Apparatus for fabricating nanoscale patterns in light curable compositions using an electric field

Abstract

The present invention is directed to an apparatus for patterning a liquid on a substrate, with the apparatus including, a template having a pair of spaced-apart recessions with a protrusion disposed therebetween, with the protrusion being spaced-apart from the substrate a first distance and each of the pair of spaced-apart recessions being spaced-apart from the substrate a second distance, with the second distance being greater than the first distance; and a source of voltage in electrical communication with the template to produce an electric field between the template and the substrate, with a strength of the electrical field being inversely proportional to the first and second distances.

1 .- 25 . (canceled) 
     
     
         26 . A method of forming an imprint lithography pattern on a curable liquid disposed on an imprint lithography substrate comprising:
 coupling a voltage source to apply a potential between the imprint lithography substrate and an electrically conductive imprint lithography template having a plurality of protrusions disposed between corresponding spaced-apart recessions:   positioning the electrically conductive imprint lithography template within a controlled distance proximate to a surface of the curable liquid;   measuring controlled distance from the curable liquid with a measuring device;   setting the potential of the voltage source to establish an electric field thereby forming an attractive force between the protrusions and the curable liquid sufficient to overcome surface tensions of the curable liquid;   moving the positioning device away from the curable liquid a predetermined amount while modifying the potential of the voltage source to maintain the controlled distance thereby extending liquid from the surface of curable liquid corresponding to the protrusions: and   impinging an energy signal from an energy source to harden the curable liquid thereby forming the imprint lithography pattern.   
     
     
         27 . The method of  claim 26 , wherein the imprint lithography template includes a layer of Indium Tin Oxide (ITO) with the plurality of electrical conductive protrusions disposed between corresponding spaced-apart recessions being formed in the layer of ITO. 
     
     
         28 . The method of claim  21 , wherein the imprint lithography template further includes a layer fused silica coupled to the layer of Indium Tin Oxide (ITO). 
     
     
         29 . The method of  claim 26 , wherein the potential of the voltage source has sufficient magnitude to create a contiguous region of the liquid on an area of the imprint lithography substrate in superimposition with the plurality of protrusions. 
     
     
         30 . The method as recited in  claim 26 , wherein the imprint lithography template is substantially transparent to the energy signal. 
     
     
         31 . The method of  claim 30 , wherein the energy signal is directed through the imprint lithography template to harden the curable liquid. 
     
     
         32 . The method of  claim 30 , wherein the energy signal is ultraviolet light. 
     
     
         33 . The method as recited in  claim 26  wherein said imprint lithography template further includes a fluorine containing monolayer.