Inventor · disambiguated record
Joel M. Huston
Also filed as: HUSTON JOEL · HUSTON JOEL M
28 granted patents·9 pending applications·2,903 citations·filing 1997–2021
97Inventor score
Top patents by PatentIndex Score
37 records- 0199US10400335B2Dual-direction chemical delivery system for ALD/CVD chambersAPPLIED MATERIALS INC·Filed 2017·Granted Sep 3, 2019·363 cites·12 claims
- 0299US9765432B2Dual-direction chemical delivery system for ALD/CVD chambersAPPLIED MATERIALS INC·Filed 2016·Granted Sep 19, 2017·362 cites·15 claims
- 0399US9353440B2Dual-direction chemical delivery system for ALD/CVD chambersAPPLIED MATERIALS INC·Filed 2013·Granted May 31, 2016·373 cites·18 claims
- 0498US7520957B2Lid assembly for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Apr 21, 2009·162 cites·8 claims
- 0598US7396480B2Method for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Granted Jul 8, 2008·285 cites·20 claims
- 0697US8846163B2Method for removing oxidesKAO CHIEN-TEH·Filed 2012·Granted Sep 30, 2014·190 cites·19 claims
- 0796US6364954B2High temperature chemical vapor deposition chamberAPPLIED MATERIALS INC·Filed 1998·Granted Apr 2, 2002·342 cites·16 claims
- 0896US6083321AFluid delivery system and methodAPPLIED MATERIALS INC·Filed 1997·Granted Jul 4, 2000·583 cites·16 claims
- 0995US7767024B2Method for front end of line fabricationAPPPLIED MATERIALS INC·Filed 2008·Granted Aug 3, 2010·28 cites·28 claims
- 1094US8343307B2Showerhead assemblyAPPLIED MATERIALS INC·Filed 2008·Granted Jan 1, 2013·15 cites·11 claims
- 1190US6206971B1Integrated temperature controlled exhaust and cold trap assemblyAPPLIED MATERIALS INC·Filed 1999·Granted Mar 27, 2001·90 cites·17 claims
- 1289US10593539B2Support assemblyKAO CHIEN TEH·Filed 2012·Granted Mar 17, 2020·5 cites·20 claims
- 1381US6517592B2Cold trap assemblyAPPLIED MATERIALS INC·Filed 2000·Granted Feb 11, 2003·21 cites·12 claims
- 1480US9837250B2Hot wall reactor with cooled vacuum containmentAPPLIED MATERIALS INC·Filed 2014·Granted Dec 5, 2017·4 cites·19 claims
- 1579US7355394B2Apparatus and method of dynamically measuring thickness of a layer of a substrateAPPLIED MATERIALS INC·Filed 2006·Granted Apr 8, 2008·9 cites·17 claims
- 1678US7112961B2Method and apparatus for dynamically measuring the thickness of an objectAPPLIED MATERIALS INC·Filed 2003·Granted Sep 26, 2006·18 cites·45 claims
- 1778US2021225640A1Support assemblyAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1876US9543186B2Substrate support with controlled sealing gapAPPLIED MATERIALS INC·Filed 2013·Granted Jan 10, 2017·3 cites·19 claims
- 1975US6179277B1Liquid vaporizer systems and methods for their useAPPLIED MATERIALS INC·Filed 1998·Granted Jan 30, 2001·33 cites·18 claims
- 2071US2020006054A1Support assemblyAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2165US9627185B2Methods and apparatus for in-situ cleaning of a process chamberAPPLIED MATERIALS INC·Filed 2014·Granted Apr 18, 2017·1 cites·15 claims
- 2263US7777483B2Method and apparatus for measuring a thickness of a layer of a waferAPPLIED MATERIALS INC·Filed 2008·Granted Aug 17, 2010·3 cites·19 claims
- 2362US6926774B2Piezoelectric vaporizerAPPLIED MATERIALS INC·Filed 2001·Granted Aug 9, 2005·5 cites·26 claims
- 2461US2014076234A1Multi chamber processing systemAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 2561US2009111280A1Method for removing oxidesAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2659US7910853B2Direct real-time monitoring and feedback control of RF plasma output for wafer processingAPPLIED MATERIALS INC·Filed 2008·Granted Mar 22, 2011·0 cites·12 claims
- 2756US2011223755A1Method for removing oxidesKAO CHIEN-TEH·Filed 2011·Application pending·0 cites
- 2855US9831109B2High temperature process chamber lidAPPLIED MATERIALS INC·Filed 2014·Granted Nov 28, 2017·0 cites·9 claims
- 2955US8216374B2Gas coupler for substrate processing chamberHUSTON JOEL·Filed 2006·Granted Jul 10, 2012·2 cites·20 claims
- 3055US2014174362A1Apparatus And Methods For Symmetrical Gas Distribution With High Purge EfficiencyKAO CHIEN-TEH·Filed 2013·Application pending·0 cites
- 3153US2005230350A1In-situ dry clean chamber for front end of line fabricationAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 3252US10879090B2High temperature process chamber lidAPPLIED MATERIALS INC·Filed 2017·Granted Dec 29, 2020·0 cites·16 claims
- 3350US11598003B2Substrate processing chamber having heated showerhead assemblyAPPLIED MATERIALS INC·Filed 2017·Granted Mar 7, 2023·0 cites·7 claims
- 3447US6332601B1Liquid vaporizers for semiconductor processing systemsAPPLIED MATERIALS INC·Filed 2000·Granted Dec 25, 2001·6 cites·22 claims
- 3545US11955362B2Substrate support for reduced damage substrate backsideAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2024·0 cites·19 claims
- 3643US2014137961A1Modular chemical delivery systemAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3733US2003003696A1Method and apparatus for tuning a plurality of processing chambersFiled 2001·Application pending·0 cites
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