Inventor · disambiguated record
James P. Cruse
Also filed as: CRUSE JAMES · CRUSE JAMES P · CRUSE JAMES PATRICK
38 granted patents·13 pending applications·1,502 citations·filing 1995–2013
98Inventor score
Top patents by PatentIndex Score
51 records- 0198US8496756B2Methods for processing substrates in process systems having shared resourcesCRUSE JAMES P·Filed 2010·Granted Jul 30, 2013·518 cites·20 claims
- 0298US7955646B2Elimination of flow and pressure gradients in low utilization processesAPPLIED MATERIALS INC·Filed 2004·Granted Jun 7, 2011·381 cites·17 claims
- 0396US7968469B2Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformityAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·46 cites·26 claims
- 0495US7846497B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Dec 7, 2010·37 cites·21 claims
- 0595US5910011AMethod and apparatus for monitoring processes using multiple parameters of a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1997·Granted Jun 8, 1999·161 cites·10 claims
- 0694US8513889B2Methods and apparatus for tuning matching networksZHANG CHUNLEI·Filed 2010·Granted Aug 20, 2013·56 cites·20 claims
- 0793US7775236B2Method and apparatus for controlling gas flow to a processing chamberAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·25 cites·20 claims
- 0890US8845816B2Method extending the service interval of a gas distribution plateDIAZ ADAUTO·Filed 2012·Granted Sep 30, 2014·8 cites·11 claims
- 0990US7975558B2Method and apparatus for gas flow measurementAPPLIED MATERIALS INC·Filed 2010·Granted Jul 12, 2011·9 cites·22 claims
- 1090US7879731B2Improving plasma process uniformity across a wafer by apportioning power among plural VHF sourcesAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·13 cites·28 claims
- 1189US6660659B1Plasma method and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2002·Granted Dec 9, 2003·44 cites·20 claims
- 1288US8076247B2Plasma process uniformity across a wafer by controlling RF phase between opposing electrodesCOLLINS KENNETH S·Filed 2007·Granted Dec 13, 2011·11 cites·20 claims
- 1388US7645709B2Methods for low temperature oxidation of a semiconductor deviceAPPLIED MATERIALS INC·Filed 2007·Granted Jan 12, 2010·13 cites·15 claims
- 1488US7605008B2Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasmaAPPLIED MATERIALS INC·Filed 2007·Granted Oct 20, 2009·11 cites·10 claims
- 1587US8074677B2Method and apparatus for controlling gas flow to a processing chamberGOLD EZRA ROBERT·Filed 2007·Granted Dec 13, 2011·19 cites·20 claims
- 1687US7743670B2Method and apparatus for gas flow measurementAPPLIED MATERIALS INC·Filed 2007·Granted Jun 29, 2010·10 cites·20 claims
- 1786US8707754B2Methods and apparatus for calibrating flow controllers in substrate processing systemsCRUSE JAMES P·Filed 2010·Granted Apr 29, 2014·10 cites·20 claims
- 1886US7988815B2Plasma reactor with reduced electrical skew using electrical bypass elementsAPPLIED MATERIALS INC·Filed 2007·Granted Aug 2, 2011·11 cites·19 claims
- 1984US8992689B2Method for removing halogen-containing residues from substrateDIAZ ADAUTO·Filed 2012·Granted Mar 31, 2015·8 cites·6 claims
- 2084US7552736B2Process for wafer backside polymer removal with a ring of plasma under the waferAPPLIED MATERIALS INC·Filed 2007·Granted Jun 30, 2009·9 cites·10 claims
- 2182US8080479B2Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonatorCOLLINS KENNETH S·Filed 2007·Granted Dec 20, 2011·6 cites·20 claims
- 2280US8473247B2Methods for monitoring processing equipmentCRUSE JAMES P·Filed 2010·Granted Jun 25, 2013·5 cites·20 claims
- 2379US8097088B1Methods for processing substrates in a dual chamber processing system having shared resourcesLIM EU JIN·Filed 2011·Granted Jan 17, 2012·6 cites·20 claims
- 2477US7884025B2Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sourcesAPPLIED MATERIALS INC·Filed 2007·Granted Feb 8, 2011·4 cites·24 claims
- 2575US7994872B2Apparatus for multiple frequency power applicationAPPLIED MATERIALS INC·Filed 2009·Granted Aug 9, 2011·6 cites·12 claims
- 2674US8237517B2Apparatus for multiple frequency power applicationSHANNON STEVEN C·Filed 2011·Granted Aug 7, 2012·3 cites·20 claims
- 2773US8931512B2Gas delivery system and method of use thereofCRUSE JAMES P·Filed 2012·Granted Jan 13, 2015·5 cites·18 claims
- 2873US5925212AApparatus and method for attaining repeatable temperature versus time profiles for plasma heated interactive parts used in mass production plasma processingAPPLIED MATERIALS INC·Filed 1995·Granted Jul 20, 1999·43 cites·31 claims
- 2972US8895889B2Methods and apparatus for rapidly responsive heat control in plasma processing devicesAPPLIED MATERIALS INC·Filed 2013·Granted Nov 25, 2014·2 cites·8 claims
- 3071US8721798B2Methods for processing substrates in process systems having shared resourcesCRUSE JAMES P·Filed 2010·Granted May 13, 2014·2 cites·16 claims
- 3170US8454756B2Methods for extending the lifetime of pressure gauges coupled to substrate process chambersCRUSE JAMES P·Filed 2010·Granted Jun 4, 2013·2 cites·18 claims
- 3258US6652710B2Process monitoring apparatus and methodAPPLIED MATERIALS INC·Filed 1999·Granted Nov 25, 2003·18 cites·88 claims
- 3355US9587789B2Methods and apparatus for providing a gas mixture to a pair of process chambersAPPLIED MATERIALS INC·Filed 2013·Granted Mar 7, 2017·0 cites·18 claims
- 3455US9155134B2Methods and apparatus for rapidly responsive heat control in plasma processing devicesZHANG CHUNLEI·Filed 2008·Granted Oct 6, 2015·0 cites·16 claims
- 3554US2011009999A1Plasma reactor with rf generator and automatic impedance match with minimum reflected power-seeking controlAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3650US2009025879A1Plasma reactor with reduced electrical skew using a conductive baffleRAUF SHAHID·Filed 2007·Application pending·0 cites
- 3747US8616224B2Methods and apparatus for providing a gas mixture to a pair of process chambersLEE JARED AHMAD·Filed 2010·Granted Dec 31, 2013·0 cites·9 claims
- 3847US2011265951A1Twin chamber processing systemAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 3946US8144329B2Low power RF tuning using optical and non-reflected power methodsCRUSE JAMES P·Filed 2011·Granted Mar 27, 2012·0 cites·18 claims
- 4046US2009272717A1Method and apparatus of a substrate etching system and processAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 4145US2008003702A1Low Power RF Tuning Using Optical and Non-Reflected Power MethodsCRUSE JAMES P·Filed 2006·Application pending·0 cites
- 4244US2008179287A1Process for wafer backside polymer removal with wafer front side gas purgeCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
- 4344US2008178803A1Plasma reactor with ion distribution uniformity controller employing plural vhf sourcesCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
- 4444US2008179288A1Process for wafer backside polymer removal and wafer front side scavenger plasmaCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
- 4542US2011011743A1Low power rf tuning using optical and non-reflected power methodsCRUSE JAMES P·Filed 2010·Application pending·0 cites
- 4642US2014342570A1Etch process having adaptive control with etch depth of pressure and powerAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 4741US8562742B2Apparatus for radial delivery of gas to a chamber and methods of use thereofLEE JARED AHMAD·Filed 2010·Granted Oct 22, 2013·0 cites·20 claims
- 4839US8616043B2Methods and apparatus for calibrating pressure gauges in a substrate processing systemCRUSE JAMES P·Filed 2010·Granted Dec 31, 2013·0 cites·18 claims
- 4938US2011265883A1Methods and apparatus for reducing flow splitting errors using orifice ratio conductance controlAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 5037US2011269314A1Process chambers having shared resources and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
Showing the top 50 of 51 patent records by PatentIndex Score.
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