Inventor · disambiguated record
Khoi A. Phan
Also filed as: PHAN KHOI · PHAN KHOI A · PHAN KHOI ANH
101 granted patents·7 pending applications·2,549 citations·filing 1997–2024
99Inventor score
Files withADVANCED MICRO DEVICES INC96APPLIED MATERIALS INC6GLOBALFOUNDRIES INC2ADVANCE MICRO DEVICES INC1ADVANCED MICRO DEVICES LLP1
Top patents by PatentIndex Score
108 records- 0198US7262422B2Use of supercritical fluid to dry wafer and clean lens in immersion lithographyADVANCED MICRO DEVICES INC·Filed 2005·Granted Aug 28, 2007·44 cites·20 claims
- 0297US6513151B1Full flow focus exposure matrix analysis and electrical testing for new product mask evaluationADVANCED MICRO DEVICES INC·Filed 2001·Granted Jan 28, 2003·100 cites·27 claims
- 0396US6844206B1Refractive index system monitor and control for immersion lithographyADVANCED MICRO DEVICES LLP·Filed 2003·Granted Jan 18, 2005·127 cites·20 claims
- 0495US6594024B1Monitor CMP process using scatterometryADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 15, 2003·103 cites·26 claims
- 0593US7187796B1Systems and methods that employ exposure compensation to provide uniform CD control on reticle during fabricationADVANCED MICRO DEVICES INC·Filed 2003·Granted Mar 6, 2007·45 cites·14 claims
- 0693US6784446B1Reticle defect printability verification by resist latent image comparisonADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 31, 2004·53 cites·24 claims
- 0793US6570157B1Multi-pitch and line calibration for mask and wafer CD-SEM systemADVANCED MICRO DEVICES INC·Filed 2000·Granted May 27, 2003·69 cites·20 claims
- 0893US6453916B1Low angle solvent dispense nozzle design for front-side edge bead removal in photolithography resist processADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 24, 2002·65 cites·20 claims
- 0993US6222936B1Apparatus and method for reducing defects in a semiconductor lithographic processADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 24, 2001·112 cites·6 claims
- 1092US7224456B1In-situ defect monitor and control system for immersion medium in immersion lithographyADVANCED MICRO DEVICES INC·Filed 2004·Granted May 29, 2007·44 cites·15 claims
- 1192US6510730B1System and method for facilitating selection of optimized optical proximity correctionADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 28, 2003·39 cites·17 claims
- 1291US7065737B2Multi-layer overlay measurement and correction technique for IC manufacturingADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 20, 2006·51 cites·30 claims
- 1391US6999254B1Refractive index system monitor and control for immersion lithographyADVANCED MICRO DEVICES INC·Filed 2004·Granted Feb 14, 2006·31 cites·35 claims
- 1491US6665065B1Defect detection in pellicized reticles via exposure at short wavelengthsADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 16, 2003·72 cites·36 claims
- 1591US6559457B1System and method for facilitating detection of defects on a waferADVANCED MICRO DEVICES INC·Filed 2000·Granted May 6, 2003·52 cites·20 claims
- 1690US7158896B1Real time immersion medium control using scatterometryADVANCED MICRO DEVICES INC·Filed 2004·Granted Jan 2, 2007·35 cites·25 claims
- 1790US7076320B1Scatterometry monitor in cluster process tool environment for advanced process control (APC)ADVANCED MICRO DEVICES INC·Filed 2004·Granted Jul 11, 2006·44 cites·24 claims
- 1890US7056646B1Use of base developers as immersion lithography fluidADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 6, 2006·37 cites·20 claims
- 1990US6654660B1Controlling thermal expansion of mask substrates by scatterometryADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 25, 2003·36 cites·26 claims
- 2090US6459482B1Grainless material for calibration sampleADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 1, 2002·32 cites·22 claims
- 2189US6954678B1Artificial intelligence system for track defect problem solvingADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 11, 2005·44 cites·31 claims
- 2289US6451512B1UV-enhanced silylation process to increase etch resistance of ultra thin resistsADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 17, 2002·36 cites·19 claims
- 2389US5985497AMethod for reducing defects in a semiconductor lithographic processADVANCED MICRO DEVICES INC·Filed 1998·Granted Nov 16, 1999·71 cites·18 claims
- 2488US7251033B1In-situ reticle contamination detection system at exposure wavelengthADVANCED MICRO DEVICES INC·Filed 2004·Granted Jul 31, 2007·30 cites·17 claims
- 2588US7069155B1Real time analytical monitor for soft defects on reticle during reticle inspectionADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 27, 2006·25 cites·24 claims
- 2688US6556303B1Scattered signal collection using strobed techniqueADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 29, 2003·43 cites·45 claims
- 2787US7148142B1System and method for imprint lithography to facilitate dual damascene integration in a single imprint actADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 12, 2006·39 cites·23 claims
- 2887US6579651B2Modification of mask layout data to improve mask fidelityADVANCED MICRO DEVICES INC·Filed 2002·Granted Jun 17, 2003·22 cites·40 claims
- 2987US6573497B1Calibration of CD-SEM by e-beam induced current measurementADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 3, 2003·26 cites·22 claims
- 3087US6063531AFocus monitor structure and method for lithography processADVANCED MICRO DEVICES INC·Filed 1998·Granted May 16, 2000·66 cites·20 claims
- 3186US7100826B1Barcode marking of wafer products for inventory controlADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 5, 2006·36 cites·30 claims
- 3286US6809793B1System and method to monitor reticle heatingADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 26, 2004·25 cites·22 claims
- 3385US6573498B1Electric measurement of reference sample in a CD-SEM and method for calibrationADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 3, 2003·25 cites·22 claims
- 3485US6444373B1Modification of mask layout data to improve mask fidelityADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 3, 2002·20 cites·15 claims
- 3584US6741445B1Method and system to monitor and control electro-static dischargeADVANCED MICRO DEVICES INC·Filed 2002·Granted May 25, 2004·30 cites·30 claims
- 3684US6563578B2In-situ thickness measurement for use in semiconductor processingADVANCED MICRO DEVICES INC·Filed 2001·Granted May 13, 2003·30 cites·21 claims
- 3784US6171737B1Low cost application of oxide test wafer for defect monitor in photolithography processADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 9, 2001·78 cites·12 claims
- 3883US8028531B2Mitigating heat in an integrated circuitGLOBALFOUNDRIES INC·Filed 2009·Granted Oct 4, 2011·11 cites·20 claims
- 3983US7591902B2Recirculation and reuse of dummy dispensed resistGLOBALFOUNDRIES INC·Filed 2006·Granted Sep 22, 2009·9 cites·9 claims
- 4082US6507474B1Using localized ionizer to reduce electrostatic charge from wafer and maskADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 14, 2003·21 cites·18 claims
- 4181US7156925B1Using supercritical fluids to clean lenses and monitor defectsADVANCED MICRO DEVICES INC·Filed 2004·Granted Jan 2, 2007·15 cites·20 claims
- 4281US6762133B1System and method for control of hardmask etch to prevent pattern collapse of ultra-thin resistsADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 13, 2004·25 cites·11 claims
- 4381US6136514AResist developer saving system using material to reduce surface tension and wet resist surfaceADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 24, 2000·16 cites·8 claims
- 4480US7153364B1Re-circulation and reuse of dummy-dispensed resistADVANCE MICRO DEVICES INC·Filed 2001·Granted Dec 26, 2006·20 cites·12 claims
- 4580US7064846B1Non-lithographic shrink techniques for improving line edge roughness and using imperfect (but simpler) BARCsADVANCED MICRO DEVICES INC·Filed 2003·Granted Jun 20, 2006·17 cites·25 claims
- 4680US6771356B1Scatterometry of grating structures to monitor wafer stressADVANCED MICRO DEVICES INC·Filed 2002·Granted Aug 3, 2004·24 cites·18 claims
- 4779US7065427B1Optical monitoring and control of two layers of liquid immersion mediaADVANCED MICRO DEVICES INC·Filed 2004·Granted Jun 20, 2006·15 cites·20 claims
- 4879US7034930B1System and method for defect identification and location using an optical indicia deviceADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 25, 2006·16 cites·13 claims
- 4979US6972201B1Using scatterometry to detect and control undercut for ARC with developable BARCsADVANCED MICRO DEVICES INC·Filed 2004·Granted Dec 6, 2005·20 cites·23 claims
- 5079US6479820B1Electrostatic charge reduction of photoresist pattern on development trackADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 12, 2002·17 cites·23 claims
Showing the top 50 of 108 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →