Inventor · disambiguated record
Carlton G. Willson
Also filed as: WILLSON CARLTON G · WILLSON CARLTON GRANT
42 granted patents·9 pending applications·3,556 citations·filing 1979–2017
99Inventor score
Top patents by PatentIndex Score
51 records- 0199US6719915B2Step and flash imprint lithographyUNIV TEXAS·Filed 2001·Granted Apr 13, 2004·251 cites·17 claims
- 0299US6334960B1Step and flash imprint lithographyUNIV TEXAS·Filed 1999·Granted Jan 1, 2002·822 cites·34 claims
- 0399US4491628APositive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backboneIBM·Filed 1982·Granted Jan 1, 1985·1k cites·17 claims
- 0498US7229273B2Imprint lithography template having a feature size under 250 nmUNIV TEXAS·Filed 2004·Granted Jun 12, 2007·80 cites·10 claims
- 0597US6908861B2Method for imprint lithography using an electric fieldMOLECULAR IMPRINTS INC·Filed 2002·Granted Jun 21, 2005·203 cites·20 claims
- 0697US4657845APositive tone oxygen plasma developable photoresistIBM·Filed 1986·Granted Apr 14, 1987·120 cites·10 claims
- 0796US4552833ARadiation sensitive and oxygen plasma developable resistIBM·Filed 1984·Granted Nov 12, 1985·105 cites·14 claims
- 0895US6964793B2Method for fabricating nanoscale patterns in light curable compositions using an electric fieldUNIV TEXAS·Filed 2002·Granted Nov 15, 2005·88 cites·17 claims
- 0994US8033814B2Device for holding a template for use in imprint lithographyUNIV TEXAS·Filed 2010·Granted Oct 11, 2011·10 cites·18 claims
- 1094US4908298AMethod of creating patterned multilayer films for use in production of semiconductor circuits and systemsIBM·Filed 1987·Granted Mar 13, 1990·108 cites·15 claims
- 1193US6890688B2Lithographic template and method of formation and useUNIV TEXAS·Filed 2001·Granted May 10, 2005·49 cites·37 claims
- 1289US5545509APhotoresist composition with photosensitive base generatorIBM·Filed 1994·Granted Aug 13, 1996·63 cites·7 claims
- 1388US4939070AThermally stable photoresists with high sensitivityBRUNSVOLD WILLIAM R·Filed 1988·Granted Jul 3, 1990·86 cites·15 claims
- 1488US4458994AHigh resolution optical lithography method and apparatus having excimer laser light source and stimulated Raman shiftingIBM·Filed 1983·Granted Jul 10, 1984·45 cites·50 claims
- 1586US9223202B2Method of automatic fluid dispensing for imprint lithography processesCHOI BYUNG-JIN·Filed 2007·Granted Dec 29, 2015·15 cites·2 claims
- 1685US4397937APositive resist compositionsIBM·Filed 1982·Granted Aug 9, 1983·38 cites·12 claims
- 1784US5322765ADry developable photoresist compositions and method for use thereofIBM·Filed 1991·Granted Jun 21, 1994·47 cites·23 claims
- 1884US5055439APhotoacid generating composition and sensitizer thereforIBM·Filed 1989·Granted Oct 8, 1991·34 cites·6 claims
- 1984US4522911ADeep ultra-violet lithographic resists with diazohomotetramic acid compoundsIBM·Filed 1983·Granted Jun 11, 1985·16 cites·7 claims
- 2081US9834700B2Polylactide/silicon-containing block copolymers for nanolithographyUNIV TEXAS·Filed 2015·Granted Dec 5, 2017·2 cites·22 claims
- 2181US4810601ATop imaged resistsIBM·Filed 1986·Granted Mar 7, 1989·50 cites·28 claims
- 2279US5250395AProcess for imaging of photoresist including treatment of the photoresist with an organometallic compoundIBM·Filed 1991·Granted Oct 5, 1993·34 cites·8 claims
- 2379US4284706ALithographic resist composition for a lift-off processIBM·Filed 1979·Granted Aug 18, 1981·25 cites·8 claims
- 2476US4464460AProcess for making an imaged oxygen-reactive ion etch barrierIBM·Filed 1983·Granted Aug 7, 1984·27 cites·8 claims
- 2575US5342727ACopolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive compositionHOECHST CELANESE CORP·Filed 1991·Granted Aug 30, 1994·25 cites·18 claims
- 2675US4551418AProcess for preparing negative relief images with cationic photopolymerizationIBM·Filed 1985·Granted Nov 5, 1985·24 cites·14 claims
- 2774US9314819B2Anhydride copolymer top coats for orientation control of thin film block copolymersUNIV TEXAS·Filed 2013·Granted Apr 19, 2016·1 cites·46 claims
- 2871US7906060B2Compositions for dark-field polymerization and method of using the same for imprint lithography processesUNIV TEXAS·Filed 2008·Granted Mar 15, 2011·2 cites·22 claims
- 2971US7708542B2Device for holding a template for use in imprint lithographyUNIV TEXAS·Filed 2003·Granted May 4, 2010·6 cites·18 claims
- 3070US4767723AProcess for making self-aligning thin film transistorsIBM·Filed 1987·Granted Aug 30, 1988·37 cites·3 claims
- 3167US9157008B2Anhydride copolymer top coats for orientation control of thin film block copolymersUNIV TEXAS·Filed 2013·Granted Oct 13, 2015·1 cites·17 claims
- 3267US9120117B2Polylactide/silicon-containing block copolymers for nanolithographyELLISON CHRISTOPHER JOHN·Filed 2013·Granted Sep 1, 2015·2 cites·7 claims
- 3364US4645338AOptical system for focus correction for a lithographic toolIBM·Filed 1985·Granted Feb 24, 1987·18 cites·6 claims
- 3464US4398001ATerpolymer resist compositionsIBM·Filed 1982·Granted Aug 9, 1983·17 cites·11 claims
- 3561US4853315AO-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resistsIBM·Filed 1988·Granted Aug 1, 1989·13 cites·6 claims
- 3658US4690838AProcess for enhancing the resistance of a resist image to reactive ion etching and to thermal flowIBM·Filed 1986·Granted Sep 1, 1987·12 cites·9 claims
- 3756US4601969AHigh contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitutionIBM·Filed 1985·Granted Jul 22, 1986·12 cites·10 claims
- 3856US2009214689A1Imprint Lithography Templates Having Alignment MarksUNIV TEXAS·Filed 2009·Application pending·0 cites
- 3955US2008305440A1Apparatus for fabricating nanoscale patterns in light curable compositions using an electric fieldUNIV TEXAS·Filed 2008·Application pending·0 cites
- 4055US2005236739A1Step and flash imprint lithographyUNIV TEXAS·Filed 2005·Application pending·0 cites
- 4152US2012133078A1Step and Flash Imprint LithographyWILLSON CARLTON GRANT·Filed 2012·Application pending·0 cites
- 4248US10239982B2Block polymers for sub-10 nm patterningUNIV TEXAS·Filed 2017·Granted Mar 26, 2019·0 cites·11 claims
- 4347US5807947ACopolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyreneCLARIANT FINANCE BVI LTD·Filed 1994·Granted Sep 15, 1998·8 cites·8 claims
- 4443US2004200411A1Apparatus for fabricating nanoscale patterns in light curable compositions using an electric fieldUNIV TEXAS·Filed 2004·Application pending·0 cites
- 4543US2010053578A1Apparatus for imprint lithography using an electric fieldMOLECULAR IMPRINTS INC·Filed 2004·Application pending·0 cites
- 4642US5270151ASpin on oxygen reactive ion etch barrierIBM·Filed 1992·Granted Dec 14, 1993·6 cites·6 claims
- 4742US2005064344A1Imprint lithography templates having alignment marksUNIV TEXAS·Filed 2003·Application pending·0 cites
- 4841US8926888B2Fluorinated silazane release agents in nanoimprint lithographyWILLSON CARLTON GRANT·Filed 2012·Granted Jan 6, 2015·0 cites·11 claims
- 4940US4800152ANegative resist compositionsIBM·Filed 1987·Granted Jan 24, 1989·6 cites·2 claims
- 5037US2015240110A1Surface Treatments for Alignment of Block CopolymersUNIV TEXAS·Filed 2015·Application pending·0 cites
Showing the top 50 of 51 patent records by PatentIndex Score.
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