Inventor · disambiguated record
Yasuo Matsuki
Also filed as: MATSUKI YASUO
34 granted patents·14 pending applications·858 citations·filing 1988–2015
98Inventor score
Files withJSR CORP25JAPAN SYNTHETIC RUBBER CO LTD8SHIMODA TATSUYA4SEIKO EPSON CORP3INTERNAT CT FOR MATERIALS RES2
Top patents by PatentIndex Score
48 records- 0196US6518087B1Method for manufacturing solar batterySEIKO EPSON CORP·Filed 2000·Granted Feb 11, 2003·129 cites·16 claims
- 0295US6541354B1Method for forming silicon filmSEIKO EPSON CORP·Filed 2000·Granted Apr 1, 2003·102 cites·21 claims
- 0393US6527847B1Coating compositionJSR CORP·Filed 2000·Granted Mar 4, 2003·67 cites·9 claims
- 0491US6503570B2Cyclosilane compound, and solution composition and process for forming a silicon filmJSR CORP·Filed 2001·Granted Jan 7, 2003·64 cites·24 claims
- 0589US6517911B1Process for the formation of silicon oxide filmsJSR CORP·Filed 2000·Granted Feb 11, 2003·47 cites·6 claims
- 0689US5969055ALiquid crystal alignment agentJSR CORP·Filed 1997·Granted Oct 19, 1999·62 cites·10 claims
- 0787US7002033B1Chemical vapor deposition material and chemical vapor depositionJSR CORP·Filed 2005·Granted Feb 21, 2006·12 cites·2 claims
- 0886US5773559APolyimide block copolymer and liquid crystal alignment layer forming agentJAPAN SYNTHETIC RUBBER CO LTD·Filed 1996·Granted Jun 30, 1998·46 cites·25 claims
- 0981US6846513B2Method for fabricating a silicon thin-filmSEIKO EPSON CORP·Filed 2001·Granted Jan 25, 2005·25 cites·4 claims
- 1079US7473443B2Composition for forming silicon film and method for forming silicon filmJSR CORP·Filed 2003·Granted Jan 6, 2009·22 cites·12 claims
- 1178US7223802B2High order silane composition, and method of forming silicon film using the compositionJSR CORP·Filed 2003·Granted May 29, 2007·21 cites·8 claims
- 1274US6953600B2Conductive film forming composition, conductive film, and method for forming the sameINTERNAT CT FOR MATERIALS RES·Filed 2003·Granted Oct 11, 2005·18 cites·4 claims
- 1373US6875518B2Ruthenium film, ruthenium oxide film and process for forming the sameJSR CORP·Filed 2001·Granted Apr 5, 2005·8 cites·16 claims
- 1473US6312769B1Liquid crystal alignment layer, production method for the same, and liquid crystal display device comprising the sameJSR CORP·Filed 1998·Granted Nov 6, 2001·32 cites·13 claims
- 1573US5276132ALiquid crystal aligning agent and aligning agent-applied liquid crystal display deviceJAPAN SYNTHETIC RUBBER CO LTD·Filed 1992·Granted Jan 4, 1994·42 cites·16 claims
- 1671US9653306B2Method for forming crystalline cobalt silicide filmSHIMODA TATSUYA·Filed 2010·Granted May 16, 2017·3 cites·16 claims
- 1771US4923948ACurable compositionJAPAN SYNTHETIC RUBBER CO LTD·Filed 1988·Granted May 8, 1990·20 cites·7 claims
- 1868US7238822B2Ruthenium compound and process for producing a metal ruthenium filmJSR CORP·Filed 2003·Granted Jul 3, 2007·5 cites·2 claims
- 1967US5783656APolyamic acid, polyimide and liquid crystal aligning agentJAPAN SYNTHETIC RUBBER CO LTD·Filed 1997·Granted Jul 21, 1998·25 cites·7 claims
- 2066US9435032B2Method for forming patterned conductive filmJAPAN SCIENCE & TECH AGENCY·Filed 2014·Granted Sep 6, 2016·0 cites·2 claims
- 2166US2009142617A1Composition for forming silicon-aluminum film, silicon-aluminum film and method for forming the sameJSR CORP·Filed 2009·Application pending·0 cites
- 2265US6224788B1Liquid crystal aligning agent and process for producing liquid crystal alignment film using the sameJSR CORP·Filed 1998·Granted May 1, 2001·37 cites·37 claims
- 2360US8597424B2Composition and method for forming an aluminum filmSAKAI TATSUYA·Filed 2008·Granted Dec 3, 2013·0 cites·10 claims
- 2460US5344593AElectroconductive elastomer-forming compositionJAPAN SYNTHETIC RUBBER CO LTD·Filed 1992·Granted Sep 6, 1994·21 cites·16 claims
- 2559US9126849B2Container containing a cobalt carbonyl complex and cobalt carbonyl complex compositionJSR CORP·Filed 2014·Granted Sep 8, 2015·0 cites·4 claims
- 2659US7776766B2Trench filling methodJSR CORP·Filed 2006·Granted Aug 17, 2010·0 cites·10 claims
- 2757US10199651B2Binder composition for electrode of electric storage deviceJSR CORP·Filed 2013·Granted Feb 5, 2019·0 cites·23 claims
- 2857US2011236583A1Container containing a cobalt carbonyl complex and cobalt carbonyl complex compositionJSR CORP·Filed 2009·Application pending·0 cites
- 2955US9257273B2Charged particle beam apparatus, thin film forming method, defect correction method and device forming methodKOYAMA YOSHIHIRO·Filed 2011·Granted Feb 9, 2016·1 cites·15 claims
- 3055US5700860ALiquid crystal orienting agentJAPAN SYNTHETIC RUBBER CO LTD·Filed 1996·Granted Dec 23, 1997·25 cites·12 claims
- 3152US2011158886A1Polysilane production processJAPAN SCIENCE & TECH AGENCY·Filed 2009·Application pending·0 cites
- 3252US2007190265A1High order silane composition, and method of forming silicon film using the compositionAOKI TAKASHI·Filed 2007·Application pending·0 cites
- 3351US6806210B2Tantalum oxide film, use thereof, process for forming the same and compositionJSR CORP·Filed 2001·Granted Oct 19, 2004·4 cites·29 claims
- 3451US2009215920A1Silane polymer and method for forming silicon filmJSR CORP·Filed 2009·Application pending·0 cites
- 3549US2015291441A1Container containing a cobalt carbonyl complex and cobalt carbonyl complex compositionJSR CORP·Filed 2015·Application pending·0 cites
- 3649US2006257667A1Composition for forming silicon-aluminum film, silicon-aluminum film and method for forming the sameJSR CORP·Filed 2003·Application pending·0 cites
- 3748US2007209695A1Dye and Dye-Sensitized Solar CellJSR CORP·Filed 2005·Application pending·0 cites
- 3845US2010029057A1Silicone resin composition and method of forming a trench isolationJSR CORP·Filed 2007·Application pending·0 cites
- 3944US8828555B2Method for forming patterned conductive filmSHIMODA TATSUYA·Filed 2011·Granted Sep 9, 2014·0 cites·1 claims
- 4044US7718228B2Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming sameJSR CORP·Filed 2004·Granted May 18, 2010·3 cites·20 claims
- 4144US5698135ALiquid crystal-aligning agentJAPAN SYNTHETIC RUBBER CO LTD·Filed 1995·Granted Dec 16, 1997·8 cites·10 claims
- 4244US5340702AMethod of forming fine resist patternJAPAN SYNTHETIC RUBBER CO LTD·Filed 1991·Granted Aug 23, 1994·9 cites·2 claims
- 4344US2011184141A1Polymer production processNAT UNIV CORP KANAZAWA UNIVERSITY·Filed 2009·Application pending·0 cites
- 4443US2009022891A1Method of forming metal filmJSR CORP·Filed 2006·Application pending·0 cites
- 4542US8673682B2High order silane composition and method of manufacturing a film-coated substrateSHIMODA TATSUYA·Filed 2010·Granted Mar 18, 2014·0 cites·17 claims
- 4642US2007208117A1Aluminum fine particle dispersed film, composition for forming the same and method of forming the sameINTERNAT CT FOR MATERIALS RES·Filed 2007·Application pending·0 cites
- 4741US2002034585A1Silicon film forming processJSR CORP·Filed 2001·Application pending·0 cites
- 4834US2012064302A1Patterning methodSHIMODA TATSUYA·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →