Inventor · disambiguated record
Andreas Wurmbrand
Also filed as: WURMBRAND ANDREAS
22 granted patents·3 pending applications·75 citations·filing 2004–2017
94Inventor score
Files withZEISS CARL SMT AG7ZEISS CARL SMT GMBH6ASML NETHERLANDS BV4HOOGENDAM CHRISTIAAN ALEXANDER3GELLRICH BERNHARD1
Top patents by PatentIndex Score
25 records- 0193US7570343B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Aug 4, 2009·14 cites·8 claims
- 0289US7265917B2Replacement apparatus for an optical elementZEISS CARL SMT AG·Filed 2004·Granted Sep 4, 2007·20 cites·31 claims
- 0387US8810771B2Lithographic apparatus and device manufacturing methodHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2011·Granted Aug 19, 2014·3 cites·20 claims
- 0487US7532304B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted May 12, 2009·6 cites·32 claims
- 0585US7352433B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Apr 1, 2008·15 cites·35 claims
- 0678US8902519B2Replacement apparatus for an optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Dec 2, 2014·1 cites·20 claims
- 0777US7995296B2Replacement apparatus for an optical elementZEISS CARL SMT GMBH·Filed 2010·Granted Aug 9, 2011·1 cites·27 claims
- 0876US8488261B2Replacement apparatus for an optical elementKUGLER JENS·Filed 2011·Granted Jul 16, 2013·1 cites·35 claims
- 0974US7471469B2Device for the low-deformation replaceable mounting of an optical elementZEISS CARL SMT AG·Filed 2005·Granted Dec 30, 2008·5 cites·45 claims
- 1071US7768723B2Replacement apparatus for an optical elementZEISS CARL SMT AG·Filed 2009·Granted Aug 3, 2010·1 cites·19 claims
- 1167US9081296B2Replacement apparatus for an optical elementZEISS CARL SMT GMBH·Filed 2014·Granted Jul 14, 2015·0 cites·29 claims
- 1265US9182679B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Nov 10, 2015·0 cites·20 claims
- 1362US8582081B2Device for the low-deformation replaceable mounting of an optical elementSORG FRANZ·Filed 2008·Granted Nov 12, 2013·2 cites·12 claims
- 1462US8339576B2Projection objective of a microlithographic projection exposure apparatusLOERING ULRICH·Filed 2012·Granted Dec 25, 2012·1 cites·20 claims
- 1561US8102502B2Lithographic apparatus and device manufacturing methodHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2009·Granted Jan 24, 2012·0 cites·20 claims
- 1659US8860922B2Lithographic apparatus and device manufacturing methodHOOGENDAM CHRISTIAAN ALEXANDER·Filed 2012·Granted Oct 14, 2014·0 cites·22 claims
- 1759US7515363B2Replacement apparatus for an optical elementZEISS CARL SMT AG·Filed 2007·Granted Apr 7, 2009·0 cites·23 claims
- 1859US2016041475A1Replacement apparatus for an optical elementZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 1956US7085080B2Low-deformation support device of an optical elementZEISS CARL SMT AG·Filed 2004·Granted Aug 1, 2006·4 cites·30 claims
- 2055US2014063628A1Device for the low-deformation replaceable mounting of an optical elementZEISS CARL SMT GMBH·Filed 2013·Application pending·0 cites
- 2152US2015138520A1Holding Device for an Optical Element in an ObjectiveASML NETHERLANDS BV·Filed 2014·Application pending·0 cites
- 2250US7649702B2Immersion lithography objectiveZEISS CARL SMT AG·Filed 2008·Granted Jan 19, 2010·0 cites·10 claims
- 2342US9996015B2Mirror module, in particular for a microlithographic projection exposure appararatusZEISS CARL SMT GMBH·Filed 2017·Granted Jun 12, 2018·0 cites·20 claims
- 2437US8854602B2Holding device for an optical element in an objectiveGELLRICH BERNHARD·Filed 2004·Granted Oct 7, 2014·1 cites·81 claims
- 2535US9298111B2Optical arrangement in a projection exposure apparatus for EUV lithographyKULITZKI VIKTOR·Filed 2012·Granted Mar 29, 2016·0 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →