Inventor · disambiguated record
Takamitsu Tomiga
Also filed as: TOMIGA TAKAMITSU
7 granted patents·16 pending applications·17 citations·filing 2008–2024
76Inventor score
Top patents by PatentIndex Score
23 records- 0187US8083964B2Metal-polishing liquid and polishing methodYAMADA TORU·Filed 2008·Granted Dec 27, 2011·13 cites·15 claims
- 0276US11009791B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted May 18, 2021·1 cites·13 claims
- 0371US2024329531A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0465US2024353753A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0564US8795945B2Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameFUJII KANA·Filed 2011·Granted Aug 5, 2014·1 cites·16 claims
- 0664US2024053679A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 0761US2023161253A1Actinic-ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 0859US9202709B2Polishing liquid for metal and polishing method using the sameTOMIGA TAKAMITSU·Filed 2009·Granted Dec 1, 2015·2 cites·9 claims
- 0956US12510824B2Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Granted Dec 30, 2025·0 cites·9 claims
- 1056US2022137512A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 1155US2023213861A1Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1254US12061415B2Method for producing radiation-sensitive resin composition and pattern forming methodFUJIFILM CORP·Filed 2022·Granted Aug 13, 2024·0 cites·6 claims
- 1354US2023028463A1Method for producing actinic ray-sensitive or radiation-sensitive resin composition, pattern formation method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 1447US2009203215A1Metal polishing slurry and chemical mechanical polishing methodFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 1547US2010075500A1Metal polishing slurry and chemical mechanical polishing methodFUJIFILM CORP·Filed 2009·Application pending·0 cites
- 1643US2008206995A1Metal-polishing liquid and polishing method therewithFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 1741US2019137875A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Application pending·0 cites
- 1840US2008188079A1Metal-polishing composition and chemical mechanical polishing method by using the sameFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 1940US2018217497A1Pattern forming method and actinic ray-sensitive or radiation-sensitive resin compositionFUJIFILM CORP·Filed 2018·Application pending·0 cites
- 2038US2008242091A1Metal-polishing liquid and polishing methodFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 2137US8349535B2Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewithFUJIFILM CORP·Filed 2010·Granted Jan 8, 2013·0 cites·9 claims
- 2233US2015331314A1Pattern forming method, compound used therein, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
- 2331US2011269071A1Actinic ray-sensitive or radiation-sensitive resin composition, chemical amplification resist composition, and resist film and pattern forming method using the compositionFUJIFILM CORP·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Takamitsu Tomiga files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →