the mask is cured to be less adhesive.    
     
     
         23 . The method of  claim 22  wherein the radiation is ultraviolet light.  
     
     
         24 . The method of  claim 23  wherein the transparent region is made of ultraviolet light transparent quartz or polymer material.  
     
     
         25 . The method of  claim 23  wherein the mask is made of ultraviolet light blocking material.  
     
     
         26 . The method of  claim 25  wherein the mask is made of metal.  
     
     
         27 . The method of  claim 25  wherein the mask is made of ceramic or polymer material.  
     
     
         28 . The method of  claim 25  wherein the mask is made of paper.  
     
     
         29 . The method of  claim 22  wherein the transparent region is an opening.  
     
     
         30 . The method of  claim 22  wherein the transparent region and the opaque region form concentric circles.  
     
     
         31 . The method of  claim 22  wherein there are a plurality of transparent and opaque regions.  
     
     
         32 . The method of  claim 31  wherein the transparent regions are circles.  
     
     
         33 . The method of  claim 31  wherein the transparent regions are arc segments.  
     
     
         34 . The method of  claim 22  wherein a ratio of a surface area of the cured region to a surface area of the adhesive region is between about 10% to 30%.  
     
     
         35 . The method of  claim 22  wherein the polishing pad is exposed to the radiation for a time between about 5 to 60 seconds.  
     
     
         36 . The method of  claim 23  wherein the radiation intensity is between about 100 to 1200 Watts/inch.  
     
     
         37 . A method for selectively altering the adhesive strength of a polishing pad adhesive layer, comprising: 
 providing a polishing pad having a layer of adhesive that covers substantially an entire surface of the pad; and    curing selected portions of the adhesive layer to reduce adhesive strength of the layer.    
     
     
         38 . The method of  claim 37  wherein: 
 curing includes directing radiation toward the adhesive layer.  
 
     
     
         39 . The method of  claim 38 , further comprising: 
 positioning a mask between the adhesive layer and a source of radiation, where the mask has a transparent and a non-transparent portion, the non-transparent portion blocks a fraction of the radiation from the adhesive layer so that only a selected area of the adhesive layer is cured.    
     
     
         40 . The method of  claim 37 , wherein: 
 the adhesive is partially cured.    
     
     
         41 . The method of  claim 37 , wherein: 
 the adhesive is fully cured.    
     
     
         42 . The method of  claim 37 , wherein: 
 the adhesive is acrylic based.    
     
     
         43 . The method of  claim 25 , wherein: 
 the mask is made of borosilicate glass.    
     
     
         44 . The method of  claim 22 , wherein: 
 the transparent region is in the center of the mask.    
     
     
         45 . The method of  claim 22 , wherein: 
 the adhesive is rubber based.