Inventor · disambiguated record
Kartik Santhanam
Also filed as: SANTHANAM KARTIK
9 granted patents·8 pending applications·44 citations·filing 2007–2020
83Inventor score
Top patents by PatentIndex Score
17 records- 0193USD959490SDisplay screen or portion thereof with graphical user interfaceAPPLIED MATERIALS INC·Filed 2020·Granted Aug 2, 2022·36 cites·1 claims
- 0290US11735447B2Enhanced process and hardware architecture to detect and correct realtime product substratesAPPLIED MATERIALS INC·Filed 2020·Granted Aug 22, 2023·2 cites·20 claims
- 0375US7659184B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2008·Granted Feb 9, 2010·3 cites·13 claims
- 0467US8927400B2Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafersAPPLIED MATERIALS INC·Filed 2014·Granted Jan 6, 2015·1 cites·11 claims
- 0567US8003500B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2009·Granted Aug 23, 2011·1 cites·7 claims
- 0664US7989329B2Removal of surface dopants from a substrateAPPLIED MATERIALS INC·Filed 2007·Granted Aug 2, 2011·1 cites·12 claims
- 0754US2008153271A1Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafersAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 0850US7968401B2Reducing photoresist layer degradation in plasma immersion ion implantationAPPLIED MATERIALS INC·Filed 2009·Granted Jun 28, 2011·0 cites·20 claims
- 0946US2011256691A1Removal of surface dopants from a substrateRAMASWAMY KARTIK·Filed 2011·Application pending·0 cites
- 1045US2010173484A1Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafersFOAD MAJEED A·Filed 2010·Application pending·0 cites
- 1142US7723219B2Plasma immersion ion implantation process with reduced polysilicon gate loss and reduced particle depositionAPPLIED MATERIALS INC·Filed 2008·Granted May 25, 2010·0 cites·18 claims
- 1237US8501605B2Methods and apparatus for conformal dopingSANTHANAM KARTIK·Filed 2011·Granted Aug 6, 2013·0 cites·18 claims
- 1336US2013023112A1Methods for post dopant implant purge treatmentAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 1432US2012302048A1Pre or post-implant plasma treatment for plasma immersed ion implantation processSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 1532US2012088356A1Integrated platform for in-situ doping and activation of substratesSANTHANAM KARTIK·Filed 2011·Application pending·0 cites
- 1631US2012289036A1Surface dose retention of dopants by pre-amorphization and post implant passivation treatmentsSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 1731US2013095643A1Methods for implanting dopant species in a substrateSANTHANAM KARTIK·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →