Inventor · disambiguated record
Akitake Tamura
Also filed as: TAMURA AKITAKE
13 granted patents·17 pending applications·369 citations·filing 2003–2018
90Inventor score
Top patents by PatentIndex Score
30 records- 0198US7648895B2Vertical CVD apparatus for forming silicon-germanium filmTOKYO ELECTRON LTD·Filed 2008·Granted Jan 19, 2010·337 cites·14 claims
- 0287US11117144B2Cyclone collectorTOKYO ELECTRON LTD·Filed 2018·Granted Sep 14, 2021·3 cites·8 claims
- 0387US10509029B2Measurement device and measurement methodTOKYO ELECTRON LTD·Filed 2015·Granted Dec 17, 2019·4 cites·12 claims
- 0485US10222363B2Measurement device and measurement methodTOKYO ELECTRON LTD·Filed 2015·Granted Mar 5, 2019·3 cites·19 claims
- 0575US8950999B2Substrate processing apparatus and particle adhesion preventing methodTAMURA AKITAKE·Filed 2008·Granted Feb 10, 2015·5 cites·15 claims
- 0673US7615163B2Film formation apparatus and method of using the sameTOKYO ELECTRON LTD·Filed 2005·Granted Nov 10, 2009·5 cites·15 claims
- 0768US7508518B2Particle measuring method and particle measuring apparatusTOKYO ELECTRON LTD·Filed 2008·Granted Mar 24, 2009·2 cites·12 claims
- 0864US8673086B2Method and device for cleaning a substrate and storage mediumTAMURA AKITAKE·Filed 2009·Granted Mar 18, 2014·2 cites·10 claims
- 0960US8008211B2Pattern forming method, semiconductor device manufacturing apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Aug 30, 2011·1 cites·9 claims
- 1060US2010154712A1Source gas generating device and film forming apparatusTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1159US7008881B2Method for forming silicon epitaxial layerTOKYO ELECTRON LTD·Filed 2003·Granted Mar 7, 2006·4 cites·14 claims
- 1258US2009194233A1Component for semicondutor processing apparatus and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 1357US2011244693A1Component for semiconductor processing apparatus and manufacturing method thereofTAMURA AKITAKE·Filed 2011·Application pending·0 cites
- 1454US2015114562A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1552US8911955B2Virus detection device and virus detection methodTOKYO ELECTRON LTD·Filed 2013·Granted Dec 16, 2014·0 cites·5 claims
- 1651US7211514B2Heat-processing method for semiconductor process under a vacuum pressureTOKYO ELECTRON LTD·Filed 2004·Granted May 1, 2007·3 cites·14 claims
- 1749US2005181586A1Vertical CVD apparatus for forming silicon-germanium filmFiled 2004·Application pending·0 cites
- 1847US2009206253A1Substrate inspection method, substrate inspection apparatus and storage mediumTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1946US2011090612A1Atmosphere cleaning deviceTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 2046US2014073062A1Specimen solution assay device, specimen solution assay method, and immunochromatographic sensor deviceTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2145US10139334B2Particulate measurement deviceTOKYO ELECTRON LTD·Filed 2016·Granted Nov 27, 2018·0 cites·7 claims
- 2244US2012031339A1Deposition head and film forming apparatusONO YUJI·Filed 2010·Application pending·0 cites
- 2344US2009183476A1Gas purifying apparatus and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2443US2013134041A1Droplet moving device, droplet moving method, plasma separation device, and plasma separation methodTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2541US2018362910A1Aseptic pods and load portsENTEGRIS INC·Filed 2016·Application pending·0 cites
- 2641US2017137765A1Sealed container and conveyance systemTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2741US2012094014A1Vapor deposition apparatus and vapor deposition methodONO YUJI·Filed 2010·Application pending·0 cites
- 2841US2015217294A1Sealed container and cell transfer systemTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 2940US2016201022A1Automatic culture system and automatic culture deviceTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 3034US2012255193A1Substrate drying apparatus and methodTAMURA AKITAKE·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →