Assignee
FUJII KANA
JP·6 granted patents·8 citations·filing 2010–2012
Top patents by PatentIndex Score
6 records- 0184US8647812B2Pattern forming method, chemical amplification resist composition and resist filmFUJII KANA·Filed 2011·Granted Feb 11, 2014·5 cites·21 claims
- 0266US8877423B2Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the sameFUJII KANA·Filed 2010·Granted Nov 4, 2014·1 cites·13 claims
- 0364US9122151B2Resist composition, resist film therefrom and method of forming negative pattern using the compositionFUJII KANA·Filed 2012·Granted Sep 1, 2015·1 cites·12 claims
- 0464US8795945B2Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameFUJII KANA·Filed 2011·Granted Aug 5, 2014·1 cites·16 claims
- 0535US8541161B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming methodFUJII KANA·Filed 2010·Granted Sep 24, 2013·0 cites·10 claims
- 0634US8642245B2Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the sameFUJII KANA·Filed 2012·Granted Feb 4, 2014·0 cites·18 claims
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