Inventor · disambiguated record
Kenetsu Yokogawa
Also filed as: YOKOGAWA KENETSU
56 granted patents·44 pending applications·454 citations·filing 1994–2022
98Inventor score
Top patents by PatentIndex Score
100 records- 0197US8397668B2Plasma processing apparatusKOBAYASHI HIROYUKI·Filed 2009·Granted Mar 19, 2013·43 cites·6 claims
- 0292USD871609SElectrode plate peripheral ring for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 31, 2019·41 cites·1 claims
- 0392US7662232B2Plasma processing apparatusHITACHI LTD·Filed 2007·Granted Feb 16, 2010·14 cites·3 claims
- 0490USD868993SElectrode plate for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 3, 2019·36 cites·1 claims
- 0589USD870314SElectrode cover for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Dec 17, 2019·34 cites·1 claims
- 0689US8733282B2Plasma processing apparatusKOBAYASHI HIROYUKI·Filed 2013·Granted May 27, 2014·6 cites·6 claims
- 0788US10217611B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Feb 26, 2019·4 cites·2 claims
- 0888US9038567B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted May 26, 2015·5 cites·7 claims
- 0988US8955579B2Plasma processing apparatus and plasma processing methodTANDOU TAKUMI·Filed 2011·Granted Feb 17, 2015·8 cites·5 claims
- 1086US11398371B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 26, 2022·4 cites·7 claims
- 1184US11915951B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Feb 27, 2024·1 cites·5 claims
- 1284US7767054B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2005·Granted Aug 3, 2010·9 cites·12 claims
- 1384US6927173B2Plasma processing methodRENESAS TECH CORP·Filed 2002·Granted Aug 9, 2005·23 cites·25 claims
- 1484US6136214APlasma processing method and apparatusHITACHI LTD·Filed 1997·Granted Oct 24, 2000·54 cites·30 claims
- 1583US10825664B2Wafer processing method and wafer processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Nov 3, 2020·3 cites·5 claims
- 1682US10804080B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Oct 13, 2020·3 cites·8 claims
- 1780US6475918B1Plasma treatment apparatus and plasma treatment methodHITACHI LTD·Filed 2000·Granted Nov 5, 2002·24 cites·21 claims
- 1879US10825657B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Nov 3, 2020·2 cites·9 claims
- 1979US10037909B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jul 31, 2018·3 cites·9 claims
- 2075US11094509B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Aug 17, 2021·2 cites·3 claims
- 2172US11682542B2Plasma processing deviceHITACHI HIGH TECH CORP·Filed 2021·Granted Jun 20, 2023·0 cites·9 claims
- 2271US10930476B2Plasma processing deviceHITACHI HIGH TECH CORP·Filed 2016·Granted Feb 23, 2021·1 cites·8 claims
- 2371US6629538B2Method for cleaning semiconductor wafers in a vacuum environmentHITACHI LTD·Filed 2001·Granted Oct 7, 2003·14 cites·18 claims
- 2469US11842885B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Dec 12, 2023·0 cites·4 claims
- 2569US6713401B2Method for manufacturing semiconductor deviceHITACHI LTD·Filed 2001·Granted Mar 30, 2004·12 cites·14 claims
- 2667US6511608B1Plasma processing methodHITACHI LTD·Filed 2000·Granted Jan 28, 2003·8 cites·21 claims
- 2766US6643893B2Apparatus for cleaning semiconductor wafers in a vacuum environmentHITACHI LTD·Filed 2001·Granted Nov 11, 2003·10 cites·25 claims
- 2865US8083888B2Plasma processing apparatusUSUI TATEHITO·Filed 2008·Granted Dec 27, 2011·2 cites·2 claims
- 2964US2011100555A1Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle ContaminationKOBAYASHI HIROYUKI·Filed 2011·Application pending·0 cites
- 3064US2008017318A1Semiconductor device manufacturing apparatus capable of reducing particle contaminationKOBAYASHI HIROYUKI·Filed 2007·Application pending·0 cites
- 3164US2009294060A1Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle ContaminationKOBAYASHI HIROYUKI·Filed 2009·Application pending·0 cites
- 3263US8163652B2Plasma processing method and plasma processing deviceMAEDA KENJI·Filed 2008·Granted Apr 24, 2012·1 cites·12 claims
- 3363US7371690B2Dry etching method and apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted May 13, 2008·8 cites·14 claims
- 3462US10811231B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Oct 20, 2020·0 cites·4 claims
- 3562US9150964B2Vacuum processing apparatusKOBAYASHI HIROYUKI·Filed 2008·Granted Oct 6, 2015·1 cites·6 claims
- 3662US8197634B2Plasma processing apparatusYOKOGAWA KENETSU·Filed 2007·Granted Jun 12, 2012·1 cites·21 claims
- 3762US7842619B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2008·Granted Nov 30, 2010·1 cites·11 claims
- 3862US5554257AMethod of treating surfaces with atomic or molecular beamHITACHI LTD·Filed 1994·Granted Sep 10, 1996·33 cites·19 claims
- 3961US8496781B2Plasma processing apparatusYOKOGAWA KENETSU·Filed 2005·Granted Jul 30, 2013·1 cites·9 claims
- 4061US8426764B2Plasma processing apparatus and plasma processing methodTANDOU TAKUMI·Filed 2008·Granted Apr 23, 2013·1 cites·9 claims
- 4160US9368377B2Plasma processing apparatusTANDOU TAKUMI·Filed 2007·Granted Jun 14, 2016·1 cites·7 claims
- 4260US7658815B2Plasma processing apparatus capable of controlling plasma emission intensityHITACHI HIGH TECH CORP·Filed 2008·Granted Feb 9, 2010·0 cites·2 claims
- 4359US12237174B2Etching methodHITACHI HIGH TECH CORP·Filed 2021·Granted Feb 25, 2025·0 cites·5 claims
- 4459US8425786B2Plasma etching method and plasma etching apparatusSATAKE MAKOTO·Filed 2010·Granted Apr 23, 2013·1 cites·9 claims
- 4558US7372582B2Method for fabrication semiconductor deviceHITACHI LTD·Filed 2002·Granted May 13, 2008·6 cites·13 claims
- 4657USD891636SRing for a plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 28, 2020·6 cites·1 claims
- 4757US8029874B2Plasma processing apparatus and method for venting the same to atmosphereHITACHI HIGH TECH CORP·Filed 2008·Granted Oct 4, 2011·0 cites·4 claims
- 4856US6977229B2Manufacturing method for semiconductor devicesRENESAS TECH CORP·Filed 2003·Granted Dec 20, 2005·5 cites·19 claims
- 4956US6573190B1Dry etching device and dry etching methodHITACHI LTD·Filed 1999·Granted Jun 3, 2003·19 cites·12 claims
- 5056US2012003837A1Semiconductor Device Manufacturing Apparatus Capable Of Reducing Particle ContaminationKOBAYASHI HIROYUKI·Filed 2011·Application pending·0 cites
Showing the top 50 of 100 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →