Inventor · disambiguated record
Troy S. Detrick
Also filed as: DETRICK TROY · DETRICK TROY S
10 granted patents·4 pending applications·833 citations·filing 1997–2013
91Inventor score
Top patents by PatentIndex Score
14 records- 0198US6182602B1Inductively coupled HDP-CVD reactorAPPLIED MATERIALS INC·Filed 1997·Granted Feb 6, 2001·386 cites·20 claims
- 0298US6083344AMulti-zone RF inductively coupled source configurationAPPLIED MATERIALS INC·Filed 1997·Granted Jul 4, 2000·346 cites·18 claims
- 0396US7968469B2Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformityAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·46 cites·26 claims
- 0490US7879731B2Improving plasma process uniformity across a wafer by apportioning power among plural VHF sourcesAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·13 cites·28 claims
- 0588US8076247B2Plasma process uniformity across a wafer by controlling RF phase between opposing electrodesCOLLINS KENNETH S·Filed 2007·Granted Dec 13, 2011·11 cites·20 claims
- 0686US7988815B2Plasma reactor with reduced electrical skew using electrical bypass elementsAPPLIED MATERIALS INC·Filed 2007·Granted Aug 2, 2011·11 cites·19 claims
- 0782US8080479B2Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonatorCOLLINS KENNETH S·Filed 2007·Granted Dec 20, 2011·6 cites·20 claims
- 0877US7884025B2Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sourcesAPPLIED MATERIALS INC·Filed 2007·Granted Feb 8, 2011·4 cites·24 claims
- 0969US8878926B2Apparatus and method for analyzing thermal properties of composite structuresYE ZHENG JOHN·Filed 2011·Granted Nov 4, 2014·2 cites·17 claims
- 1066US7838430B2Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2004·Granted Nov 23, 2010·8 cites·27 claims
- 1156US2015042017A1Three-dimensional (3d) processing and printing with plasma sourcesAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1250US2007000611A1Plasma control using dual cathode frequency mixingAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1350US2009025879A1Plasma reactor with reduced electrical skew using a conductive baffleRAUF SHAHID·Filed 2007·Application pending·0 cites
- 1444US2008178803A1Plasma reactor with ion distribution uniformity controller employing plural vhf sourcesCOLLINS KENNETH S·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →