Inventor · disambiguated record
Mario Hennig
Also filed as: HENNIG MARIO
7 granted patents·8 pending applications·60 citations·filing 2002–2008
84Inventor score
Top patents by PatentIndex Score
15 records- 0183US7339652B2Apparatus for projecting a pattern into an image planeINFINEON TECHNOLOGIES AG·Filed 2006·Granted Mar 4, 2008·9 cites·22 claims
- 0278US7644389B2Method for producing a mask for the lithographic projection of a pattern onto a substrateQIMONDA AG·Filed 2007·Granted Jan 5, 2010·7 cites·16 claims
- 0367US7425396B2Method for reducing an overlay error and measurement mark for carrying out the sameINFINEON TECHNOLOGIES AG·Filed 2004·Granted Sep 16, 2008·19 cites·12 claims
- 0460US6838216B2Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatusINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jan 4, 2005·9 cites·12 claims
- 0559US7393613B2Set of at least two masks for the projection of structure patternsINFINEON TECHNOLOGIES AG·Filed 2004·Granted Jul 1, 2008·7 cites·5 claims
- 0653US7045254B2Mask with programmed defects and method for the fabrication thereofINFINEON TECHNOLOGIES AG·Filed 2002·Granted May 16, 2006·6 cites·39 claims
- 0750US7393614B2Set of masks including a first mask and a second trimming mask with a semitransparent region having a transparency between 20% and 80% to control diffraction effects and obtain maximum depth of focus for the projection of structure patterns onto a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2004·Granted Jul 1, 2008·3 cites·9 claims
- 0844US2009170024A1Method of Patterning a Substrate, Photosensitive Layer Stack and System for LithographyHENNIG MARIO·Filed 2007·Application pending·0 cites
- 0942US2008204686A1Mask Structure for Manufacturing an Integrated Circuit by Photolithographic PatterningHENKE WOLFGANG·Filed 2008·Application pending·0 cites
- 1039US2005196689A1Method for transferring a layout of an integrated circuit level to a semiconductor substrateFiled 2005·Application pending·0 cites
- 1138US2007009816A1Method and system for photolithographyPFORR RAINER·Filed 2006·Application pending·0 cites
- 1235US2007287075A1Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical elementPFORR RAINER·Filed 2006·Application pending·0 cites
- 1333US2006183258A1Imaging system and method for producing semiconductor structures on a wafer by imaging a mask on the wafer with a dipole diaphragmHENNIG MARIO·Filed 2006·Application pending·0 cites
- 1433US2006177773A1Method for producing semiconductor patterns on a waferHENNIG MARIO·Filed 2006·Application pending·0 cites
- 1532US2008042171A1Transistor arrangement, sense-amplifier arrangement and methods of manufacturing the same via a phase shift maskMOSLER SEBASTIAN·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →