Inventor · disambiguated record
Chunming Zhou
Also filed as: ZHOU CHUNMING
8 granted patents·6 pending applications·11 citations·filing 2010–2025
78Inventor score
Top patents by PatentIndex Score
14 records- 0189US11469096B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2020·Granted Oct 11, 2022·2 cites·20 claims
- 0288US11572618B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2020·Granted Feb 7, 2023·2 cites·18 claims
- 0378US12176205B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 0476US8431033B2High density plasma etchback process for advanced metallization applicationsZHOU CHUNMING·Filed 2010·Granted Apr 30, 2013·7 cites·18 claims
- 0575US12142478B2Method and chamber for backside physical vapor depositionAPPLIED MATERIALS INC·Filed 2022·Granted Nov 12, 2024·0 cites·20 claims
- 0666US2025333649A1High-brightness high-luminous-efficiency complex-phase fluorescent ceramic for laser illumination and preparation method thereforUNIV JIANGSU NORMAL·Filed 2025·Application pending·0 cites
- 0764US2025334731A1Composite phosphor ceramic optical fiber with high luminous efficiency and high color rendering index, and preparation method thereforUNIV JIANGSU NORMAL·Filed 2025·Application pending·0 cites
- 0863US12094773B2Methods for low resistivity and stress tungsten gap fillAPPLIED MATERIALS INC·Filed 2022·Granted Sep 17, 2024·0 cites·8 claims
- 0960US11798845B2Methods and apparatus for low resistivity and stress tungsten gap fillAPPLIED MATERIALS INC·Filed 2020·Granted Oct 24, 2023·0 cites·13 claims
- 1049US12191198B2Low resistivity tungsten film and method of manufactureAPPLIED MATERIALS INC·Filed 2020·Granted Jan 7, 2025·0 cites·16 claims
- 1144US2021123139A1Method and apparatus for low resistance contact interconnectionAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 1239US2012228125A1Creation of magnetic field (vector potential) well for improved plasma deposition and resputtering uniformityWU LIQI·Filed 2012·Application pending·0 cites
- 1338US2012070589A1Creation of magnetic field (vector potential) well for improved plasma deposition and resputtering uniformityWU LIQI·Filed 2011·Application pending·0 cites
- 1436US2013206725A1Creation of off-axis null magnetic field locus for improved uniformity in plasma deposition and etchingLEESER KARL·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →