Inventor · disambiguated record
Aniruddha Pal
Also filed as: PAL ANIRUDDHA
15 granted patents·6 pending applications·34 citations·filing 2008–2023
88Inventor score
Top patents by PatentIndex Score
21 records- 0194US10204805B2Thin heated substrate supportAPPLIED MATERIALS INC·Filed 2016·Granted Feb 12, 2019·10 cites·19 claims
- 0289US10090181B2Method and apparatus for substrate transfer and radical confinementLEE JARED AHMAD·Filed 2012·Granted Oct 2, 2018·9 cites·15 claims
- 0385US11359722B2Multinode multi-use O-ring and method for forming a sealAPPLIED MATERIALS INC·Filed 2019·Granted Jun 14, 2022·11 cites·10 claims
- 0475US9947559B2Thermal management of edge ring in semiconductor processingAPPLIED MATERIALS INC·Filed 2012·Granted Apr 17, 2018·3 cites·18 claims
- 0572US11574831B2Method and apparatus for substrate transfer and radical confinementAPPLIED MATERIALS INC·Filed 2020·Granted Feb 7, 2023·0 cites·18 claims
- 0672US11171008B2Abatement and strip process chamber in a dual load lock configurationAPPLIED MATERIALS INC·Filed 2019·Granted Nov 9, 2021·1 cites·20 claims
- 0769US12431338B2Composite structures for semiconductor process chambersAPPLIED MATERIALS INC·Filed 2023·Granted Sep 30, 2025·0 cites·16 claims
- 0865US11090893B2Method of reclaiming a sealAPPLIED MATERIALS INC·Filed 2018·Granted Aug 17, 2021·0 cites·20 claims
- 0964US2020066563A1Method and apparatus for substrate transfer and radical confinementAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1062US10468282B2Method and apparatus for substrate transfer and radical confinementAPPLIED MATERIALS INC·Filed 2018·Granted Nov 5, 2019·0 cites·14 claims
- 1161US10991552B2Cooling mechanism utilized in a plasma reactor with enhanced temperature regulationAPPLIED MATERIALS INC·Filed 2019·Granted Apr 27, 2021·0 cites·20 claims
- 1258US11177136B2Abatement and strip process chamber in a dual loadlock configurationAPPLIED MATERIALS INC·Filed 2019·Granted Nov 16, 2021·0 cites·17 claims
- 1356US10249475B2Cooling mechanism utlized in a plasma reactor with enhanced temperature regulationAPPLIED MATERIALS INC·Filed 2014·Granted Apr 2, 2019·0 cites·15 claims
- 1453US2023064637A1Clamped dual-channel showerheadAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1552US2010081284A1Methods and apparatus for improving flow uniformity in a process chamberAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 1647US10453694B2Abatement and strip process chamber in a dual loadlock configurationLEE JARED AHMAD·Filed 2012·Granted Oct 22, 2019·0 cites·20 claims
- 1746US2013334199A1Thin heated substrate supportYOUSIF IMAD·Filed 2012·Application pending·0 cites
- 1845US2023051800A1Methods and apparatus for plasma spraying silicon carbide coatings for semiconductor chamber applicationsAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 1941US8562742B2Apparatus for radial delivery of gas to a chamber and methods of use thereofLEE JARED AHMAD·Filed 2010·Granted Oct 22, 2013·0 cites·20 claims
- 2039US2012222813A1Vacuum chambers with shared pumpPAL ANIRUDDHA·Filed 2012·Application pending·0 cites
- 2124USD1027120SSeal for an assembly in a vapor deposition chamberAPPLIED MATERIALS INC·Filed 2020·Granted May 14, 2024·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →