USD868993SActiveUtility

Electrode plate for a plasma processing apparatus

90
Assignee: HITACHI HIGH TECH CORPPriority: Aug 31, 2017Filed: Jan 30, 2018Granted: Dec 3, 2019
Est. expiryAug 31, 2037(~11.1 yrs left)· nominal 20-yr term from priority
Inventors:Masakazu IsozakiMasahito MoriKenetsu YokogawaTakao AraseTakahisa Hashimoto
90
PatentIndex Score
36
Cited by
23
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an electrode plate for a plasma processing apparatus, as shown and described.

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