Inventor · disambiguated record
Nicolas Bright
Also filed as: BRIGHT NICOLAS · BRIGHT NICOLAS J · BRIGHT NICOLAS JOHN
43 granted patents·9 pending applications·972 citations·filing 1992–2024
98Inventor score
Top patents by PatentIndex Score
52 records- 0195US5477975APlasma etch apparatus with heated scavenging surfacesAPPLIED MATERIALS INC·Filed 1993·Granted Dec 26, 1995·86 cites·49 claims
- 0293US5350479AElectrostatic chuck for high power plasma processingAPPLIED MATERIALS INC·Filed 1992·Granted Sep 27, 1994·199 cites·32 claims
- 0392US6322661B1Method and apparatus for controlling the volume of a plasmaLAM RES CORP·Filed 1999·Granted Nov 27, 2001·75 cites·48 claims
- 0491US12469680B2Radio-frequency (RF) matching network for fast impedance tuningAPPLIED MATERIALS INC·Filed 2023·Granted Nov 11, 2025·1 cites·17 claims
- 0591US12293897B2Radio frequency diverter assembly enabling on-demand different spatialAPPLIED MATERIALS INC·Filed 2023·Granted May 6, 2025·1 cites·19 claims
- 0691US6251770B1Dual-damascene dielectric structures and methods for making the sameLAM RES CORP·Filed 1999·Granted Jun 26, 2001·106 cites·4 claims
- 0790US7010468B2Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detectionLAM RES CORP·Filed 2005·Granted Mar 7, 2006·16 cites·23 claims
- 0887US6808590B1Method and apparatus of arrayed sensors for metrological controlLAM RES CORP·Filed 2002·Granted Oct 26, 2004·31 cites·18 claims
- 0985US7521358B2Process integration scheme to lower overall dielectric constant in BEoL interconnect structuresLAM RES CORP·Filed 2007·Granted Apr 21, 2009·11 cites·25 claims
- 1084US6095741ADual sided slot valve and method for implementing the sameLAM RES CORP·Filed 1999·Granted Aug 1, 2000·77 cites·18 claims
- 1183US7465525B2Reticle alignment and overlay for multiple reticle processLAM RES CORP·Filed 2005·Granted Dec 16, 2008·8 cites·17 claims
- 1282US5583737AElectrostatic chuck usable in high density plasmaAPPLIED MATERIALS INC·Filed 1995·Granted Dec 10, 1996·57 cites·14 claims
- 1381US5770099APlasma etch apparatus with heated scavenging surfacesAPPLIED MATERIALS INC·Filed 1995·Granted Jun 23, 1998·54 cites·49 claims
- 1480US6929531B2System and method for metal residue detection and mapping within a multi-step sequenceLAM RES CORP·Filed 2002·Granted Aug 16, 2005·23 cites·24 claims
- 1579US5539609AElectrostatic chuck usable in high density plasmaAPPLIED MATERIALS INC·Filed 1993·Granted Jul 23, 1996·60 cites·15 claims
- 1677US7152011B2Smart component-based management techniques in a substrate processing systemLAM RES CORP·Filed 2004·Granted Dec 19, 2006·9 cites·49 claims
- 1776US7539969B2Computer readable mask shrink control processorLAM RES CORP·Filed 2005·Granted May 26, 2009·4 cites·5 claims
- 1874US12049961B2Chamber body design architecture for next generation advanced plasma technologyAPPLIED MATERIALS INC·Filed 2022·Granted Jul 30, 2024·0 cites·20 claims
- 1973US7084621B2Enhancement of eddy current based measurement capabilitiesLAM RES CORP·Filed 2002·Granted Aug 1, 2006·10 cites·27 claims
- 2072US6194325B1Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topographyAPPLIED MATERIALS INC·Filed 1995·Granted Feb 27, 2001·41 cites·32 claims
- 2169US7899627B2Automatic dynamic baseline creation and adjustmentLAM RES CORP·Filed 2006·Granted Mar 1, 2011·3 cites·20 claims
- 2267US7309618B2Method and apparatus for real time metal film thickness measurementLAM RES CORP·Filed 2003·Granted Dec 18, 2007·10 cites·16 claims
- 2366US8871650B2Post etch treatment (PET) of a low-K dielectric filmNEMANI SRINIVAS D·Filed 2012·Granted Oct 28, 2014·2 cites·13 claims
- 2466US6984162B2Apparatus methods for controlling wafer temperature in chemical mechanical polishingLAM RES CORP·Filed 2003·Granted Jan 10, 2006·7 cites·15 claims
- 2565US12046449B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Granted Jul 23, 2024·0 cites·20 claims
- 2664US7060605B2Methods for making dual-damascene dielectric structuresLAM RES CORP·Filed 2001·Granted Jun 13, 2006·7 cites·10 claims
- 2764US6083412APlasma etch apparatus with heated scavenging surfacesAPPLIED MATERIALS INC·Filed 1998·Granted Jul 4, 2000·13 cites·33 claims
- 2863US12334304B2System and methods for implementing a micro pulsing scheme using dual independent pulsersAPPLIED MATERIALS INC·Filed 2022·Granted Jun 17, 2025·0 cites·19 claims
- 2963US6736720B2Apparatus and methods for controlling wafer temperature in chemical mechanical polishingLAM RES CORP·Filed 2001·Granted May 18, 2004·6 cites·16 claims
- 3063US6267545B1Semiconductor processing platform architecture having processing module isolation capabilitiesLAM RES CORP·Filed 1999·Granted Jul 31, 2001·28 cites·21 claims
- 3162US6859765B2Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detectionLAM RES CORP·Filed 2002·Granted Feb 22, 2005·7 cites·23 claims
- 3262US2025239435A1Switching circuit for multilevel plasma impedance matchingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3361US2025299921A1Impedance tuning for plasma processingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3460US7254510B2Smart component-based management techniques in a substrate processing systemLAM RES CORP·Filed 2006·Granted Aug 7, 2007·0 cites·17 claims
- 3560US6909190B2Dual-damascene dielectric structuresLAM RES CORP·Filed 2001·Granted Jun 21, 2005·5 cites·11 claims
- 3658US2025046576A1Plasma processing assembly for rf and pvt integrationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3757US2025087462A1Radio-frequency (rf) matching network and tuning techniqueAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3857US2025316453A1Solid state variable capacitors for rf matchesAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3956US12456607B2Auxiliary plasma source for robust ignition and restrikes in a plasma chamberAPPLIED MATERIALS INC·Filed 2021·Granted Oct 28, 2025·0 cites·18 claims
- 4056US12266506B2Scanning impedance measurement in a radio frequency plasma processing chamberAPPLIED MATERIALS INC·Filed 2022·Granted Apr 1, 2025·0 cites·20 claims
- 4156US6894491B2Method and apparatus for metrological process control implementing complementary sensorsLAM RES CORP·Filed 2002·Granted May 17, 2005·4 cites·21 claims
- 4255US7029368B2Apparatus for controlling wafer temperature in chemical mechanical polishingLAM RES CORP·Filed 2003·Granted Apr 18, 2006·3 cites·12 claims
- 4355US6951624B2Method and apparatus of arrayed sensors for metrological controlLAM RES CORP·Filed 2004·Granted Oct 4, 2005·5 cites·10 claims
- 4453US9076844B2Process integration scheme to lower overall dielectric constant in BEoL interconnect structuresBRIGHT NICOLAS·Filed 2009·Granted Jul 7, 2015·1 cites·20 claims
- 4552US7501339B2Methods for making dual-damascene dielectric structuresLAM RES CORP·Filed 2006·Granted Mar 10, 2009·0 cites·17 claims
- 4651US11333246B2Chamber body design architecture for next generation advanced plasma technologyAPPLIED MATERIALS INC·Filed 2015·Granted May 17, 2022·0 cites·16 claims
- 4751US6922053B2Complementary sensors metrological process and method and apparatus for implementing the sameLAM RES CORP·Filed 2004·Granted Jul 26, 2005·2 cites·28 claims
- 4851US2024162008A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 4941US7542820B2Methods and arrangement for creating recipes using best-known methodsLAM RES CORP·Filed 2006·Granted Jun 2, 2009·0 cites·29 claims
- 5039US2004011462A1Method and apparatus for applying differential removal rates to a surface of a substrateLAM RES CORP·Filed 2003·Application pending·0 cites
Showing the top 50 of 52 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →