Inventor · disambiguated record
Lothar Bauch
Also filed as: BAUCH LOTHAR
6 granted patents·4 pending applications·37 citations·filing 2002–2014
80Inventor score
Top patents by PatentIndex Score
10 records- 0180US9099353B2Method and system for determining overlap process windows in semiconductors by inspection techniquesGLOBALFOUNDRIES INC·Filed 2014·Granted Aug 4, 2015·4 cites·16 claims
- 0270US6737748B2Stacked via with specially designed landing pad for integrated semiconductor structuresINFINEON TECHNOLOGIES AG·Filed 2002·Granted May 18, 2004·19 cites·18 claims
- 0360US7084962B2Method for detecting positioning errors of circuit patterns during the transfer by means of a mask into layers of a substrate of a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2004·Granted Aug 1, 2006·7 cites·17 claims
- 0453US7465522B2Photolithographic mask having half tone main features and perpendicular half tone assist featuresINFINEON TECHNOLOGIES AG·Filed 2002·Granted Dec 16, 2008·4 cites·18 claims
- 0548US7078133B2Photolithographic maskINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jul 18, 2006·3 cites·6 claims
- 0645US2007243707A1Hard Mask Layer Stack And A Method Of PatterningQIMONDA AG·Filed 2007·Application pending·0 cites
- 0743US8940555B2Method and system for determining overlap process windows in semiconductors by inspection techniquesBAUCH LOTHAR·Filed 2012·Granted Jan 27, 2015·0 cites·11 claims
- 0835US2006257794A1Method for transferring structures from a photomask into a photoresist layerVOELKEL LARS·Filed 2006·Application pending·0 cites
- 0931US2005153216A1Lithography mask and lithography system for direction-dependent exposureFiled 2004·Application pending·0 cites
- 1026US2007218627A1Device and a method and mask for forming a deviceLATTARD LUDOVIC·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →